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Auto-focus alignment and measurement system and method 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01B-011/00
출원번호 US-0364681 (1982-04-02)
발명자 / 주소
  • Allen David L. (Cupertino CA) Larsen Tor G. (Saratoga CA)
출원인 / 주소
  • Eaton Corporation (Cleveland OH 02)
인용정보 피인용 횟수 : 27  인용 특허 : 10

초록

An auto-focusing alignment and measurement system for use in precisely positioning a semiconductor substrate with respect to an integrated circuit mask is herein disclosed. This system includes a moveable convergent lens operable with another pair of convergent lenses for alternately focusing images

대표청구항

Apparatus for focusing on first and second spaced-apart object planes, said apparatus comprising: first imaging means, movably disposed along an optical axis, for providing a first focal plane disposed toward the first and second object planes; second imaging means, disposed along the optical axis o

이 특허에 인용된 특허 (10)

  1. Van Dijk Ate (Eindhoven NL), Autofocus circuit for a videodisc playback device.
  2. Levy Kenneth (Saratoga CA) Sandland Paul (San Jose CA), Automatic photomask inspection system and apparatus.
  3. Utsumi Yoshihiro (Musashino JPX), Focus control system for optical read-out apparatus.
  4. Asano Noriyuki (Kawasaki JPX) Niwa Yukichi (Yokohama JPX) Ohwada Mitsutoshi (Yokohama JPX) Yamagata Takaaki (Tokyo JPX) Tsuda Shin (Kawagoe JPX), Focus detecting device with photo-sensor array.
  5. Frosch ; Albert ; Mannsdorfer ; Walter ; Scheuing ; Claus, Gap measuring device for defining the distance between two or more surfaces.
  6. Hosoe Kazuya (Machida JPX) Asaeda Tsuyoshi (Sagamihara JPX) Yokota Hideo (Tokyo JPX) Shingu Tamotsu (Zushi JPX), Method and system for detecting sharpness of an object image.
  7. Binder ; Johann, Method for automatic adjustment.
  8. Suzuki Etsuji (Yokohama JPX) Yasue Itaru (Yokohama JPX) Kashihama Tomio (Yokohama JPX), Method of positioning a semiconductor member by examining it and a die bonding apparatus using the same.
  9. Immink Kornelis A. (Eindhoven NLX) Bierhoff Martinus P. M. (Eindhoven NLX) Heemskerk Jacobus P. J. (Eindhoven NLX), Optical focusing device with two controls.
  10. Lacombat Michel (Paris FRX) Gerard Rene (Paris FRX), Optical system for projecting patterns comprising a constant-magnification focusing servocontrol.

이 특허를 인용한 특허 (27)

  1. Kato Masaki,JPX ; Kato Kinya,JPX ; Nara Kei,JPX, Alignment method.
  2. Karasaki Koichi (Hadano JPX) Kobayashi Mamoru (Hadano JPX) Hara Yasuhiko (Machida JPX), Component alignment method.
  3. Littau,Michael E.; Raymond,Christopher J., Determination of center of focus by cross-section analysis.
  4. Kazuaki Suzuki JP, Exposure control apparatus and method.
  5. Suzuki Kazuaki,JPX, Exposure control apparatus and method.
  6. Sato Eiichi (Tokyo JPX) Koshiishi Kiyozo (Sagamihara JPX) Shigetomi Sadao (Sagamihara JPX) Tanaka Syunpei (Tokyo JPX) Yoshinaga Makoto (Tokyo JPX) Morita Terumasa (Tokyo JPX) Nagano Chikara (Tokyo JP, Fine surface profile measuring apparatus.
  7. Bruning John H. (Pittsford NY) Siddell Graham J. (Rochester NY), Integrated metrology for microlithographic objective reducing lens.
  8. Anhut, Tiemo; Schwedt, Daniel; Wolleschensky, Ralf; Wittig, Lars-Christian; Preiβer, Ulrich, Light scanning microscope with spectral detection.
  9. Pezzaniti, J Larry; Vaden, Justin Parker; Roche, Michael Ernest, Long wave infrared imaging polarimeter, and method of assembly.
  10. Lai Feng-Liang,TWX ; Tseng Ming-Huei,TWX ; Turn Li-Kong,TWX ; Kung Li-Wei,TWX, Mark focusing system for steppers.
  11. Saint Clair, Jonathan M.; Voth, Mitchell D.; Soreide, David C.; Sherman, William D., Method and apparatus for combining a targetless optical measurement function and optical projection of information.
  12. Levinson Harry J., Method and apparatus for wafer-focusing.
  13. Bradley L. Hunter ; Steven P. Cahill ; Jonathan S. Ehrmann ; Michael Plotkin, Method and system for precisely positioning a waist of a material-processing laser beam to process microstructures within a laser-processing site.
  14. Hunter, Bradley L.; Cahill, Steven P.; Ehrmann, Jonathan S.; Plotkin, Michael, Method and system for precisely positioning a waist of a material-processing laser beam to process microstructures within a laser-processing site.
  15. Hunter,Bradley L.; Cahill,Steven P.; Ehrmann,Jonathan S.; Plotkin,Michael, Method and system for precisely positioning a waist of a material-processing laser beam to process microstructures within a laser-processing site.
  16. Yang, Wei; Chen, Li, Method for fabricating integrated optical components using ultraviolet laser techniques.
  17. Farino Anthony J. ; Montague Stephen ; Sniegowski Jeffry J. ; Smith James H. ; McWhorter Paul J., Method for photolithographic definition of recessed features on a semiconductor wafer utilizing auto-focusing alignment.
  18. Cordingley, James J.; Griffiths, Joseph J.; Smart, Donald V., Methods and systems for precisely relatively positioning a waist of a pulsed laser beam and method and system for controlling energy delivered to a target structure.
  19. Cordingley,James J.; Griffiths,Joseph J.; Smart,Donald V., Methods and systems for precisely relatively positioning a waist of a pulsed laser beam and method and system for controlling energy delivered to a target structure.
  20. Alumot, David; Neumann, Gad; Sherman, Rivka; Tirosh, Ehud, Optical inspection apparatus for substrate defect detection.
  21. Kipphan Helmut (Schwetzingen DEX), Register-measuring system.
  22. Takahashi Kazuo (Kawasaki JPX) Kosugi Masao (Yokohama JPX), Step-and-repeat alignment and exposure method and apparatus.
  23. Takahashi Kazuo (Kawasaki JPX) Kosugi Masao (Yokohama JPX), Step-and-repeat alignment and exposure method and apparatus.
  24. Shimizu Hisayuki (Yokohama JPX), Substrate exposure apparatus with flatness detection and alarm.
  25. Cordingley, James J.; Plotkin, Michael; Keefe, John, System and method for automatic laser beam alignment.
  26. Manns William G. (Dallas TX) Wood Anthony B. (Dallas TX) Gordon Michael (Dallas TX) Weeks Don J. (Southlake TX) Hudiburgh Tom G. (Carrollton TX) Norwood David A. (Richardson TX), Target autoalignment for pattern inspector or writer.
  27. Sato Mitsuya (Yokohama JPX), Wafer prober.
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