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Lift off compensation of eddy current crack detection system by controlling damping resistance of oscillator 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01N-027/72
  • G01N-027/82
  • G01R-033/12
출원번호 US-0650667 (1984-09-13)
우선권정보 GB-0009704 (1981-03-27)
발명자 / 주소
  • Lale Peter G. (Harpenden GBX) Hocking Donald H. (St. Albans GBX)
출원인 / 주소
  • Hocking Electronics Limited (Hertsfordshire GB2 03)
인용정보 피인용 횟수 : 47  인용 특허 : 2

초록 ▼

An eddy current crack detection system has an inductive probe coil forming part of an oscillatory circuit. The coil voltage is fed to a measuring device a change in amplitude of the coil voltage being used as an indication of a crack. In order to compensate for lift-off in the amplitude of the coil

대표청구항 ▼

An eddy current crack detection system comprising an inductive probe coil forming part of an oscillatory circuit and a measuring device arranged to monitor the amplitude of the oscillating voltage across the probe coil whereby to detect cracks, characterised in that in order to substantially nullify

이 특허에 인용된 특허 (2)

  1. Savidge David H. (Rotherham GB2) Wadsworth Eric (Sheffield GB2), Dual channel apparatus for detecting surface defects in elongate metallic members with liftoff compensation.
    상세보기
  2. Hecht Hans (Stuttgart DEX) Neumaier Peter (Reutlingen DEX), Method and apparatus for testing a metallic workpiece by inducing eddy currents therein.
    상세보기

이 특허를 인용한 특허 (47)

