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Method and apparatus for controlling production of fluids from a well 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B01D-019/00
출원번호 US-0876311 (1986-06-19)
발명자 / 주소
  • Russell Clifton R. (Odessa TX)
출원인 / 주소
  • Amoco Corporation (Chicago IL 02)
인용정보 피인용 횟수 : 38  인용 특허 : 0

초록

Method and apparatus for controlling production of fluids from a well. A transfer vessel receives fluids produced from an oil and gas well which separate into liquid and gas phases in the vessel. A gas pipeline and a liquid pipeline are provided for transporting produced gas and liquid, respectively

대표청구항

A method for controlling production of fluids from a well of the type having produced fluids introduced into a vessel in which the fluids separate into gas and liquid phases, said vessel having a gas conduit for transporting gas therefrom and a liquid conduit for transporting liquid therefrom, said

이 특허를 인용한 특허 (38)

  1. Lantz, Darrell, Apparatus for separating a mixture of liquids of differing specific gravities in a wellbore.
  2. Nagasaka, Hiroyuki, Exposure apparatus, exposure method, and method for producing device.
  3. Nagasaka, Hiroyuki; Okuyama, Takeshi, Exposure apparatus, exposure method, and method for producing device.
  4. Nagasaka, Hiroyuki; Okuyama, Takeshi, Exposure apparatus, exposure method, and method for producing device.
  5. Nagasaka, Hiroyuki; Okuyama, Takeshi, Exposure apparatus, exposure method, and method for producing device.
  6. Nagasaka, Hiroyuki; Okuyama, Takeshi, Exposure apparatus, exposure method, and method for producing device.
  7. Nagasaka, Hiroyuki; Okuyama, Takeshi, Exposure apparatus, exposure method, and method for producing device.
  8. Nagasaka, Hiroyuki; Okuyama, Takeshi, Exposure apparatus, exposure method, and method for producing device.
  9. Nagasaka, Hiroyuki; Okuyama, Takeshi, Exposure apparatus, exposure method, and method for producing device.
  10. Nagasaka, Hiroyuki; Okuyama, Takeshi, Exposure apparatus, exposure method, and method for producing device.
  11. Zupanick, Joseph A., Flow control system for removing liquid from a well.
  12. Zupanick, Joseph A., Flow control system having a downhole check valve selectively operable from a surface of a well.
  13. Zupanick, Joseph A., Flow control system having a downhole rotatable valve.
  14. Zupanick, Joseph A., Flow control system having an isolation device for preventing gas interference during downhole liquid removal operations.
  15. Zupanick, Joseph A., Flow control system having an isolation device for preventing gas interference during downhole liquid removal operations.
  16. Zupanick, Joseph A., Flow control system having an isolation device for preventing gas interference during downhole liquid removal operations.
  17. Zupanick, Joseph A., Flow control system utilizing an isolation device positioned uphole of a liquid removal device.
  18. John R. Tippetts GB; Geoffrey H. Priestman GB, Fluidic level control systems.
  19. Odom Larry G. ; Stovall Ronnie L., Fracturing material separator apparatus.
  20. Varani, Frederick T.; Trost, Paul Bertram, Fugitive gas capture.
  21. Zupanick, Joseph A., Gas lift system.
  22. Anno, Motoyuki, Liquid feeding device and method of determining time of exchange of gas control element.
  23. Mertens, Jeroen Johannes Sophia Maria; Donders, Sjoerd Nicolaas Lambertus; De Graaf, Roelof Frederik; Hoogendam, Christiaan Alexander; Van Der Net, Antonius Johannus; Teunissen, Franciscus Johannes Herman Maria; Tinnemans, Patricius Aloysius Jacobus; Verhagen, Martinus Cornelis Maria; Verspay, Jacobus Johannus Leonardus Hendricus; Van Gompel, Edwin, Lithographic apparatus and device manufacturing method.
  24. Mertens, Jeroen Johannes Sophia Maria; Donders, Sjoerd Nicolaas Lambertus; De Graaf, Roelof Frederik; Hoogendam, Christiaan Alexander; Van Der Net, Antonius Johannus; Teunissen, Franciscus Johannes Herman Maria; Tinnemans, Patricius Aloysius Jacobus; Verhagen, Martinus Cornelis Maria; Verspay, Jacobus Johannus Leonardus Hendricus; Van Gompel, Edwin, Lithographic apparatus and device manufacturing method.
  25. Mertens, Jeroen Johannes Sophia Maria; Donders, Sjoerd Nicolaas Lambertus; De Graaf, Roelof Frederik; Hoogendam, Christiaan Alexander; Van Der Net, Antonius Johannus; Teunissen, Franciscus Johannes Herman Maria; Tinnemans, Patricius Aloysius Jacobus; Verhagen, Martinus Cornelis Maria; Verspay, Jacobus Johannus Leonardus Hendricus; Van Gompel, Edwin Augustinus Matheus, Lithographic apparatus and device manufacturing method.
  26. Mertens, Jeroen Johannes Sophia Maria; Donders, Sjoerd Nicolaas Lambertus; De Graaf, Roelof Frederik; Hoogendam, Christiaan Alexander; Van Der Net, Antonius Johannus; Teunissen, Franciscus Johannes Herman Maria; Tinnemans, Patricius Aloysius Jacobus; Verhagen, Martinus Cornelis Maria; Verspay, Jacobus Johannus Leonardus Hendricus; Van Gompel, Edwin Augustinus Matheus, Lithographic apparatus and device manufacturing method.
  27. Mertens, Jeroen Johannes Sophia Maria; Donders, Sjoerd Nicolaas Lambertus; De Graaf, Roelof Frederik; Hoogendam, Christiaan Alexander; Van Der Net, Antonius Johannus; Teunissen, Franciscus Johannes Herman Maria; Tinnemans, Patricius Aloysius Jacobus; Verhagen, Martinus Cornelis Maria; Verspay, Jacobus Johannus Leonardus Hendricus; Van Gompel, Edwin Augustinus Matheus, Lithographic apparatus and device manufacturing method.
  28. Zupanick, Joseph A., System and method for controlling liquid removal operations in a gas-producing well.
  29. Zupanick, Joseph A., System and method for controlling liquid removal operations in a gas-producing well.
  30. Bryan V. Butler, System and method for handling multiphase flow.
  31. Butler Bryan V., System and method for handling multiphase flow.
  32. Sasaki Takayoshi,JPX ; Kashiyama Kotaro,JPX, Ultrasonic treatment apparatus.
  33. Harpham, Andrew John; Shechter, Paul John; Stockman, Paul Alan, Vacuum system for immersion photolithography.
  34. Harpham, Andrew John; Shechter, Paul John; Stockman, Paul Alan, Vacuum system for immersion photolithography.
  35. Harpham, Andrew John; Shechter, Paul John; Stockman, Paul Alan, Vacuum system for immersion photolithography.
  36. Harpham, Andrew John; Shechter, Paul John; Stockman, Paul Alan, Vacuum system for immersion photolithography.
  37. Harpham, Andrew John; Shechter, Paul John; Stockman, Paul Alan, Vacuum system for immersion photolithography.
  38. Harpham,Andrew John; Shechter,Paul John; Stockman,Paul Alan, Vacuum system for immersion photolithography.
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