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Method for making low-loss optical waveguides on an industrial scale 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C03C-025/04
  • B05B-001/24
출원번호 US-0001155 (1979-01-05)
발명자 / 주소
  • French William G. (Plainfield NJ)
출원인 / 주소
  • AT&T Bell Laboratories (Murray Hill NJ 02)
인용정보 피인용 횟수 : 37  인용 특허 : 1

초록

A method is disclosed for making an optical fiber by drawing a preform whose fabrication involves deposition of a glass on a substrate by means of a chemical reaction between gaseous reagents. According to the disclosed method, accurately controlled amounts of a gaseous reagent are produced by flash

대표청구항

A method for fabricating an optical fiber by drawing a preform whose manufacture comprises depositing a glass on a substrate by means of a chemical reaction between at least two reagents forming a gaseous mixture, characterized in that the preparation of said gaseous mixture comprises the steps of (

이 특허에 인용된 특허 (1)

  1. Li Tingye (Rumson NJ), Method for manufacturing optical fibers having eccentric longitudinal index inhomogeneity.

이 특허를 인용한 특허 (37)

  1. Baum Thomas H. ; Bhandari Gautam, Alkane and polyamine solvent compositions for liquid delivery chemical vapor deposition.
  2. Hintermaier Frank S.,DEX ; Hendrix Bryan C. ; Roeder Jeffrey F. ; Desrochers Debra A. ; Baum Thomas H., Amorphously deposited metal oxide ceramic films.
  3. Boardman,William John; Mercado,Raul Donate; Tudhope,Andrew William, Apparatus for directing plasma flow to coat internal passageways.
  4. Greenham Adrian C. (Harrow GB2) Nichols Bruce A. (Wembley GB2) Ong Tin M. (Greenford GB2), Apparatus for the manufacture of optical fibre preforms.
  5. Visweswaren Sivaramakrishnam ; Hiroshi Nishizato JP; Jun Zhao ; Ichiro Yokoyama JP, Apparatus for vaporization sequence for multiple liquid precursors used in semiconductor thin film applications.
  6. Xu, Chongying; Borovik, Alexander S.; Baum, Thomas H., Copper (I) compounds useful as deposition precursors of copper thin films.
  7. Xu,Chongying; Borovik,Alexander; Baum,Thomas H., Copper (I) compounds useful as deposition precursors of copper thin films.
  8. Mears Robert J. (Hampshire GB2) Reekie Laurence (Hampshire GB2) Poole Simon B. (Hampshire GB2) Payne David N. (Hampshire GB2), Fabrication of optical fibers.
  9. Kirlin Peter S., Ferroelectric capacitor and integrated circuit device comprising same.
  10. Roeder Jeffrey ; Van Buskirk Peter C., Ferroelectric integrated circuit structure.
  11. Mikoshiba Nobuo,JPX ; Tsubouchi Kazuo,JPX ; Masu Kazuya,JPX, Gas feeding device for controlled vaporization of an organanometallic compound used in deposition film formation.
  12. Van Buskirk Peter C. ; Bilodeau Steven M. ; Carl ; Jr. Ralph J., Liquid delivery system, heater apparatus for liquid delivery system, and vaporizer.
  13. Fujiwara Seishi,JPX ; Komine Norio,JPX ; Jinbo Hiroki,JPX ; Suwa Toshitsugu,JPX, Manufacturing method of synthetic silica glass.
  14. Seishi Fujiwara JP; Norio Komine JP; Hiroki Jinbo JP, Manufacturing method of synthetic silica glass.
  15. Hawtof, Daniel W.; Henderson, Danny L.; Smith, Greg E.; Urruti, Eric H., Method and apparatus for forming fused silica by combustion of liquid reactants.
  16. Blackwell Jeffery L. ; Fu Xiaodong ; Hawtof Daniel W. ; Henderson Danny L., Method and apparatus for forming silica by combustion of liquid reactants using a heater.
