IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0506993
(1983-06-23)
|
우선권정보 |
FR-0012404 (1982-07-06) |
발명자
/ 주소 |
- Le Car Grard (Nancy FRX) Dubois Jean-Marie (Pompey FRX)
|
출원인 / 주소 |
- Centre National de la Recherche Scientifique “CNRS” (Paris FRX 07)
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인용정보 |
피인용 횟수 :
17 인용 특허 :
1 |
초록
▼
The present invention relates to substantially amorphous or microcrystalline aluminium-base alloys. Such alloys are of the following chemical composition: AlaMbM′cXdYe in which: 50≤a≤95 atom % M representing one or more metals of the group Mn, Ni, Cu, Zr, Ti, V, Cr, Fe and Co with: 0≤b≤40 atom % M′r
The present invention relates to substantially amorphous or microcrystalline aluminium-base alloys. Such alloys are of the following chemical composition: AlaMbM′cXdYe in which: 50≤a≤95 atom % M representing one or more metals of the group Mn, Ni, Cu, Zr, Ti, V, Cr, Fe and Co with: 0≤b≤40 atom % M′representing Mo and/or W with: 0≤c≤15 atom % X representing one or more elements of the group Ca, Li, Mg, Ge, Si and Zn, with: 0≤d≤20 atom % Y representing the inevitable production impurities such as O, N, C, H, He, Ga, etc . . . , the proportion of which does not exceed 3 atom %. The alloys according to the invention can be produced by means of known methods in the form of wires, strips, bands, sheets or powders in the amorphous or microcrystallized state, the grain size of which is less than 1000 nm, preferably 100 nm. They may be used either directly or as means for reinforcing other materials, or as surface coatings which are resistant to corrosion or wear.
대표청구항
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A substantially amorphous or microcrystallized Al-based alloy, said alloy being of the formula: AlaMbCub′Mc′XdYe, wherein a+b+b′+c+d+e=100 and 50≤a≤95 atom %, 15≤b≤40 atom %, 6≤b′≤25 atom %, 0≤c≤15 atom %, 0≤d≤20 atom % and e≤1 atom %, and wherein M is an element selected from the group consisting o
A substantially amorphous or microcrystallized Al-based alloy, said alloy being of the formula: AlaMbCub′Mc′XdYe, wherein a+b+b′+c+d+e=100 and 50≤a≤95 atom %, 15≤b≤40 atom %, 6≤b′≤25 atom %, 0≤c≤15 atom %, 0≤d≤20 atom % and e≤1 atom %, and wherein M is an element selected from the group consisting of Mn, Ni, Zr, Cr, Ti, V, Fe and Co; M′is an element selected from the group consisting of Mo, W and mixtures thereof; X is an element selected from the group consisting of Ca, Li, Mg, Ge, Si and Zn; and Y represents the inevitably present impurities.
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