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Automatic photomask and reticle inspection method and apparatus including improved defect detector and alignment sub-sys 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G06K-009/68
  • G06K-009/38
출원번호 US-0885197 (1986-07-14)
발명자 / 주소
  • Specht Donald F. (Los Altos CA) Wihl Tim S. (San Jose CA) Young Scott A. (Scotts Valley CA) Hager
  • Jr. James J. (San Jose CA) Lutzker Matthew B. (Menlo Park CA)
출원인 / 주소
  • KLA Instruments Corporation (Santa Clara CA 02)
인용정보 피인용 횟수 : 201  인용 특허 : 17

초록

A photomask and reticle inspection method and apparatus wherein a selected surface area of an object is inspected and a first stream of data having signal values representing the image content of each pixel thereof is generated, a second stream of data having signal values representing the intended

대표청구항

A method of detecting defects in objects such as photomasks, reticles, wafers, printed circuit boards, and the like, comprising the steps of: inspecting a selected surface area of an object and generating a first stream of data having signal values representing the image content of each pixel thereo

이 특허에 인용된 특허 (17)

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