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Positioning device with dual linear motor 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H02P-005/46
  • B66C-019/00
출원번호 US-0109086 (1987-10-16)
발명자 / 주소
  • Chitayat Anwar (Duck Island
  • P.O. Box 107 Northport NY 11768)
인용정보 피인용 횟수 : 57  인용 특허 : 8

초록

A linear motor system includes first and second linear motors driving a load along spaced-apart supports. A positioning table, or a portion of a machine tool, supported between the first and second linear motors includes a device for varying the position of the table or portion along an axis extendi

대표청구항

A positioning device comprising: first and second spaced-apart linear motors movable parallel to each other along an X axis; a Y-axis assembly bridging said first and second spaced-apart linear motors; said Y-axis assembly including a workpiece support; means for moving said workpiece support to sel

이 특허에 인용된 특허 (8)

  1. Pollard Brian W. (Westport CT) Perzley William (Weston CT) Blanchard Stanley J. (Danbury CT), Control system for manipulator apparatus.
  2. Rhoades ; John M., Control system for moving a large machine along a single axis.
  3. Bell John (Belmont CA), Cross-coupling drive circuit.
  4. Ikebe Yo (Tokyo JPX) Hirai Hiromu (Ibaraki JPX), Electric servo system.
  5. French Daniel B. (10130 Duncan Dr. Florence KY 41042) Steinmetz Michael A. (655 Wilfert Dr. Cincinnati OH 45245), Method and apparatus for machine control.
  6. Kuga Akihiko (Iruma JPX) Kuga Hiroo (Mitaka JPX), Numerical control machine tool with sliding error compensation function.
  7. Barnett Joseph A. (Endicott NY) Gomez Joseph M. (Vestal NY) Green William F. (Vestal NY) Lisica Vincent M. (Vestal NY) Rosenthal Arnold B. (Vestal NY), Plural robotic drive.
  8. Herman Kenneth W. (6 Goldman Rd. Orange CT 06477), Precision, fully controlled, metering blade positioning system.

이 특허를 인용한 특허 (57)