  1. Paik,Young J., Adjusting manufacturing process control parameter using updated process threshold derived from uncontrollable error.
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  2. Freal-Saison Jean-Michel (Chatou FRX), Apparatus for regulating the concentration of an oxidizing solution by measuring the redox potential thereof.
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  3. Schwarm,Alexander T., Automated design and execution of experiments with integrated model creation for semiconductor manufacturing tools.
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  4. Arackaparambil,John F.; Chi,Tom; Chow,Billy; D'Souza,Patrick M.; Hawkins,Parris; Huang,Charles; Jensen,Jett; Krishnamurthy,Badri N.; Kulkarni,Pradeep M.; Kulkarni,Prakash M.; Lin,Wen Fong; Mohan,Shan, Computer integrated manufacturing techniques.
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  5. Arackaparambil,John F.; Chi,Tom; Chow,Billy; D'Souza,Patrick M.; Hawkins,Parris; Huang,Charles; Jensen,Jett; Krishnamurthy,Badri N.; Kulkarni,Pradeep M.; Kulkarni,Prakash M.; Lin,Wen Fong; Mohan,Shan, Computer integrated manufacturing techniques.
    상세보기
  6. Paik, Young Joseph, Control of chemical mechanical polishing pad conditioner directional velocity to improve pad life.
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  7. Paik,Young Joseph, Control of chemical mechanical polishing pad conditioner directional velocity to improve pad life.
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  8. Cooper, Jared Klineman; Eldredge, David Allen; Golden, Samuel William, Distributed energy management system and method for a vehicle system.
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  9. Shanmugasundram, Arulkumar P.; Schwarm, Alexander T., Dynamic metrology schemes and sampling schemes for advanced process control in semiconductor processing.
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  10. Shanmugasundram, Arulkumar P.; Schwarm, Alexander T., Dynamic metrology schemes and sampling schemes for advanced process control in semiconductor processing.
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  11. Shanmugasundram, Arulkumar P.; Schwarm, Alexander T., Dynamic metrology schemes and sampling schemes for advanced process control in semiconductor processing.
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  12. Paik, Young Jeen, Dynamic offset and feedback threshold.
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  13. Chi, Yueh-Shian; Hawkins, Parris C M; Huang, Charles Q., Dynamic subject information generation in message services of distributed object systems.
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  14. Chi,Yueh shian T.; Hawkins,Parris C. M.; Huang,Charles Q., Dynamic subject information generation in message services of distributed object systems in a semiconductor assembly line facility.
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  15. Albert Rudolph Taylor, Eddy current probe with an adjustable bisected sensing end.
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  16. Krishnamurthy,Badri N.; Hawkins,Parris C. M., Experiment management system, method and medium.
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  17. Shanmugasundram, Arulkumar P.; Schwarm, Alexander T.; Prabhu, Gopalakrishna B., Feedback control of a chemical mechanical polishing device providing manipulation of removal rate profiles.
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  18. Shanmugasundram,Arulkumar P.; Schwarm,Alexander T.; Prabhu,Gopalakrishna B., Feedback control of a chemical mechanical polishing device providing manipulation of removal rate profiles.
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  19. Shanmugasundram, Arulkumar P.; Schwarm, Alexander T.; Iliopoulos, Ilias; Parkhomovsky, Alexander; Seamons, Martin J., Feedback control of plasma-enhanced chemical vapor deposition processes.
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  20. Paik,Young Joseph, Feedforward and feedback control for conditioning of chemical mechanical polishing pad.
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  21. Shanmugasundram,Arulkumar P.; Schwarm,Alexander T., Integrating tool, module, and fab level control.
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  22. Reiss,Terry P.; Shanmugasundram,Arulkumar P.; Schwarm,Alexander T., Integration of fault detection with run-to-run control.
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  23. Lei,Lawrence C.; Lu,Siqing; Chang,Yu; Martner,Cecilia; Pham,Quyen; Gu,Yu Ping; Huston,Joel; Smith,Paul; Miller,Gabriel Lorimer, Method and apparatus for dynamically measuring the thickness of an object.
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  24. Lei, Lawrence C.; Lu, Siqing; Chang, Yu; Martner, Cecilia; Pham, Quyen; Gu, Yu Ping; Huston, Joel; Smith, Paul; Miller, Gabriel Lorimer, Method and apparatus for measuring a thickness of a layer of a wafer.
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  25. Groninger, Daniel Scott; Kaliaperumal, Soundarrajan; Swyers, Galen Lee; Perrett, David George, Method and system for eddy current device dynamic gain adjustment.
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  26. Schwarm,Alexander T.; Shanmugasundram,Arulkumar P.; Pan,Rong; Hernandez,Manuel; Mohammad,Amna, Method of feedback control of sub-atmospheric chemical vapor deposition processes.
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  27. Kokotov,Yuri; Entin,Efim; Seror,Jacques; Fisher,Yossi; Sarel,Shalomo; Shanmugasundram,Arulkumar P.; Schwarm,Alexander T.; Paik,Young Jeen, Method, system and medium for controlling manufacture process having multivariate input parameters.
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  28. Al Bayati,Amir; Adibi,Babak; Foad,Majeed; Somekh,Sasson, Method, system and medium for controlling semiconductor wafer processes using critical dimension measurements.
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  29. Shanmugasundram,Arulkumar P.; Armer,Helen; Schwarm,Alexander T., Method, system and medium for process control for the matching of tools, chambers and/or other semiconductor-related entities.
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  30. Schwarm,Alexander T.; Shanmugasundram,Arulkumar P.; Seror,Jacques; Kokotov,Yuri; Entin,Efim, Method, system, and medium for handling misrepresentative metrology data within an advanced process control system.
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  31. Wherritt, Peter, Permittivity sensor.
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  32. Tamura Yoshikazu (Fuchu JPX) Kitajima Katsuo (Fuchu JPX), Power supply system for a quadrupole mass spectrometer.
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  33. Paik,Young J., Process control by distinguishing a white noise component of a process variance.
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  34. Paik,Young Jeen, Process control by distinguishing a white noise component of a process variance.
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  35. Cooper, Jared Klineman; Kumar, Ajith Kuttannair; Noffsinger, Joseph Forrest, Route examining system and method.
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  36. Kumar, Ajith Kuttannair; Fries, Jeffrey Michael; Noffsinger, Joseph Forrest; Mitchell, Michael Scott; Ehret, Steven Joseph, Route examining system and method.
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  37. Noffsinger, Joseph Forrest; Kumar, Ajith Kuttannair; Plotnikov, Yuri Alexeyevich; Fries, Jeffrey Michael; Boyanapally, Srilatha; Ehret, Steven Joseph, Route examining system and method.
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  38. Padhi,Deenesh; Gandikota,Srinivas; Naik,Mehul; Parikh,Suketu A.; Dixit,Girish A., Selective metal encapsulation schemes.
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  39. Kumar, Ajith Kuttannair; Noffsinger, Joseph Forrest; Nieters, Edward James, System and method for acoustically identifying damaged sections of a route.
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  40. Kumar, Ajith Kuttannair; Eldredge, David; Ballesty, Daniel; Cooper, Jared Klineman; Roney, Christopher; Houpt, Paul; Mathe, Stephen; Julich, Paul; Kisak, Jeffrey; Shaffer, Glenn; Nelson, Scott; Daum, Wolfgang, System and method for vehicle control.
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  41. Napolitano, James Andrew; Meyer, Brian Nedward, System and method for vehicle operation.
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  42. Otsubo, Tom; Daum, Wolfgang; Stull, Craig Alan; Hann, Gregory; Danner, Phillip, System, method and computer software code for determining a mission plan for a powered system using signal aspect information.
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  43. Schwarm,Alexander T., System, method, and medium for monitoring performance of an advanced process control system.
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  44. Surana,Rahul; Zutshi,Ajoy, Technique for process-qualifying a semiconductor manufacturing tool using metrology data.
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  45. Kumar, Ajith Kuttannair; Shaffer, Glenn Robert; Houpt, Paul Kenneth; Movsichoff, Bernardo Adrian; Chan, David So Keung; Eker, Sukru Alper, Trip optimization system and method for a train.
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  46. Cooper, Jared Klineman; Kumar, Ajith Kuttannair; Smith, Eugene; Nagrodsky, Nick David; Schoonmaker, William Cherrick; Goodermuth, Todd William, Vehicle consist configuration control.
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  47. Palou-Rivera, Ignasi; Swedek, Boguslaw A.; Karuppiah, Lakshmanan, Wafer edge characterization by successive radius measurements.
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