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Polyimides, a process for their preparation and their use 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C08G-069/26
출원번호 US-0608755 (1984-05-10)
우선권정보 CH-0002690 (1983-05-18); CH-0005571 (1983-10-12)
발명자 / 주소
  • Pfeifer Josef (Therwil CHX)
출원인 / 주소
  • Ciba-Geigy Corporation (Ardsley NY 02)
인용정보 피인용 횟수 : 51  인용 특허 : 5

초록

Homopolyimides and copolyimides of aromatic tetracarboxylic acids and aromatic diamines which are substituted in the two ortho-positions relative to at least one N atom by alkyl, alkoxy, alkoxyalkyl, cycloalkyl or aralkyl, are soluble in organic solvents and have increased glass transition temperatu

대표청구항

A homopolyimide or copolyimide of at least one aromatic tetracarboxylic acid and at least one aromatic diamine, which essentially consists of 5 to 100 mol % of at least one structural element of the formula I [Figure] (I) and 95-0 mol % of at least one structural element of the formula II [Figure] (

이 특허에 인용된 특허 (5)

  1. Ohta Takayuki (Tokyo JPX) Yanaga Yukio (Yokohama JPX) Hino Seiichi (Yokohama JPX), Copolyamide acid and copolyimide.
  2. Giles ; Jr. Harold F. (Cheshire MA), Polyetherimide-EPDM terpolymer blends.
  3. Lee Raymond (Elk Grove Village IL) Okey David W. (Downers Grove IL) Ferro Gregory A. (Mt. Prospect IL), Polyimide foam from mixture of silicon containing diamine and different aromatic diamine.
  4. Makino Hiroshi (Ichihara JPX) Kusuki Yoshihiro (Ichihara JPX) Harada Takashi (Ichihara JPX) Shimazaki Hiroshi (Ichihara JPX) Isida Tosio (Ichihara JPX), Porous aromatic imide polymer membrane and a process for its manufacture.
  5. Igarashi Kazumasa (Osaka JPX) Yamaguchi Katsuhiko (Osaka JPX) Iko Kazuo (Osaka JPX) Miki Kazuyuki (Osaka JPX), Siloxane-modified polyimide precursor and polyimide.

이 특허를 인용한 특허 (51)

