초록 ▼

Automatic photomask or reticle washing and cleaning system comprises a foreign particle inspecting unit for inspecting whether or not foreign particles are attached to the surfaces of substrates; a washing and cleaning unit for washing and cleaning the surfaces of substrates with a cleaning liquid,

Automatic photomask or reticle washing and cleaning system comprises a foreign particle inspecting unit for inspecting whether or not foreign particles are attached to the surfaces of substrates; a washing and cleaning unit for washing and cleaning the surfaces of substrates with a cleaning liquid, thereby removing foreign particles and transfer means for withdrawing a substrate from a case, transferring the withdrawn substrate to the washing and cleaning unit, thereafter transferring the washed and cleaned substrate to the foreign particle inspecting unit and finally inserting the inspected substrate into the case again. In the washing and cleaning system, the washing and cleaning unit has a wash tub, means disposed in the wash tub for spraying or jetting a cleaning liquid against the surface of a substrate, means for rubbing the surfaces of the substrate which are wetted by the cleaning liquid, thereby removing foreign particles and washing means for washing away the cleaning liquid still remaining over the surfaces of the substrate even after removal of foreign particles.

대표청구항 ▼

A system for washing and cleaning the surfaces of a flat substrate horizontally encased in a case comprising: means for inspecting foreign particles attached to the surface of said flat substrate, said inspecting means including first holder means for holding said flat substrate in a horizontal stat

A system for washing and cleaning the surfaces of a flat substrate horizontally encased in a case comprising: means for inspecting foreign particles attached to the surface of said flat substrate, said inspecting means including first holder means for holding said flat substrate in a horizontal state; means for washing the surface of said flat substrate so as to remove foreign particles attached to the surfaces of said flat substrate and including second holder means for holding said flat substrate in a vertical state and a washing unit for washing and cleaning the surface of said flat substrate held by said second holder means; attitude change means for shifting the attitude of said flat substrate between the horizontal state and the vertical state; first transfer means for withdrawing said flat substrate from said case and transferring said flat substrate to said second holder means through said attitude change means, the attitude of said flat substrate being changed from the horizontal state to the vertical state by said attitude change means; second transfer means for transferring said flat substrate from said second holder means to said first holder means through said attitude change means, the attitude of said flat substrate being changed from the vertical state to the horizontal state by said attitude change means; and third transfer means for transferring said flat substrate from said first holder means into said case.