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Method for synthesizing diamond by using plasma 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C01B-031/06
  • C30B-025/10
출원번호 US-0109509 (1987-10-19)
우선권정보 JP-0252391 (1986-10-23)
발명자 / 주소
  • Matsumoto Seiichiro (Ibaraki JPX) Hino Mototsugu (Ibaraki JPX) Moriyoshi Yusuke (Ibaraki JPX) Nagashima Takashi (Ibaraki JPX) Tsutsumi Masayuki (Ibaraki JPX)
출원인 / 주소
  • National Institute for Research in Inorganic Materials (Ibaraki JPX 03)
인용정보 피인용 횟수 : 57  인용 특허 : 0

초록 ▼

A method for synthesizing diamond, which comprises: (a) generating a plasma by electric discharge in a gas selected from the group consisting of a hydrocarbon gas, hydrogen gas, an inert gas and a mixture thereof, (b) decomposing a carbon source by the plasma to form plasma gas containing carbon ion

대표청구항 ▼

A method for synthesizing diamond, which comprises: (a) generating a plasma by electric discharge in a gas selected from the group consisting of a hydrocarbon gas, a hydrogen gas, an inert gas and a mixture thereof, (b) decomposing a carbon source by the plasma to form a plasma gas containing carbon

이 특허를 인용한 특허 (57)

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  11. Kasu, Makoto; Makimoto, Toshiki; Ueda, Kenji; Yamauchi, Yoshiharu, Diamond semiconductor element and process for producing the same.
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  13. Itoh,Kenji, Electrostatic-erasing abrasion-proof coating and method for forming the same.
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  16. Brondum, Klaus; Welty, Richard P.; Jonte, Patrick B.; Richmond, Douglas S., Faucet component with coating.
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  18. Brondum, Klaus; Welty, Richard P.; Jonte, Patrick B.; Richmond, Douglas S., Faucet component with coating.
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  19. Brondum, Klaus, Faucet with wear-resistant valve component.
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  20. Kasu, Makoto; Makimoto, Toshiki; Ueda, Kenji; Yamauchi, Yoshiharu, Field effect transistor using diamond and process for producing the same.
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  21. Kohler,Gunter A.; Esswein,William H.; Kirk,Seth M.; Gates,Brian J., Flash evaporation-plasma coating deposition method.
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  22. Huffman, Donald R.; Krätschmer, Wolfgang, Form of carbon.
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  24. Huffman,Donald R.; Krätschmer,Wolfgang, Form of carbon.
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  25. Vohra Yogesh K. (Birmingham AL) McCauley Thomas S. (Birmingham AL), High growth rate homoepitaxial diamond film deposition at high temperatures by microwave plasma-assisted chemical vapor.
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  26. Tanabe Keiichiro,JPX ; Fujimori Naoji,JPX, Highly crystalline diamond.
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  27. Gunter A. Kohler ; William H. Esswein ; Seth M. Kirk ; Brian J. Gates, Jet plasma process for deposition of coatings.
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  28. Smiljanic, Olivier; Stansfield, Barry L., Method and apparatus for producing single-wall carbon nanotubes.
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  29. Kelly Michael A. (121 Erica Way Portola Valley CA 94028), Method for chemical vapor deposition under a single reactor vessel divided into separate reaction chambers each with its.
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  30. Okamoto Koji (Kyoto JPX) Tanjo Masayasu (Kyoto JPX) Kamijo Eiji (Kyoto JPX), Method of forming a diamond film.
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  31. Welty,Richard P.; Brondum,Klaus; Richmond,Douglas S.; Jonte,Patrick B., Method of forming a wear resistant component.
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  32. Linares,Robert C.; Doering,Patrick J., Method of forming an N-type doped single crystal diamond.
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  33. Linares, Robert C.; Doering, Patrick J., Method of growing single crystal diamond in a plasma reactor.
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  34. Anton, Bryce; Welty, Richard P.; Sullivan, Patrick, Method of producing an article having patterned decorative coating.
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  35. Chen Chia-Fu,TWX ; Nishimura Kazuhito,JPX ; Ko Ensei,JPX ; Ishizuka Hiroshi,JPX ; Hosomi Satoru,JPX, Method of producing diamond of controlled quality and product produced thereby.
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  37. Lemelson Jerome H. (48 Parkside Dr. Princeton NJ 08540), Methods of forming synthetic diamond coatings on particles using microwaves.
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  38. Kurihara Noriko (Kawasaki JPX) Ikoma Keiko (Yokohama JPX) Hirabayashi Keiji (Tokyo JPX) Taniguchi Yasushi (Kawasaki JPX) Ito Susumu (Tokyo JPX), Novel single-bond carbon film and process for the production thereof.
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  39. Kulik Pavel P. (Moscow RUX) Ivanov Vladimir V. (Moscow RUX) Zornia Eugenia N. (Moscow RUX) Gay John A. (Newmarket GB3), Plasma jet CVD method of depositing diamond or diamond-like films.
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  40. Sakamoto Masakatu (Hachiohji JPX) Yaguchi Youichi (Tokyo JPX) Toshima Hiroaki (Ibaragi JPX) Kotaki Toshiroh (Tokyo JPX), Process for forming a crystalline diamond film.
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  41. Shibahara Masanori (Saku JPX) Ueda Kunihiro (Saku JPX) Nakayama Masatoshi (Saku JPX), Process for forming diamond-like thin film.
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  42. Tanabe Keiichiro (Itami JPX) Imai Takahiro (Itami JPX) Fujimori Naoji (Itami JPX), Process for synthesizing diamond in a vapor phase.
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  43. Tanabe Keiichiro,JPX ; Fujimori Naoji,JPX, Process for the vapor phase synthesis of diamond and highly crystalline diamond.
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  44. Kasu, Makoto; Makimoto, Toshiki; Ueda, Kenji; Yamauchi, Yoshiharu, Producing a diamond semiconductor by implanting dopant using ion implantation.
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  45. Omori Masahiro (Palo Alto CA) Stoneham Edward B. (Los Altos CA), Protective coating useful as passivation layer for semiconductor devices.
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  46. Freitas, Jr., Robert A., Simple tool for positional diamond mechanosynthesis, and its method of manufacture.
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  47. Doering, Patrick J.; Linares, Robert C.; Novak, Alicia E.; Abrahams, John M.; Murray, Michael, Single crystal diamond electrochemical electrode.
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  48. Linares, Robert C.; Doering, Patrick J, Single crystal diamond having C, C, and phosphorous.
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  49. Linares,Robert C.; Doering,Patrick J., Single crystal diamond tool.
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  50. Anthony Thomas R. (Schenectady NY) Fleischer James F. (Scotia NY), Substantially transparent free standing diamond films.
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  51. Linares, Robert C.; Doering, Patrick J., System and method for producing synthetic diamond.
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  52. Linares,Robert C.; Doering,Patrick J., System and method for producing synthetic diamond.
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  53. Linares, Robert C.; Doering, Patrick J., Tunable CVD diamond structures.
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  54. Brondum, Klaus; Welty, Richard P.; Richmond, Douglas S.; Jonte, Patrick B.; Thomas, Kurt, Valve component for faucet.
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  55. Brondum, Klaus; Welty, Richard P.; Richmond, Douglas S.; Jonte, Patrick B.; Thomas, Kurt, Valve component for faucet.
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  56. Welty,Richard P.; Brondum,Klaus; Richmond,Douglas S.; Jonte,Patrick B., Valve component with improved wear resistance.
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  57. Welty, Richard P.; Brondum, Klaus; Richmond, Douglas S.; Jonte, Patrick B., Valve component with multiple surface layers.
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