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[미국특허] Silicon based mass airflow sensor and its fabrication method 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01F-001/68
출원번호 US-0137299 (1987-12-23)
발명자 / 주소
  • Lee Ki W. (Williamsburg VA) Choi Il-Hyun (Newport News VA)
출원인 / 주소
  • Siemens-Bendix Automotive Electronics L.P. (Troy MI 02)
인용정보 피인용 횟수 : 29  인용 특허 : 27

초록

A mass airflow sensor is fabricated on a semiconductor substrate and which includes (1) a dielectric diaphragm, (2) p-etch-stopped silicon rim, (3) thin-film heating and temperature sensing elements, and (4) tapered chip edges. The dielectric diaphragm is formed with thin silicon oxide and silicon n

대표청구항

A mass airflow sensor having a longitudinal axis comprising: a dielectric diaphragm; a thin-film heating element disposed on said diaphragm; a thermally conductive semiconductor rim comprising a heavily doped etch stopped region encompassing at least a major portion of said dielectric diaphragm; and

이 특허에 인용된 특허 (27) 인용/피인용 타임라인 분석

  1. Kurtz Anthony D. (Teaneck NJ) Nunn Timothy A. (Ridgewood NJ) Weber Richard A. (Denville NJ), Fabrication of dielectrically isolated fine line semiconductor transducers and apparatus.
  2. Bohrer Philip J. (Minneapolis MN), Flow sensor.
  3. Bohrer Philip J. (Minneapolis MN) Johnson Robert G. (Minneapolis MN), Flow sensor.
  4. Higashi Robert E. (Minneapolis MN) Johnson Robert G. (Minneapolis MN) Bohrer Philip J. (Minneapolis MN), Flow sensor.
  5. Little Roger G. (Bedford MA), Front surface metallization and encapsulation of solar cells.
  6. Jerman John H. (Palo Alto CA) Terry Stephen C. (Palo Alto CA), Gas chromatography system and detector and method.
  7. Ono Hirofumi (Kyoto JPX) Tsujimura Kiyoharu (Kyoto JPX) Kamo Masayuki (Kyoto JPX) Isoda Yoritaka (Kyoto JPX), Gas flow sensor and method of producing a gas flow sensor.
  8. Bohrer, Philip J.; Higashi, Robert E.; Johnson, Robert G., Integral flow sensor and channel assembly.
  9. McCarthy Shaun L. (Ann Arbor MI), Mass airflow sensor.
  10. Gigante Joseph R. (Oceanside CA), Method for etch thinning silicon devices.
  11. Magdo Ingrid E. (Hopewell Junction NY) Magdo Steven (Hopewell Junction NY), Method for making a silicon mask.
  12. Johnson Robert G. (Minnetonka MN) Higashi Robert E. (Minneapolis MN), Method of making semiconductor device.
  13. Solo de Zaldivar Jose (Zrich CHX), Method of manufacturing a semiconductor device.
  14. Higashi Robert E. (Bloomington MN) James Steven D. (Edina MN) Johnson Robert G. (Minnetonka MN) Satren Ernest A. (Bloomington MN), Microscopic size, thermal conductivity type, air or gas absolute pressure sensor.
  15. Aine Harry E. (30600 Page Mill Rd. Los Altos CA 94022) Block Barry (30610 Page Mill Rd. Los Altos CA 94022), Miniature thermal fluid flow sensors and batch methods of making same.
  16. Choi Charles K. (Claremont CA), Process for stripping oil from fluidized ash and char particles to prepare the particles for decarbonization.
  17. Kammermaier Johann (Unterhaching DEX) Mueller Rdiger (Munich DEX) Roedl Peter (Rosenheim DEX), Quantity of flow meter.
  18. Zavracky Paul M. (Norwood MA) Senturia Stephen D. (Boston MA) Morrison ; Jr. Richard H. (Taunton MA), Resonant hollow beam and method.
  19. Hartman Robert L. (Warren Township ; Somerset County NJ) Koszi Louis A. (Scotch Plains NJ) Mogab Cyril J. (Berkeley Heights NJ) Schwartz Bertram (Westfield NJ), Selective plasma etching of dielectric masks in the presence of native oxides of group III-V compound semiconductors.
  20. Johnson Robert G. (Hennepin MN) Higashi Robert E. (Hennepin MN), Semiconductor device.
  21. Johnson Robert G. (Minnetonka MN) Higashi Robert E. (Minneapolis MN), Semiconductor device.
  22. Bohrer Philip J. (Minneapolis MN) Higashi Robert E. (Bloomington MN) Johnson Robert G. (Minnetonka MN), Semiconductor device structure and processing.
  23. Tabata Osamu (Aichi JPX) Inagaki Hazime (Aichi JPX) Kitano Tomoyuki (Aichi JPX), Semiconductor flow velocity sensor.
  24. Bohg ; Armin ; Ebert ; Eckehard ; Mirbach ; Erich, Silicon oxide/silicon nitride mask with improved integrity for semiconductor fabrication.
  25. Johnson Robert G. (Minnetonka MN), Slotted diaphragm semiconductor device.
  26. Renken, Wayne G.; LeMay, Dan B., Thermal mass flow meter.
  27. Renken Wayne G. (San Jose CA) LeMay Dan B. (Palos Verdes Estates CA) Takahashi Ricardo M. (Ben Lomand CA), Thermal mass flowmeter and controller.

