초록 ▼

The invention relates to visible-laser deposition reactions of metal containing oxyhalide and carbonyl vapors, such as, chromyl chloride vapor, CrO2Cl2, or cobalt carbonyl, Co2(CO)8, for direct writing of metal containing opaque patterns on various substrates (Si, SiO2, GaAs and glass). Deposition a

The invention relates to visible-laser deposition reactions of metal containing oxyhalide and carbonyl vapors, such as, chromyl chloride vapor, CrO2Cl2, or cobalt carbonyl, Co2(CO)8, for direct writing of metal containing opaque patterns on various substrates (Si, SiO2, GaAs and glass). Deposition at low laser power is by photolysis of adsorbed reactant molecules. Higher powers initiate deposition photochemically and continue it with a combined photolytic/pyrolytic reaction, simultaneously inducing a solid-phase conversion of the deposited film. Mixed Cr2O3/CrO2 or cobalt thin films of 1-nanometer to several-micrometer thickness, as well as 1-millimeter-long single crystals of Cr2O3 or cobalt, can be grown with this process, the former at rates up to 3 m

대표청구항 ▼

A method for a substantially photolytic photodepostion of cobalt film on a surface of a photomask substrate disposed in a reaction chamber comprising the steps of: (a) introducing gaseous Co2(CO)8 at low vapor pressure into said chamber; (b) focusing a beam of coherent, visible light at or near the

A method for a substantially photolytic photodepostion of cobalt film on a surface of a photomask substrate disposed in a reaction chamber comprising the steps of: (a) introducing gaseous Co2(CO)8 at low vapor pressure into said chamber; (b) focusing a beam of coherent, visible light at or near the surface of said substrate to initiate deposition of cobalt on said surface.