  1. Rohde Ottmar (Basel CHX) Schaffner Armin (Basel CHX), Adhesively bonded photostructurable polyimide film.
  2. Rohde Ottmar (Basel CHX) Schaffner Armin (Basel CHX), Adhesively bonded photostructurable polyimide film.
  3. Rohde Ottmar (Basel NY CHX) Jasne Stanley J. (Peekskill NY) Pfeifer Josef (Therwil CHX), Auto-photocrosslinkable copolyimides and polyimide compositions.
  4. Cawse, John, Curing agents.
  5. Pfeifer Josef (Therwil CHX) Duthaler Rudolf (Bettingen CHX), Diamino-9,10-dihydroanthracenes and polyamide acid (esters) and polyimides derived therefrom.
  6. Sheppard Clyde H. (Bellevue WA) Lubowitz Hyman R. (Rolling Hills Estates CA), Extended end cap monomer for making advanced composites.
  7. Hayes Richard A. (Hockessin DE), Highly soluble aromatic polyimides.
  8. Hayes Richard A. (Hockessin DE), Highly soluble aromatic polyimides.
  9. Hayes Richard A. (Hockessin DE), Highly soluble clear polyimides.
  10. Nelson, Craig R.; Wensley, C. Glen; Guindy, Wade W., Lithium inks and electrodes and batteries made therefrom.
  11. Nelson, Craig R.; Wensley, Glen C.; Guindy, Wade W., Lithium inks and electrodes and batteries made therefrom.
  12. Nelson, Craig R.; Wensley, Glen C.; Guindy, Wade W., Lithium inks and electrodes and batteries made therefrom.
  13. Pfeifer Josef (Therwil CHX), Material coated with polyamic acid ester.
  14. Lubowitz Hyman R. ; Sheppard Clyde H., Method for making multidimensional polyester oligomers.
  15. Lubowitz Hyman R. (Rolling Hills Estates CA) Sheppard Clyde H. (Bellevue WA) Stephenson Ronald R. (Kirkland WA), Method of making multidimensional polyesters.
  16. Sheppard Clyde H. (Boeing Aerospace Company ; P.O. Box 399 ; M/S 73-09 Seattle WA 98124-2499) Lubowitz Hyman R. (26 Coral Tree Ln. Rolling Hills Estates CA 90274), Methods for making liquid molding compounds using diamines and dicyanates.
  17. Lubowtiz Hyman R. (Rolling Hills Estates CA) Sheppard Clyde H. (Post Falls ID), Multiple chemically functional end cap monomers.
  18. Minegishi, Tomonori, Negative-type photosensitive resin composition, pattern forming method and electronic parts.
  19. Minegishi, Tomonori, Negative-type photosensitive resin composition, pattern forming method and electronic parts.
  20. Lee Chung J. (Amherst NY), Novel soluble polyimidesiloxanes and methods for their preparation and use.
  21. Lubowitz Hyman R. ; Sheppard Clyde H., Oligomers with multiple chemically functional end caps.
  22. Sheppard Clyde H. ; Lubowitz Hyman R., Phenylethynyl capped imides.
  23. David P. Sinclair ; Douglas E. Fjare ; John T. Hoback ; Terre L. VanKirk ; Donald E. Rubis ; David A. Wargowski ; Wen-Feng Liu ; Paul A. Sanchez, Photoimageable compositions and films for printed wiring board manufacture.
  24. Mueller Werner H. (E. Greenwich RI) Khanna Dinesh N. (W. Warwick RI) Vora Rohitkumar H. (W. Warwick RI), Photosensitive polyimide polymer compositions.
  25. Minegishi, Tomonori; Nogita, Rika; Iwashita, Kenichi, Photosensitive resin composition, process for producing patterned hardened film with use thereof and electronic part.
  26. Rohde Ottmar (Basel CHX) Perret Andr-Etienne (Les Geneveys-sur-Coffrane CHX) Pfeifer Josef (Therwil CHX), Photostructurable polyimide mixtures.
  27. Angelopoulos Marie ; Gelorme Jeffrey Donald ; Labadie Jeffrey William ; Lewis David Andrew ; Swanson Sally Ann ; Labianca Nancy Carolyn, Polyamic acid and polyimide from fluorinated reactant.
  28. Hupfer Bernd (North Kingstown RI), Polyamic acids, polyimides prepared from these and process for producing high-temperature resistant layers.
  29. Lubowitz, Hyman R.; Sheppard, Clyde H., Polyester oligomer.
  30. Takiue, Yoshiyasu, Polyimide copolymer oligomer, polyimide copolymer, and method for producing each of same.
  31. Takiue, Yoshiyasu, Polyimide copolymer, and production method for same.
  32. Hayes Richard A. (Hockessin DE), Polyimide gas separation membranes.
  33. Hayes Richard A. (Hockessin DE), Polyimide gas separation membranes.
  34. Zaopo,Antonio; Dubitsky,Yuri A.; Colombo,Marco, Polyimide optical waveguides and method for the preparation thereof.
  35. Matsuura Hidekazu (Oyama JPX) Miyadera Yasuo (Tsukuba JPX), Polyimides and thermosetting resin compositions containing the same.
  36. Pfeifer Josef (Therwil CHX) Duthaler Rudolf (Zrich CHX), Polyimides, a process for their preparation and their use, and tetracarboxylic acids and tetracarboxylic acid derivative.
  37. Pfeifer Josef (Therwil CHX) Duthaler Rudolf (Zurich CHX), Polyimides, a process for their preparation and their use, and tetracarboxylic acids and tetracarboxylic acid derivative.
  38. Marrocco ; III Matthew L. (Santa Ana CA) Wang Ying (Diamond Bar CA) Lee Virgil J. (La Verne CA), Polymers with heterocyclic side groups.
  39. Trimmer Mark S. ; Wang Ying ; Marrocco III Matthew L. ; Lee Virgil J., Polyphenylene co-polymers.
  40. Minegishi, Tomonori; Kawamura, Tomoko; Ohe, Masayuki; Nakamura, Yuki, Positive photosensitive resin composition, method for forming pattern, electronic component.
  41. Uchida, Makoto; Moteki, Shigeru; Tanaka, Ryutaro; Morita, Hiromi, Primer resin for semiconductor device and semiconductor device.
  42. Pfeifer Josef (Therwil CHX), Radiation-sensitive polycondensates, processes for their preparation, coated material and its use.
  43. Marrocco ; III Matthew L. (Santa Ana CA) Gagne Robert R. (Pasadena CA) Trimmer Mark Steven (Pasadena CA), Rigid-rod polymers.
  44. Marrocco ; III Matthew Louis ; Cagne Robert R. ; Trimmer Mark Steven, Rigid-rod polymers.
  45. Marrocco ; III Matthew Louis ; Gagne Robert R. ; Trimmer Mark Steven, Rigid-rod polymers.
  46. Marrocco ; III Matthew Louis ; Gagne Robert R. ; Trimmer Mark Steven, Rigid-rod polymers.
  47. Marrocco ; III Matthew Louis ; Gagne Robert R. ; Trimmer Mark Steven, Rigid-rod polymers.
  48. Marrocco ; III Matthew Louis ; Gagne Robert R. ; Trimmer Mark Steven ; Wang Ying, Rigid-rod polymers.
  49. Lubowitz Hyman R. (Rolling Hills Estates CA) Sheppard Clyde H. (Bellevue WA) Stephenson Ronald R. (Kirkland WA), Thallium catalyzed multidimensional ester oligomers.
  50. Takiue, Yoshiyasu, Transparent polyimide copolymer, polyimide resin composition and molded article, and production method of said copolymer.
  51. Takiue, Yoshiyasu, Transparent polyimide copolymer, polyimide resin composition and molded article, and production method of said copolymer.
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