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Vapour phase treatment process and apparatus 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B23K-001/12
  • H05K-003/34
출원번호 US-0119567 (1987-11-12)
발명자 / 주소
  • Rahn Armin (St. Jean sur Richelieu CAX)
출원인 / 주소
  • Fluocon Technologies Inc. (Quebec CAX 03)
인용정보 피인용 횟수 : 57  인용 특허 : 6

초록

A process for treating workpieces in a normally closed treatment chamber. The process comprises providing a pressure within the chamber which is less than atmospheric and providing an unsaturated treatment vapor within the chamber. A workpiece is then moved into the chamber to be treated by the unsa

대표청구항

A process for treating workpieces in a normally closed treatment chamber which comprises: maintainin a pressure within the treatment chamber which is less than atmospheric so as to cause atmosphere to flow into the treatment chamber when it is opened to the atmosphere; generating an unsaturated trea

이 특허에 인용된 특허 (6)

  1. Bentley Peter D. (Brighton GB2) Pollock James F. (Hook GB2), Condensation heating apparatus and method.
  2. Saint Martin Xavier (Plaisir FRX), Limiting of corrosion in machine for reflow soldering in vapor phase.
  3. Woodgate Ralph W. (1380 Grande Allee Carignan CAX), Method and apparatus for condensation heating.
  4. Spigarelli ; Donald J., Method and apparatus for soldering, fusing or brazing.
  5. Ammann Hans H. (Chester NJ) Oien Michael A. (Chatham Township ; Morris County NJ), Process and apparatus for controlling losses in volatile working fluid systems.
  6. Miyake Eiichi (7-D3-304 ; Shinsenriminamimachi 3-chome Toyonaka-shi ; Osaka JPX), Vapor phase processing apparatus.

이 특허를 인용한 특허 (57)