  17. Ku, Vincent W.; Chen, Ling; Wu, Dien-Yeh; Ouye, Alan H.; Wysok, Irena, Method and apparatus for gas temperature control in a semiconductor processing system.
  18. Boardman, William John; Mercado, Raul Donate; Tudhope, Andrew William, Method for directing plasma flow to coat internal passageways.
  19. Blackwell Jeffery Lynn ; Fu Xiaodong ; Hawtof Daniel Warren ; Powers Dale Robert, Method for forming silica by combustion of liquid reactants using oxygen.
  20. Galante, Marco; Arimondi, Marco; Roba, Giacomo Stefano; Santi, Ilenia, Method for vaporizing a liquid reactant in manufacturing a glass preform.
  21. Kirlin Peter S., Method of fabricating a ferrolelectric capacitor with a graded barrier layer structure.
  22. Gardiner Robin A. ; Kirlin Peter S. ; Baum Thomas H. ; Gordon Douglas ; Glassman Timothy E. ; Pombrik Sofia ; Vaartstra Brian A., Method of forming metal films on a substrate by chemical vapor deposition.
  23. Williams Richard R. (Wilmington NC), Method of providing vaporized halide-free, silicon-containing compounds.
  24. Roeder Jeffrey ; Van Buskirk Peter C., Multiple vaporizer reagent supply system for chemical vapor deposition utilizing dissimilar precursor compositions.
  25. Dong Liang,GBX ; Reekie Laurence,GBX ; Payne David Neil,GBX, Optical fibre and optical fibre device.
  26. Nonaka Tsuyoshi,JPX ; Hosoya Toshifumi,JPX ; Kobayashi Yuji,JPX ; Matsuda Yasuo,JPX, Plastic optical fiber preform, and process and apparatus for producing the same.
  27. Gardiner Robin A. ; Kirlin Peter S. ; Baum Thomas H. ; Gordon Douglas ; Glassman Timothy E. ; Pombrik Sofia ; Vaartstra Brian A., Precursor compositions for chemical vapor deposition, and ligand exchange resistant metal-organic precursor solutions.
  28. Roeder Jeffrey ; Van Buskirk Peter C., Process for controlled orientation of ferroelectric layers.
  29. Bergman Eric J. ; Berner Robert W. ; Oberlitner David, Semiconductor processing using vapor mixtures.
  30. Gardiner, Robin A.; Baum, Thomas H.; Gordon, Douglas Cameron; Gordon, legal representative, Connie L.; Glassman, Timothy E.; Pombrik, Sofia; Vaartstra, Brian A.; Kirlin, Peter S., Source reagent compositions and method for forming metal films on a substrate by chemical vapor deposition.
  31. Gardiner,Robin A.; Baum,Thomas H.; Gordon, legal representative,Connie L.; Glassman,Timothy E.; Pombrik,Sophia; Vaastra,Brian A.; Kirlin,Peter S.; Gordon, deceased,Douglas Cameron, Source reagent compositions and method for forming metal films on a substrate by chemical vapor deposition.
  32. Kirlin Peter S. ; Binder Robin L. ; Gardiner Robin A. ; Van Buskirk Peter ; Stauf Gregory ; Zhang Jiming, Source reagent liquid delivery apparatus, and chemical vapor deposition system comprising same.
  33. Hinkle Luke D. ; Lischer D. Jeffrey, System for delivering a substantially constant vapor flow to a chemical process reactor.
  34. Bhandari Gautam ; Baum Thomas H., Tantalum amide precursors for deposition of tantalum nitride on a substrate.
  35. Gautam Bhandari ; Thomas H. Baum, Tantalum amide precursors for deposition of tantalum nitride on a substrate.
  36. Chen, Tianniu; Xu, Chongying; Roeder, Jeffrey F.; Baum, Thomas H., Tantalum amido-complexes with chelate ligands useful for CVD and ALD of TaN and Ta0thin films.
  37. Chen, Tianniu; Xu, Chongying; Roeder, Jeffrey F.; Baum, Thomas H., Tantalum amido-complexes with chelate ligands useful for CVD and ALD of TaN and Ta205 thin films.
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