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Apparatus and method for detecting defects and dust on a patterned surface 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01N-021/89
출원번호 US-0399290 (1982-07-19)
우선권정보 GB-0004340 (1982-02-15)
발명자 / 주소
  • Steigmeier Edgar F. (Hedingen CHX) Auderset Heinrich (Horgen CHX)
출원인 / 주소
  • RCA Corporation (Princeton NJ 02)
인용정보 피인용 횟수 : 57  인용 특허 : 6

초록

Apparatus for detecting defects and dust on patterned surfaces, such as patterned wafers, or grooved video disks, utilizes a scanning laser that provides light scattered by defects and dust. The scattered light is detected substantially free of diffracted beams from the pattern by a mask having aper

대표청구항

In an apparatus of the type for optically detecting microscopic defects in a certain specularly reflecting surface of a given object, said surface having at least on a portion thereof a diffraction grating pattern or at least some elements of a diffraction grating pattern capable of diffracting said

이 특허에 인용된 특허 (6)

  1. Hudson Kenneth C. (Philadelphia PA), Defect detection and plotting system.
  2. Firester Arthur Herbert (Skillman NJ) Gorog Istvan (Princeton NJ), Defect detection system.
  3. Steigmeier Edgar F. (Hedingen CHX) Knop Karl (Zurich CHX), Defect detection system.
  4. Koizumi Mitsuyoshi (Yokohama JPX) Akiyama Nobuyuki (Yokohama JPX) Oshima Yoshimasa (Yokohama JPX), Method and apparatus for inspecting specimen surface.
  5. Steigmeier Edgar F. (Hedingen CHX) Auderset Heinrich (Horgen CHX), Method for determining the quality of light scattering material.
  6. Suzki Akiyoshi (Tokyo JPX) Kano Ichiro (Yokohama JPX) Yoshinari Hideki (Yokohama JPX) Tozuka Masao (Ohmiya JPX) Hiraga Ryozo (Yokohama JPX) Kato Yuzo (Yokohama JPX) Ogino Yasuo (Yokohama JPX), Photoelectric detecting apparatus.

이 특허를 인용한 특허 (57)