  1. Yokomizo,Kenji, Apparatus and method of securing a workpiece during high-pressure processing.
  2. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of a workpiece.
  3. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of multiple workpieces.
  4. Inada Minoru,JPX ; Imajo Yasutaka,JPX ; Uchino Masahide,JPX, Cleaning method and cleaning apparatus.
  5. Mazzola, Christopher, Container support and mounting bracket.
  6. Jones,William Dale, Control of fluid flow in the processing of an object with a fluid.
  7. Arena Foster,Chantal J.; Awtrey,Allan Wendell; Ryza,Nicholas Alan; Schilling,Paul, Developing photoresist with supercritical fluid and developer.
  8. Arena-Foster, Chantal J.; Awtrey, Allan Wendell; Ryza, Nicholas Alan; Schilling, Paul, Developing photoresist with supercritical fluid and developer.
  9. Arena-Foster, Chantal J.; Awtrey, Allan Wendell; Ryza, Nicholas Alan; Schilling, Paul, Drying resist with a solvent bath and supercritical CO2.
  10. Sheydayi,Alexei; Sutton,Thomas, Gate valve for plus-atmospheric pressure semiconductor process vessels.
  11. Jones, William D., High pressure fourier transform infrared cell.
  12. Biberger, Maximilian A.; Layman, Frederick Paul; Sutton, Thomas Robert, High pressure processing chamber for semiconductor substrate.
  13. Biberger,Maximilian A.; Layman,Frederick Paul; Sutton,Thomas Robert, High pressure processing chamber for semiconductor substrate.
  14. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  15. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  16. Sheydayi,Alexei, Method and apparatus for clamping a substrate in a high pressure processing system.
  17. Goshi,Gentaro, Method and apparatus for cooling motor bearings of a high pressure pump.
  18. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method and apparatus for supercritical processing of multiple workpieces.
  19. Melber Albrecht (Darmstadt DEX) Wanetzky Erwin (Grosskrotzenburg DEX) Uschkoreit Dieter (Kamen DEX), Method and apparatus for thermal treatment of materials containing vaporizable substances.
  20. Dokkedahl,Lars, Method and apparatus for vapour phase soldering.
  21. Parent,Wayne M.; Goshi,Gentaro, Method and system for cooling a pump.
  22. Parent,Wayne M., Method and system for determining flow conditions in a high pressure processing system.
  23. Parent, Wayne M.; Geshell, Dan R., Method and system for passivating a processing chamber.
  24. Hansen,Brandon; Lowe,Marie, Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid.
  25. Kawamura,Kohei; Asano,Akira; Miyatani,Koutarou; Hillman,Joseph T.; Palmer,Bentley, Method for supercritical carbon dioxide processing of fluoro-carbon films.
  26. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method for supercritical processing of multiple workpieces.
  27. Erbil, Ahmet; Walbert, David F., Method for thermally cycling an object including a polarizable material.
  28. Biberger, Maximilian A.; Schilling, Paul E., Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module.
  29. Biberger,Maximilian A.; Schilling,Paul E., Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module.
  30. Hillman,Joseph, Method of inhibiting copper corrosion during supercritical COcleaning.
  31. Toma,Dorel Ioan; Schilling,Paul, Method of passivating of low dielectric materials in wafer processing.
  32. Biberger,Maximilian Albert; Layman,Frederick Paul; Sutton,Thomas Robert, Method of supercritical processing of a workpiece.
  33. Schilling,Paul, Method of treating a composite spin-on glass/anti-reflective material prior to cleaning.
  34. Schilling,Paul, Method of treatment of porous dielectric films to reduce damage during cleaning.
  35. Sheydayi,Alexei, Non-contact shuttle valve for flow diversion in high pressure systems.
  36. Precious, Colin J.; Thomas, Raymund, Non-oxidizing soldering chamber with shaped curtain and method of soldering.
  37. Sheydayi,Alexei, Pressure energized pressure vessel opening and closing device and method of providing therefor.
  38. Leicht, Helmut W., Process and device for soldering in the vapor phase.
  39. Wuester,Christopher D., Process flow thermocouple.
  40. Mullee,William H.; de Leeuwe,Marc; Roberson, Jr.,Glenn A.; Palmer,Bentley J., Removal of CMP and post-CMP residue from semiconductors using supercritical carbon dioxide process.
  41. Mullee, William H.; de Leeuwe, Marc; Roberson, Jr., Glenn A., Removal of CMP residue from semiconductor substrate using supercritical carbon dioxide process.
  42. Mullee William H. ; de Leeuwe Marc ; Roberson ; Jr. Glenn A., Removal of CMP residue from semiconductors using supercritical carbon dioxide process.
  43. Bertram, Ronald Thomas; Scott, Douglas Michael, Removal of contaminants from a fluid.
  44. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.
  45. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.
  46. William H. Mullee ; Maximilian A. Biberger ; Paul E. Schilling, Removal of photoresist and residue from substrate using supercritical carbon dioxide process.
  47. Koch Robert, Removal of polishing residue from substrate using supercritical fluid process.
  48. Mullee William H., Removal of resist or residue from semiconductors using supercritical carbon dioxide.
  49. Williams Charles E., Semiconductor package lead plating method and apparatus.
  50. Gieskes Koen A. (Ulvenhout NLX), Soldering machine operating with a protective gas and provided with automatically operating lock doors.
  51. Oyama, Kenshu; Nagao, Kazuhide, Steam reflow apparatus and steam reflow method.
  52. Akira Izumi JP, Substrate processing apparatus.
  53. Gale,Glenn; Hillman,Joseph T.; Jacobson,Gunilla; Palmer,Bentley, System and method for processing a substrate using supercritical carbon dioxide processing.
  54. Fang Lu ; Pottelger Brian Dale ; Rinaudo Dominic Paul ; Yeagle Frederick Arthur, System for providing back-lighting of components during fluxless soldering.
  55. Jacobson,Gunilla; Yellowaga,Deborah, Treatment of a dielectric layer using supercritical CO.
  56. Kevwitch, Robert, Treatment of substrate using functionalizing agent in supercritical carbon dioxide.
  57. Sheydayi,Alexei, Vacuum chuck utilizing sintered material and method of providing thereof.
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