  1. Heinemann, Gerhard; Papiernik, Wolfgang; Stöppler, Guido, Active compensation of mechanical vibrations and deformations in industrial processing machines.
  2. Christoph, Ralf, Bearing for a measuring instrument, particularly a coordinate measuring instrument.
  3. Moritz Frederick G. ; Mosciatti Roger, Brushless linear motor.
  4. Lee Martin E., Double flexure support for stage drive coil.
  5. Novak W. Thomas, Dual guide beam stage mechanism with yaw control.
  6. Ebihara Akimitsu,JPX ; Novak Thomas, Electromagnetic alignment and scanning apparatus.
  7. Ebihara Akimitsu,JPX ; Novak Thomas, Electromagnetic alignment and scanning apparatus.
  8. Ebihara Akimitsu,JPX ; Novak Thomas, Electromagnetic alignment and scanning apparatus.
  9. Ebihara Akimitsu,JPX ; Novak Thomas, Electromagnetic alignment and scanning apparatus.
  10. Ebihara Akimitsu,JPX ; Novak Thomas, Electromagnetic alignment and scanning apparatus.
  11. Ebihara Akimitsu,JPX ; Novak Thomas, Electromagnetic alignment and scanning apparatus.
  12. Ebihara, Akimitsu, Electromagnetic alignment and scanning apparatus.
  13. Ebihara, Akimitsu; Novak, Thomas, Electromagnetic alignment and scanning apparatus.
  14. Ebihara, Akimitsu; Novak, Thomas, Electromagnetic alignment and scanning apparatus.
  15. Ebihara, Akimitsu; Novak, Thomas, Electromagnetic alignment and scanning apparatus.
  16. Ebihara, Akimitsu; Novak, Thomas, Electromagnetic alignment and scanning apparatus.
  17. Ebihara,Akimitsu; Novak,Thomas, Electromagnetic alignment and scanning apparatus.
  18. Lee Martin E., Exposure apparatus and method utilizing isolated reaction frame.
  19. Lee, Martin E., Exposure apparatus and method utilizing isolated reaction frame.
  20. Lee Martin E., Exposure apparatus having dynamically isolated reaction frame.
  21. Lee Martin E., Exposure apparatus having dynamically isolated reaction frame.
  22. Lee Martin E., Exposure apparatus having dynamically isolated reaction frame.
  23. Lee Martin E., Exposure apparatus having dynamically isolated support structure.
  24. Lee Martin E., Exposure apparatus having reaction frame.
  25. Lee Martin E., Exposure method, and method of making exposure apparatus having dynamically isolated reaction frame.
  26. Lee Martin E., Exposure method, and method of making exposure apparatus having dynamically isolated reaction frame.
  27. Lee Martin E., Exposure method, and method of making exposure apparatus having dynamically isolated support structure.
  28. Lee Martin E., Guideless stage with isolated reaction frame.
  29. Lee, Martin E., Guideless stage with isolated reaction stage.
  30. Chitayat Anwar (Duck Island ; P.O. Box 107 Northport NY 11768), Linear motor with magnetic bearing preload.
  31. Lee Martin E., Lithography apparatus with movable stage and mechanical isolation of stage drive.
  32. Fritz Hermann (Mutlangen DEX) Staiger Hans (Goeppingen DEX) Winckler Friedrich (Schwaebisch-Gmuend DEX), Machine tool.
  33. Fritz Hermann,DEX ; Staiger Hans,DEX ; Winckler Friedrich,DEX, Machine tool.
  34. Schmauder, Frank, Machine tool with a functional unit having a linear drive and linear drive for same.
  35. Jywe, Wen-Yuh; Shen, Jing-Chung; Yang, Chin-Tien; Liu, Chien-Hung; Ju, Jau-Jiu; Wu, Chia-Hung; Huang, Chun-Chieh; Duan, Lili; Lee, Yuan-Chin, Manufacturing-process equipment.
  36. Watson Douglas C., Method and apparatus for compensating for reaction forces in a stage assembly.
  37. Lee Martin E., Method for making and operating an exposure apparatus having a reaction frame.
  38. Lee Martin E., Method for making apparatus with dynamic support structure isolation and exposure method.
  39. Lee Martin E., Method of making exposure apparatus with dynamically isolated reaction frame.
  40. Lee, Martin E., Method of making exposure apparatus with dynamically isolated reaction frame.
  41. Rajaraman, Devarajan, Motor driven high stability brake for linear motion systems.
  42. Rajaraman, Devarajan, Motor driven high stability brake linear motion systems.
  43. Heilig,John Andrew; Kafai,Bahram Berj; Trammell,Glenn Sterling, Multi-axes, sub-micron positioner.
  44. Guo, Huaizhong; Guo, Tianrun, Multi-carriage symmetrical numerically controlled coordinate grinding machine.
  45. Fujita, Jun, Position control method and position control system for drive feed equipment.
  46. Lee, Martin E., Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device.
  47. Lee,Martin E., Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device.
  48. Lee,Martin E., Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device.
  49. van Engelen, Gerard; van Dijk, Cornelis D.; van Kimmenade, Johannes M. M.; van Eijk, Jan, Positioning device with a vibration-free object table, and lithographic device provided with such a positioning device.
  50. Novak W. Thomas (Hillsborough CA) Premji Zahirudeen (Boulder CO) Nayak Uday G. (San Jose CA) Ebihara Akimitsu (San Mateo CA), Precision motion stage with single guide beam and follower stage.
  51. Novak W. Thomas ; Premji Zahirudeen ; Nayak Uday G. ; Ebihara Akimitsu, Precision motion stage with single guide beam and follower stage.
  52. Ebihara Akimitsu,JPX, Stage apparatus.
  53. Ebihara Akimitsu,JPX, Stage apparatus.
  54. Leidy, D. Wayne; DiFrank, Frank J.; Mulgrave, Robert L., Two-axis motion machine.
  55. D. Wayne Leidy ; Frank J. DiFrank ; Robert L. Mulgrave, Two-axis motion of take-out tongs in an individual section glassware forming machine.
  56. Ortiz, Mark S.; Bogdanov, Emil D.; Naji, Mohammad R.; Jacobs, Keith G.; Bologna, Gregory A.; Arms, Donald A., Variable motion system and method.
  57. Lee Martin E., Window frame-guided stage mechanism.
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