  1. Raymond, Chris; Hummel, Steve, Apparatus and method for enhanced critical dimension scatterometry.
  2. Noam Dotan IL, Apparatus and method for reviewing defects on an object.
  3. Tanaka Hiroshi (Yokohama JPX) Iwata Hiromitsu (Yokohama JPX) Kakizaki Yukio (Yokohama JPX), Apparatus for conveying and inspecting a substrate.
  4. Ahner, Joachim Walter; Tung, David M.; McLaurin, Stephen Keith, Apparatuses and methods for magnetic features of articles.
  5. Tung, David M.; Ahner, Joachim W., Article edge inspection.
  6. Ahner, Joachim Walter; Wong, Samuel Kah Hean; Nassirou, Maissarath; Lott, Henry Luis; Tung, David M.; Zavaliche, Florin; McLaurin, Stephen Keith, Chemical characterization of surface features.
  7. Ahner, Joachim Walter; Wong, Samuel Kah Hean; Nassirou, Maissarath; Lott, Henry Luis; Tung, David M.; Zavaliche, Florin; McLaurin, Stephen Keith, Chemical characterization of surface features.
  8. Ahner, Joachim Walter; Tung, David M.; Wong, Samuel Kah Hean; Lott, Henry Luis; McLaurin, Stephen Keith; Nassirou, Maissarath; Zavaliche, Florin, Classification of surface features using fluorescence.
  9. Ahner, Joachim Walter; Tung, David M.; Wong, Samuel Kah Hean; Lott, Henry Luis; McLaurin, Stephen Keith; Nassirou, Maissarath; Zavaliche, Florin, Classification of surface features using fluoresence.
  10. Ruprecht, David John, Defect classification using scattered light intensities.
  11. Vaez-Iravani, Mehdi; Rzepiela, Jeffrey Alan; Treadwell, Carl; Zeng, Andrew; Fiordalice, Robert, Defect detection system.
  12. Vaez-Iravani, Mehdi; Rzepiela, Jeffrey Alan; Treadwell, Carl; Zeng, Andrew; Fiordalice, Robert, Defect detection system.
  13. Meyer, Udo; Markus, Susanne; Dieckhoff, Stefan, Device for testing the quality of microstructurization.
  14. Takahashi Ippei (Shizuoka JPX) Wakita Takeshi (Shizuoka JPX), Disk surface inspection method and apparatus therefor.
  15. Ahner, Joachim Walter; Tung, David M.; Wong, Samuel Kah Hean; Lott, Henry Luis; McLaurin, Stephen Keith; Nassirou, Maissarath; Zavaliche, Florin, Distinguishing foreign surface features from native surface features.
  16. Hiramatsu Akira (Yokohama JPX) Sato Yuichi (Yokohama JPX) Tsunekawa Tokuichi (Yokohama JPX) Yamada Shigeki (Yokohama JPX) Kobayashi Takeshi (Yokohama JPX) Katsuma Makoto (Wako JPX), Image data reading apparatus.
  17. Vaez Iravani,Mehdi, Inspection system for integrated applications.
  18. Karpol,Avner; Reinhorn,Silviu; Elysaf,Emanuel; Yalov,Shimon; Kenan,Boaz, Method and apparatus for article inspection including speckle reduction.
  19. Eom,Tae Min; Yang,Yu Sin; Jun,Chung Sam; Jee,Yun Jung; Kim,Joung Soo; Kim,Moon Kyung; Chon,Sang Mun; Choi,Sun Yong, Method and apparatus for inspecting a wafer surface.
  20. Tomie, Toshihisa, Method and apparatus for inspecting multilayer masks for defects.
  21. Couronne, Robert; Kuleschow, Andreas; Spinnler, Klaus, Method and device for recognizing a coin by using the embossed pattern thereof.
  22. Pailliotet, Pierre-Marie, Method and system for non-destructive dye penetration testing of a surface.
  23. Uemura Noriyuki,JPX ; Motoura Hisami,JPX ; Nishimura Masashi,JPX ; Kohno Mitsuo,JPX, Method of fabricating an epitaxial wafer.
  24. Leirfall, Lasse, Monitoring dust deposition.
  25. Leslie, Brian C.; Nikoonahad, Mehrdad; Wells, Keith B., Optical scanning system for surface inspection.
  26. Leslie,Brian C.; Nikoonahad,Mehrdad; Wells,Keith B., Optical scanning system for surface inspection.
  27. Leslie,Brian C.; Nikoonahad,Mehrdad; Wells,Keith B., Optical scanning system for surface inspection.
  28. Heine, Wolfgang; Spriegel, Dieter; Stockmann, Michael; Weber, Martin, Optical sensor and method for optically inspecting surfaces.
  29. Almogy, Gilad; Naftali, Ron; Guetta, Avishay; Shoham, Doron, Process and assembly for non-destructive surface inspection.
  30. Almogy,Gilad; Naftali,Ron; Guetta,Avishay; Shoham,Doron, Process and assembly for non-destructive surface inspection.
  31. Marxer Norbert,LIX ; Gross Kenneth P. ; Altendorfer Hubert ; Kren George, Process and assembly for non-destructive surface inspections.
  32. Marxer, Norbert; Gross, Kenneth P.; Altendorfer, Hubert; Kren, George, Process and assembly for non-destructive surface inspections.
  33. Marxer,Norbert; Gross,Kenneth P.; Altendorfer,Hubert; Kren,George, Process and assembly for non-destructive surface inspections.
  34. Marxer,Norbert; Gross,Kenneth P.; Altendorfer,Hubert; Kren,George, Process and assembly for non-destructive surface inspections.
  35. Dutton G. Wayne (7010 Weld Co. Rd. 1 Longmont CO 80501), Process for sensing defects on a smooth cylindrical interior surface in tubing.
  36. Ahner, Joachim W.; Tung, David M.; McLaurin, Stephen Keith; Grodt, Travis W., Reflective surfaces for surface features of an article.
  37. Vaez Iravani,Mehdi; Stokowski,Stanley; Zhao,Guoheng, Sample inspection system.
  38. Vaez Iravani,Mehdi; Stokowski,Stanley; Zhao,Guoheng, Sample inspection system.
  39. Vaez Iravani,Mehdi; Stokowski,Stanley; Zhao,Guoheng, Sample inspection system.
  40. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  41. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  42. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  43. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  44. Nikoonahad, Mehrdad; Stokowski, Stanley E., Scanning system for inspecting anamolies on surfaces.
  45. Nikoonahad,Mehrdad; Stokowski,Stanley E., Scanning system for inspecting anomalies on surfaces.
  46. Quackenbos George S. (Newburyport MA) Ormsby Jay L. (Salem NH) Chase Eric T. (Andover MA) Broude Sergey V. (Acton MA) Nishine Koichi (Westford MA), Surface defect detection and confirmation system and method.
  47. Ahner, Joachim Walter; Tung, David M., Surface feature manager.
  48. Ahner, Joachim Walter; Tung, David M., Surface feature manager.
  49. Tung, David M.; Ahner, Joachim W., Surface features by azimuthal angle.
  50. Ahner, Joachim Walter; McLaurin, Stephen Keith; Wong, Samuel Kah Hean; Lott, Henry Luis, Surface features characterization.
  51. Ahner, Joachim W.; McLaurin, S. Keith, Surface features mapping.
  52. Ahner, Joachim W.; McLaurin, S. Keith, Surface features mapping.
  53. Okawa, Takashi; Mitomo, Kenji, Surface inspection method and surface inspection apparatus.
  54. Okawa, Takashi; Mitomo, Kenji, Surface inspection method and surface inspection apparatus.
  55. Imaino, Wayne Isami; Juliana, Anthony; Latta, Milton Russell; Lee, Charles H.; Leung, Wai Cheung; Rosen, Hal J.; Meeks, Steven; Sonningfeld, Richard, Surface inspection tool.
  56. Quackenbos George S. (Newburyport MA) Ormsby Jay L. (Salem NH) Chase Eric T. (Andover MA) Broude Sergey V. (Acton MA) Nishine Koichi (Westford MA), Surface pit detection system and method.
  57. Biellak,Steve; Stokowski,Stanley E.; Vaez Iravani,Mehdi, Systems and methods for a wafer inspection system using multiple angles and multiple wavelength illumination.
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