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Modular processing apparatus for processing semiconductor wafers 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-014/00
출원번호 US-0091651 (1987-09-01)
발명자 / 주소
  • Rubin Richard H. (Fairfield NJ) Petrone Benjamin J. (Netcong NJ) Heim Richard C. (Mountain View CA) Pawenski Scott M. (Wappingers Falls NY)
출원인 / 주소
  • Machine Technology, Inc. (Parsippany NJ 02)
인용정보 피인용 횟수 : 45  인용 특허 : 4

초록

A self-contained modular processing apparatus is disclosed for processing workpieces, and in particular, silicon wafers. The apparatus is constructed of framed modules which plug into a service facility docking subassembly and interlock therewith to make up a complete modular processing system for w

대표청구항

A modular processing apparatus comprising a chassis, a module attached to said chassis for performing at least one operation on a workpiece to be processed, a subassembly separate from said chassis, service supply means attached to said subassembly for supplying a preselected service to said module

이 특허에 인용된 특허 (4)

  1. Bean John C. (New Providence NJ), Apparatus for simultaneous molecular beam deposition on a plurality of substrates.
  2. Gallego JosM. (Ormskirk GB2), Apparatus for the deposition of multi-layer coatings.
  3. Anderson Roger Norman (Garland TX), Continuous chemical vapor deposition reactor.
  4. Koch George R. (Los Altos CA) Petersen ; III Carl T. (Fremont CA), Modular loadlock.

이 특허를 인용한 특허 (45)

  1. Bernard, Roland; Chevalier, Eric; Sogan, Gloria, Apparatus for conditioning the atmosphere in a vacuum chamber.
  2. Matthews Robert Roger, Apparatus for the treatment and drying of semiconductor wafers in a fluid.
  3. Matthews Robert Roger, Apparatus for the treatment of semiconductor wafers in a fluid.
  4. Kyung Hyun-Su,KRX ; Choi Won-Song,KRX ; Shin Jung-Ho,KRX, Apparatus for thermal treatment of thin film wafer.
  5. Breunsbach Rex (Clackamas OR) Austen Paul M. (Milwaukie OR), Apparatus to clean printed circuit boards.
  6. Enicks, Darwin Gene; Carver, Damian, Bandgap and recombination engineered emitter layers for SiGe HBT performance optimization.
  7. Enicks,Darwin Gene; Carver,Damian, Bandgap engineered mono-crystalline silicon cap layers for SiGe HBT performance enhancement.
  8. Kidd, Jerry D.; Harrington, Craig D.; Hopkins, Daniel N., Configurable vacuum system and method.
  9. Kidd, Jerry D.; Harrington, Craig D.; Hopkins, Daniel N., Configurable vacuum system and method.
  10. Kirkpatrick Thomas I. ; Otwell Robert L., Cost effective modular-linear wafer processing.
  11. Kirkpatrick Thomas I. ; Otwell Robert L., Cost effective modular-linear wafer processing.
  12. Kraus, Joseph Arthur; Strassner, James David, Dual wafer load lock.
  13. Walters, James C., Electrical connector with anchor mount.
  14. Beaty,Elwin M.; Mork,David P., Electronic component products and method of manufacturing electronic component products.
  15. Alam, Khurshid Syed; Gousev, Evgeni; Mignard, Marc Maurice; Heald, David; Londergan, Ana R.; Floyd, Philip Don, Equipment and methods for etching of MEMS.
  16. Lappen,Alan Rick; Schauer,Ronald V., Facilities connection box for pre-facilitation of wafer fabrication equipment.
  17. Schauer,Ronald Vern, Facilities connection bucket for pre-facilitation of wafer fabrication equipment.
  18. Lei Lawrence ; Trihn Son ; Huston Joel M., Fluid delivery system and method.
  19. Kawata, Masahiro, Inline vacuum processing apparatus, method of controlling the same, and information recording medium manufacturing method.
  20. Tao, Yi; Lee, Hojin; Zhong, Fan, Mechanical layer and methods of making the same.
  21. Smets,Carl; Van Gils,Karel; Zabolitsky,John; Everaerts,Jurgen, Method and an apparatus for measuring positions of contact elements of an electronic component.
  22. Enicks,Darwin Gene, Method and system for controlled oxygen incorporation in compound semiconductor films for device performance enhancement.
  23. Stewart, Jeffrey, Method of preparing thin supported films by vacuum deposition.
  24. Sampsell, Jeffrey Brian; Gally, Brian James; Floyd, Philip Don, Methods of fabricating MEMS with spacers between plates and devices formed by same.
  25. Rafanan, Marjorio, Methods of making a MEMS device by monitoring a process parameter.
  26. Kidd, Jerry D.; Harrington, Craig D.; Hopkins, Daniel N., Mobile plating system and method.
  27. Kidd,Jerry D.; Harrington,Craig D.; Hopkins,Daniel N., Mobile plating system and method.
  28. Bright Nick ; Mooring Ben, Modular architecture for semiconductor wafer fabrication equipment.
  29. Morgan, Rodney D., Multiple connection socket assembly for semiconductor fabrication equipment and methods employing same.
  30. Jeffrey Stewart, Parylene deposition chamber and method of use.
  31. Miles, Mark W.; Arbuckle, Brian W.; Bita, Ion; Kothari, Manish; Brinkley, Patrick F.; Xu, Gang; Khonsari, Nassim; Griffiths, Jonathan C., Printable static interferometric images.
  32. Matthews Robert Roger, Process for treatment of semiconductor wafers in a fluid.
  33. Maher Joseph A. (South Hamilton MA) Vowles E. John (Goffstown NH) Napoli Joseph D. (Winham NH) Zafiropoulo Arthur W. (Manchester MA) Miller Mark W. (Burlington MA), Quad processor.
  34. Tegeder, Volker; Gerhard, Detlef; Lechner, Johannes; Marx, Eckhard, Self-supporting adaptable metrology device.
  35. Antonell, Michael; Houge, Erik Cho; Patel, Nitin; Plew, Larry E.; Vartuli, Catherine, Semiconductor manufacturing using modular substrates.
  36. Reinke, Lance; Lattig, Glenn, Semiconductor substrate processing tool and fabrications facilities integration plate.
  37. Shiga, Masayoshi; Hashinoki, Kenji; Koyama, Yasufumi, Substrate processing apparatus for performing photolithography.
  38. Kidd,Jerry D.; Harrington,Craig D.; Hopkins,Daniel N., System and method for plasma plating.
  39. Maher Joseph A. ; Vowles E. John ; Napoli Joseph D. ; Zafiropoulo Arthur W. ; Miller Mark W., System for processing substrates.
  40. Enicks, Darwin G.; Friedrichs, Carl E.; Brucher, Richard A., System, apparatus and method for contaminant reduction in semiconductor device fabrication equipment components.
  41. Enicks,Darwin G.; Friedrichs,Carl E.; Brucher,Richard A., System, apparatus and method for contaminant reduction in semiconductor device fabrication equipment components.
  42. Isozaki, Masakazu; Makino, Akitaka; Kimura, Shingo; Yatomi, Minoru, Vacuum processing apparatus.
  43. Makino, Akitaka; Takahashi, Youji; Soraoka, Minoru; Kihara, Hideki; Tauchi, Susumu, Vacuum processing apparatus.
  44. Makino, Akitaka; Takahashi, Youji; Soraoka, Minoru; Kihara, Hideki; Tauchi, Susumu, Vacuum processing apparatus.
  45. Oohirabaru, Yuuzou; Ueda, Akira, Vacuum processing apparatus.
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