초록 ▼

A matching circuit is provided for delivering radio frequency electromagnetic energy from a radio frequency power supply to a variable impedance load such as a gas plasma. The matching network couples and impedance matches the power supply to the load. The matching network includes a ratio circuit f

A matching circuit is provided for delivering radio frequency electromagnetic energy from a radio frequency power supply to a variable impedance load such as a gas plasma. The matching network couples and impedance matches the power supply to the load. The matching network includes a ratio circuit for establishing a voltage ratio between the power supply and the load and a tuning circuit for tuning out a complex portion of the reactance of the load. Separation and control of the ratio and tuning variables is achieved through provision of a ratio control circuit comprising a lumped quarter wave transformer and a tuning control circuit comprising a variable tuning capacitance and a tuning inductance electrically connected in parallel to the load. The lumped quarter wave transformer comprises first and second ratio inductances electrically connected parallel to the load; a first variable ratio capacitance electrically connected in series with the load; and second and third variable ratio capacitances electrically connected parallel to the load. Ratio and tuning inductances are provided comprising toroidal-shaped forms having layers of electrically conductive material deposited or applied thereover. The ratio and tuning capacitances are provided with electrically floating butterfly-shaped rotors ganged on drive shafts driven by high speed torque motors.

대표청구항 ▼

A matching circuit for delivering radio frequency electromagnetic energy to a discharge process comprising: a variable impedance load; a radio frequency power supply for applying radio frequency power to said load; and a matching network for coupling and impedance matching said power supply to said

A matching circuit for delivering radio frequency electromagnetic energy to a discharge process comprising: a variable impedance load; a radio frequency power supply for applying radio frequency power to said load; and a matching network for coupling and impedance matching said power supply to said load said matching network comprising: (i) a ratio control means for directly establishing a voltage ratio between said power supply and said load, said ratio control means comprising: a first ratio inductance electrically connected parallel to said load; a first variable ratio capacitance electrically connected in series with said load; a second variable ratio capacitance electrically connected parallel to said load; a third variable ratio capacitance electrically connected parallel to said load; and (ii) a tuning control means for directly tuning out a complex portion of the reactance of said load, said tuning control means comprising: a variable tuning capacitance electrically connected parallel to said load; and a tuning inductance electrically connected parallel to said load.