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Turbulent incineration of combustible materials supplied in low pressure laminar flow 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • F23D-014/00
  • F23G-007/08
  • F23J-015/00
출원번호 US-0839668 (1986-03-14)
발명자 / 주소
  • Vickery Earl (San Jose CA) Yates Mark (Morgan Hill CA)
출원인 / 주소
  • American Hoechst Corporation (Somerville NJ 02)
인용정보 피인용 횟수 : 13  인용 특허 : 14

초록

An apparatus and method for incinerating combustible gases. The apparatus has first and second perpendicularly joined pipes and an igniter in the second pipe. Combustible gases laminarly flow into the second pipe and oxygen turbulently flows into the first. The gases turbulently mix, ignite and cent

대표청구항

An apparatus for incinerating combustible gases which comprises: (a) a first pipe member having open entrance and exit end portions and an inlet opening through the wall thereof intermediate said end portions; (b) a second pipe member having first and second ends, said first end being fixed about sa

이 특허에 인용된 특허 (14)

  1. Childs J. H. (North Olmsted OH), Apparatus for pollution abatement.
  2. Winnen Denis F. (Rotterdam NL), Combustion of halogenated hydrocarbon.
  3. Lackey Walter J. (Oak Ridge TN) Lowrie Robert S. (Oak Ridge TN) Sease John D. (Knoxville TN), Gas scrubbing liquids.
  4. Soneta, Eietsu; Urata, Tetsukazu, Method of and apparatus for burning exhaust gases containing gaseous silane.
  5. Germerdonk Rolf (Bergisch-Gladbach DEX) Borger Gotz-Gerald (Monheim DEX) Huning Werner (Odenthal DEX), Method of purifying gases by combustion.
  6. Germerdonk Rolf (Kaiserslautern DEX) Huning Werner (Odenthal-Hahnenberg DEX) Cirkel Rudolf (Cologne DEX) Brinkmann Gunter (Tonisvorst DEX), Process and apparatus for thermally purifying effluent gases.
  7. Klebe Hans (Rheinfelden DEX) Koth Detlev (Grenzach-Whylen DEX) Kerner Dieter (Hanau DEX) Schmid Josef (Rheinfelden DEX) Schmid Manfred (Kandern DEX), Process for the hydrophobization of pyrogenically produced silica.
  8. Harris Alexander T. (Metairie LA) Putman Charles R. (New Albany IN), Process for the incineration of chlorinated organic materials.
  9. Yaguchi Kunihide (Iwaki JPX) Takaiwa Masakazu (Iwaki JPX) Aoki Minoru (Iwaki JPX), Scrubber for removal of sulfur dioxide from exhaust gas.
  10. Hill Richard W. (Livermore CA) Skinner Dewey F. (Livermore CA) Thorsness Charles B. (Livermore CA), Silane-propane ignitor/burner.
  11. Dodson Christopher (Reading GB2), Slurry digester and capping arrangement for use therein.
  12. Scholten Joseph J. F. (Sittard NLX) van de Leemput Lambertus J. M. A. (Echt NLX), Supported chromium-oxide polymerization catalyst having a porous silica support used in the polymerization of olefines.
  13. Childree Herman Travis (Tyler TX), Waste gas burner assembly.
  14. Coleman Larry M. (Tonawanda NY) Tambo William (Chelmsford MA), Waste treatment in silicon production operations.

이 특허를 인용한 특허 (13)

  1. Ferron, Shawn; Kelly, John; Vermeulen, Robbert, Apparatus and method for controlled combustion of gaseous pollutants.
  2. Breen Bernard P. (Laguna Beach CA) Gabrielson James E. (Plymount MN) Lange Howard B. (San Clemente CA), Apparatus and method of reducing nitrogen oxide emissions.
  3. Lyon Richard K. (Pittstown NJ), Apparatus and methods for incineration of toxic organic compounds.
  4. Yoshiro Takemura JP; Kohtaro Kawamura JP; Yuji Shirao JP; Rikiya Nakamura JP, Combustor for treating exhaust gas.
  5. Takemura, Yoshiro; Kawamura, Kohtaro; Shirao, Yuji; Nakamura, Rikiya, Combustor for waste gas treatment.
  6. Takemura, Yoshiro; Kawamura, Kohtaro; Shirao, Yuji; Nakamura, Rikiya, Combustor for waste gas treatment.
  7. Holst Mark ; Carpenter Kent ; Lane Scott ; Arya Prakash V., Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases.
  8. Holst, Mark; Carpenter, Kent; Lane, Scott; Arya, Prakash V., Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases.
  9. Holst,Mark; Carpenter,Kent; Lane,Scott; Arya,Prakash V., Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases.
  10. Jose L. Arno ; Robert M. Vermeulen, Fluorine abatement using steam injection in oxidation treatment of semiconductor manufacturing effluent gases.
  11. Anderson Lawrence B. (Encinitas CA) Hammon Timothy E. (Cardiff CA) Frieler Cliff (Highland Park CA), Incinerator for complete oxidation of impurities in a gas stream.
  12. Clark, Daniel O.; Raoux, Sebastien; Vermeulen, Robert M.; Crawford, Shaun W., Methods and apparatus for sensing characteristics of the contents of a process abatement reactor.
  13. Chiu, Ho-Man Rodney; Clark, Daniel O.; Crawford, Shaun W.; Jung, Jay J.; Todd, Leonard B.; Vermeulen, Robbert, Reactor design to reduce particle deposition during process abatement.
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