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[미국특허] Emission microscopy system 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H04N-007/18
출원번호 US-0091682 (1987-08-31)
발명자 / 주소
  • Esrig Paul (Saratoga CA) Rosengaus Eliezer (Palo Alto CA) Van Gelder Ezra (Belmont CA)
출원인 / 주소
  • KLA Instruments Corporation (Santa Clara CA 02)
인용정보 피인용 횟수 : 152  인용 특허 : 0

초록 ▼

An optical emission microscopy system with a macro optic system having a high numerical aperture for obtaining global views of an integrated circuit Device Under Test (DUT). The DUT is subjected to illumination and stimulation conditions, and images are obtained to form a “global difference”image in

대표청구항 ▼

Emission microscopy means for detecting light emitted from defects in dielectric layers of integrated circuit devices in response to test vector signals applied to the input and output terminals of the integrated circuit device, comprising: mounting means for holding the device under test to be insp

이 특허를 인용한 특허 (152) 인용/피인용 타임라인 분석

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  151. Blackwood,Jeffrey; Myers,Tracy, Whole-wafer photoemission analysis.
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  152. Campbell, Richard, Wideband active-passive differential signal probe.
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