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Substrate processing apparatus 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-014/00
  • C23C-016/00
출원번호 US-0070986 (1987-07-08)
우선권정보 JP-0303137 (1986-12-19)
발명자 / 주소
  • Takahashi Nobuyuki (Fuchu JPX) Kitahara Hiroaki (Fuchu JPX)
출원인 / 주소
  • Anelva Corporation (Tokyo JPX 03)
인용정보 피인용 횟수 : 114  인용 특허 : 1

초록

A substrate processing apparatus includes input and output chambers for loading and unloading substrates into and out of the apparatus, a separation chamber connected to the input and output chambers, a plurality of substrate processing chambers connected to the separation chamber for processing the

대표청구항

A substrate processing apparatus including input and output chambers for loading and unloading substrates into and out of the apparatus and at least one substrate processing chamber connected to said input and output chambers for applying a plurality of processings to the substrates, said apparatus

이 특허에 인용된 특허 (1)

  1. Gallego JosM. (Ormskirk GB2), Apparatus for the deposition of multi-layer coatings.

이 특허를 인용한 특허 (114)

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