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Foreign particle detecting method and apparatus 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01N-021/32
출원번호 US-0548516 (1983-11-03)
우선권정보 JP-0192462 (1982-11-04); JP-0192461 (1982-11-04); JP-0026156 (1983-02-21)
발명자 / 주소
  • Shiba Masataka (Yokohama JPX) Uto Sachio (Yokohama JPX) Koizumi Mitsuyoshi (Yokohama JPX)
출원인 / 주소
  • Hitachi, Ltd. (Tokyo JPX 03)
인용정보 피인용 횟수 : 36  인용 특허 : 2

초록

The foreign particle detecting method and apparatus are disclosed wherein a polarized laser beam emitted by a laser beam irradiating system from a direction inclined with respect to the direction perpendicular to the surface of a substrate is used by a scanning means to linearly scan the substrate s

대표청구항

A foreign particle detecting method comprising the steps of: irradiating two halves of a substrate having a frame with a pellicle mounted thereon with a respective laser beam emitted by a laser beam irradiating means in a direction inclined with respect to the substrate surface and polarized thereaf

이 특허에 인용된 특허 (2)

  1. Tanimoto Akikazu (Kawasaki JPX) Imamura Kazunori (Tokyo JPX), Foreign substance inspecting apparatus.
  2. Akiba Masakuni (Tokorozawa JPX) Nagatomo Hiroto (Tokyo JPX) Suzuki Jun (Higashimurayama JPX), Method of inspecting the surface of an object and apparatus therefor.

이 특허를 인용한 특허 (36)

  1. Hayano Fuminori (Fujisawa JPX) Imamura Kazunori (Tokyo JPX) Murata Sunao (Kawasaki JPX) Kato Kinya (Tokyo JPX), Apparatus for detecting foreign particles on a surface of a reticle or pellicle.
  2. Kim, Hyunwoo; Ko, Youngchae; Pyo, Sungjong; Keem, Taeho, Apparatus for detecting particles on a glass surface and a method thereof.
  3. Hayano Fuminori (Fujisawa JPX) Imamura Kazunori (Tokyo JPX) Murata Sunao (Kawasaki JPX) Kato Kinya (Tokyo JPX), Apparatus with four light detectors for checking surface of mask with pellicle.
  4. Swab, Michael Thomas, Computer vision recognition of metallic objects against a poorly contrasting background.
  5. Kanzaki, Toyoki; Ohka, Tatsuo; Ikeda, Teruhiko, Defect inspection apparatus and method.
  6. Ito Masami,JPX ; Takamoto Kenji,JPX ; Nishii Kanji,JPX ; Nagasaki Tatsuo,JPX ; Shimono Ken,JPX, Foreign substance inspection apparatus.
  7. Hayano Fuminori (Kamakura JPX) Imamura Kazunori (Tokyo JPX) Murata Sunao (Kawasaki JPX), Inspecting apparatus for determining presence and location of foreign particles on reticles or pellicles.
  8. Moriya, Tsuyoshi; Nishimura, Eiichi, Method and apparatus for detecting foreign matter attached to peripheral edge of substrate, and storage medium.
  9. Yamauchi Toshihiko (Yokohama JPX) Akiyama Nobuyuki (Yokohama JPX), Method and apparatus for detecting foreign particle.
  10. Miura Seiya,JPX ; Kohno Michio,JPX ; Kodachi Nobuhiro,JPX, Method and apparatus for inspecting a surface state.
  11. Moran Kevin E. (Belmont NC) Smith Michael L. (Matthews NC) Lippard ; III Ernest R. (Charlotte NC), Method and apparatus for inspecting reticles.
  12. Verhaverbeke, Steven; Truman, J Kelly; Lane, Christopher T; Somekh, Sasson R, Method and apparatus for processing a wafer.
  13. Verhaverbeke,Steven; Truman,J Kelly; Lane,Christopher T; Somekh,Sasson R, Method and apparatus for processing a wafer.
  14. Tsuji Toshihiko,JPX ; Miyazaki Kyoichi,JPX ; Takeuchi Seiji,JPX ; Yoshii Minoru,JPX ; Nose Noriyuki,JPX, Optical inspection method and apparatus including intensity modulation of a light beam and detection of light scattered.
  15. Boris Golberg IL; Amir Komem IL; Ron Naftali IL; Gilad Almogy IL, Optical inspection method and apparatus utilizing a variable angle design.
  16. Boris Goldberg IL; Amir Komem IL; Ron Naftali IL; Gilad Almogy IL, Optical inspection method and apparatus utilizing a variable angle design.
  17. Brunfeld, Andrei; Toker, Gregory; Clark, Bryan, Optical inspection system with polarization isolation of detection system reflections.
  18. Vaught John L. (Palo Alto CA) Neukermans Armand P. (Palo Alto CA) Keldermann Herman F. (Berkeley CA) Koenig Franklin R. (Palo Alto CA), Particle detection on patterned wafers and the like.
  19. Kobayashi,Yoichiro, Particle inspection apparatus and method, exposure apparatus, and device manufacturing method.
  20. Takehisa, Kiwamu; Tajima, Atsushi; Kusunose, Haruhiko, Pellicle inspection apparatus.
  21. Smilansky, Zeev; Tsadka, Sagie; Lapidot, Zvi; Sherman, Rivi, Pixel based machine for patterned wafers.
  22. Smilansky,Zeev; Tsadka,Sagie; Lapidot,Zvi; Sherman,Rivi, Pixel based machine for patterned wafers.
  23. Smilansky,Zeev; Tsadka,Sagie; Lapidot,Zvi; Sherman,Rivi, Pixel based machine for patterned wafers.
  24. Zeev Smilansky IL; Sagie Tsadka IL; Zvi Lapidot IL; Rivi Sherman IL, Pixel based machine for patterned wafers.
  25. Marxer,Norbert; Gross,Kenneth P.; Altendorfer,Hubert; Kren,George, Process and assembly for non-destructive surface inspections.
  26. Vaez Iravani,Mehdi; Stokowski,Stanley; Zhao,Guoheng, Sample inspection system.
  27. Vaez Iravani,Mehdi; Stokowski,Stanley; Zhao,Guoheng, Sample inspection system.
  28. Vaez Iravani,Mehdi; Stokowski,Stanley; Zhao,Guoheng, Sample inspection system.
  29. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  30. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  31. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  32. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  33. Kohno Michio (Tokyo JPX) Murakami Eiichi (Yokohama JPX) Suzuki Akiyoshi (Tokyo JPX), Surface examining apparatus for detecting the presence of foreign particles on the surface.
  34. Miura Seiya (Utsunomiya JPX) Kohno Michio (Utsunomiya JPX), Surface inspecting device.
  35. Kohno Michio (Tokyo JPX), Surface state inspecting device for inspecting the state of parallel first and second surfaces.
  36. Biellak,Steve; Stokowski,Stanley E.; Vaez Iravani,Mehdi, Systems and methods for a wafer inspection system using multiple angles and multiple wavelength illumination.
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