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Edge finding in wafers 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B65G-047/24
출원번호 US-0008389 (1987-01-28)
발명자 / 주소
  • Koenig Franklin R. (Palo Alto CA)
출원인 / 주소
  • Tencor Instruments (Mountain View CA 02)
인용정보 피인용 횟수 : 34  인용 특허 : 0

초록

A system for finding the orientation of a substantially circular disk shaped wafer with at least one flat region on an edge thereof, in which the wafer is spun one 360 degree turn on a chuck and the edge position is measured by a linear array to obtain a set of data points at various wafer orientati

대표청구항

A method of locating the peripheral flat edge of a wafer comprising, (a) placing a wafer onto a wafer chuck rotatable about an axis, (b) spinning said wafer about said axis for one 360 degree rotation, (c) determining the orientation of said chuck with respect to an initial orientation, (d) sampling

이 특허를 인용한 특허 (34)

  1. Mallory Chester L. (Campbell CA) Tong Edric H. (Santa Cruz CA) Borglum Wayne K. (San Jose CA), Apparatus for handling semiconductor wafers.
  2. Wolff, Robert, Control methods and apparatus for coupling multiple image acquisition devices to a digital data processor.
  3. Drisko Robert ; Bachelder Ivan A., Image processing system and method using subsampling with constraints such as time and uncertainty constraints.
  4. Drisko Robert ; Bachelder Ivan A., Image processing system and method using subsampling with constraints such as time and uncertainty constraints.
  5. Drisko Robert ; Bachelder Ivan A., Image processing system and method using subsampling with constraints such as time and uncertainty constraints.
  6. Wenzel, Lothar, Increasing accuracy of discrete curve transform estimates for curve matching in four or more dimensions.
  7. Wenzel,Lothar, Increasing accuracy of discrete curve transform estimates for curve matching in higher dimensions.
  8. Yamashita, Hiroyuki; Mohara, Yukihisa; Imai, Eiji, Inspection apparatus and inspection method.
  9. Lavagnino,Sherrill E.; Wolinsky,Jeffrey Michael, Machine vision method and apparatus for thresholding images of non-uniform materials.
  10. Leonid Taycher ; Arman Garakani, Machine vision methods and system for boundary point-based comparison of patterns and images.
  11. Taycher, Leonid; Garakani, Arman, Machine vision methods and systems for boundary feature comparison of patterns and images.
  12. Foster Nigel John ; Loizeaux Jane Alice, Machine vision methods for identifying collinear sets of points from an image.
  13. Sanjay Nichani, Machine vision methods for image segmentation using multiple images.
  14. Michael, David J.; Boatner, John B; Karnacewicz, Martin, Method and apparatus for backlighting a wafer during alignment.
  15. Kaveh Farrokh, Method and apparatus for positioning substrates.
  16. Michael, David J.; Clark, James; Liu, Gang, Method and apparatus for semiconductor wafer alignment.
  17. Gardopee George J. (Southbury CT) Clapis Paul J. (Sandy Hook CT) Prusak Joseph P. (Danbury CT) Poultney Sherman K. (Ridgefield CT), Method for co-registering semiconductor wafers undergoing work in one or more blind process modules.
  18. Sporon-Fiedler Frederik (San Mateo CA), Method for finding a reference point.
  19. Kanefumi Nakahara JP, Method of manufacturing exposure apparatus and method for exposing a pattern on a mask onto a substrate.
  20. King, David R., Methods and apparatus for charge coupled device image acquisition with independent integration and readout.
  21. Igor Reyzin, Methods and apparatus for generating a projection of an image.
  22. Bachelder, Ivan; Wallack, Aaron, Methods and apparatus for machine vision inspection using single and multiple templates or patterns.
  23. Wallack, Aaron S; Michael, David, Methods and apparatus for practical 3D vision system.
  24. Leslie, Brian C.; Nikoonahad, Mehrdad; Wells, Keith B., Optical scanning system for surface inspection.
  25. Leslie,Brian C.; Nikoonahad,Mehrdad; Wells,Keith B., Optical scanning system for surface inspection.
  26. Leslie,Brian C.; Nikoonahad,Mehrdad; Wells,Keith B., Optical scanning system for surface inspection.
  27. Saeki Hiroaki,JPX, Positioning apparatus and process system having the same.
  28. Nikoonahad, Mehrdad; Stokowski, Stanley E., Scanning system for inspecting anamolies on surfaces.
  29. Nikoonahad,Mehrdad; Stokowski,Stanley E., Scanning system for inspecting anomalies on surfaces.
  30. Balamurugan Subramanian, System and method for determining the center of a wafer on a wafer table.
  31. Borras,Rodrigo L.; Clifford,Michelle A.; Gomez,Leticia, System and method for predicting rotational imbalance.
  32. Sagues Paul ; Gaudio Stephen A. ; Wong Tim K., Wafer aligner system.
  33. Baker Gregory G. (Gig Harbor WA) Boyle Edward F. (Gig Harbor WA), Wafer centration device.
  34. Yuen, Jean-Hua; Chen, Po-Ming; Chiang, Ming-Ji; Yang, Ji-Shen, Wafer edge detector.
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