[미국특허]
Method and equipment for coating substrates by means of a plasma discharge using a system of magnets to confine the plas
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B05D-003/06
B05D-003/14
C23C-016/50
C23C-016/54
출원번호
US-0015128
(1987-02-02)
우선권정보
DE-3521318 (1985-06-14)
국제출원번호
PCT/EP86/00332
(1986-06-04)
§371/§102 date
19870202
(19870202)
국제공개번호
WO-8607391
(1986-12-18)
발명자
/ 주소
Hartig Klaus (Ronneburg DEX) Dietrich Anton (Rodenbach DEX)
출원인 / 주소
Leybold Aktiengesellschaft (Cologne DEX 03)
인용정보
피인용 횟수 :
13인용 특허 :
6
초록▼
Method for coating continuously moving substrates by the deposition of compounds from the gas phase by means of plasma discharge, produced by an electrode, with a chemical reaction, a system of magnets for the generation of a magnetic trap to constrict the plasma being disposed on one side of the su
Method for coating continuously moving substrates by the deposition of compounds from the gas phase by means of plasma discharge, produced by an electrode, with a chemical reaction, a system of magnets for the generation of a magnetic trap to constrict the plasma being disposed on one side of the substrate. The objective is to be accomplished by limiting the action of the plasma and the chemical reaction to the immediate vicinity of the system of magnets. For this purpose, the surface of the substrate to be coated is held at a distance “S1”from the electrode, which is less than the dark-space distance that arises under the specified process conditions. Moreover, the magnetic trap is adjusted so that it passes through the substrate and is closed over the surface of the substrate to be coated and moreover in such a manner, that the constricted plasma is maintained on the surface of the substrate that is to be coated.
대표청구항▼
Method for coating continuously moving substrates by the deposition of compounds from the gas phase by means of a plasma discharge, produced by a negatively biased electrode, with a chemical reaction, a system of magnets for the generation of a magnetic trap which is a closed tunnel to constrict the
Method for coating continuously moving substrates by the deposition of compounds from the gas phase by means of a plasma discharge, produced by a negatively biased electrode, with a chemical reaction, a system of magnets for the generation of a magnetic trap which is a closed tunnel to constrict the plasma being disposed on one side of the substrate, wherein the substrate is one of the electrode and a member independent of the electrode and wherein the surface of the substrate that is to be treated is held at distance “S1”from the electrode, which is less than the dark-shape distance that arises under the given conditions of the process, where “S1”includes zero, and the magnetic trap is so adjusted, that it passes through the substrate and is a closed tunnel over the surface of the substrate that is to be coated in such a manner, that the chemical reaction is maintained in the constricted plasma on the surface of the substrate that is to be coated. Chemical reactor for implementing the method of coating continuously moving substrates by the deposition of compounds from the gas phase by means of a plasma discharge, with an evacuatable reaction chamber with at least one feeding device for the reaction components, with a holding device for at least one substrate, with an electrode disposed in the vicinity of the substrate position for generating a plasma and, on the side of the electrode opposite to the substrate position, with a system of magnets with pole faces of opposite polarity for producing an in itself closed magnetic trap which is a closed tunnel, which starts out from the pole faces and passes through the electrode, wherein the holding device is disposed in such a spatial position relative to the electrode, that the first surface of the substrate, which faces the electrode, is at a distance “S2”form the electrode, which is less than the given dark-space distance under the specified process conditions, and the magnetic trap is adjusted, so that it passes through the substrate and is a closed tunnel over the second surface of the substrate, which is averted from the electrode, in such a manner, that the constricted plasma and the chemical reaction zone are on the side of the substrate averted from the electrode.
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