이 특허를 인용한 특허 (29) 인용/피인용 타임라인 분석

  1. Nakada, Keiichi; Horie, Junichi; Watanabe, Izumi, Flow rate sensor.
  2. Kamiunten,Shoji; Ishikura,Yoshiyuki; Ike,Shinichi; Kinugasa,Seiichiro; Tanaka,Hideyuki, Flow sensor.
  3. Seki,Koji; Zushi,Nobuhiko; Ike,Shinichi; Nakano,Seishi; Nakata,Tarou; Kamiunten,Shoji, Flow sensor and method of manufacturing the same.
  4. Ralf Kersjes DE; Wilfried Mokwa DE; Gunter Zimmer DE; Holger Vogt DE, Flow sensor component.
  5. Sakuma, Noriyuki; Yamamoto, Naoki; Takeda, Kenichi; Fukuda, Hiroshi, Flow sensor using a heat element and a resistance temperature detector formed of a metal film.
  6. Sakuma,Noriyuki; Yamamoto,Naoki; Takeda,Kenichi; Fukuda,Hiroshi, Flow sensor using a heat element and a resistance temperature detector formed of a metal film.
  7. Marek Jiri,DEX ; Mueller Wolfgang,DEX, Mass flow sensor with rupture detection.
  8. Vaitkus Rimantas,LTX, Measuring device and measuring method.
  9. Treutler Christoph (Wannweil DEX) Benz Rolf (Reutlingen DEX) Muenzel Horst (Reutlingen DEX) Schmidt Steffen (Reutlingen DEX) Reihlen Eckart (Reutlingen DEX) Lock Andreas (Reutlingen DEX), Measuring element for a flow sensor.
  10. Alvesteffer William J. ; Huang Yufeng ; Eget Larry, Method and apparatus for measuring a fluid.
  11. Toyoda, Inao, Method of making a thin film sensor.
  12. Hembree,David R., Methods of processing a workpiece, methods of communicating signals with respect to a wafer, and methods of communicating signals within a workpiece processing apparatus.
  13. Akram,Salman; Hembree,David R., Methods of sensing temperature of an electronic device workpiece.
  14. Ikawa,Koichi; Tsujimura,Yoshinori; Kojima,Takio, Micro-heater and sensor.
  15. Wang, Gaofeng; Chen, Chih-Chang; Yao, Yahong; Huang, Liji, Micromachined mass flow sensor and methods of making the same.
  16. Saul Cyro K.,BRX ; Zemel Jay N., Multi-purpose integrated intensive variable sensor.
  17. Lien Wan-Yih,TWX ; Cherng Meng-Jaw,TWX, Self-aligned eetching process.
  18. Mueller-Fiedler Roland,DEX ; Treutler Christoph,DEX ; Gundlach Michael,DEX ; Moellendorf Manfred,DEX ; Schmidt Steffen,DEX ; Laermer Franz,DEX ; Kampshoff Christoph,DEX ; Heyers Klaus,DEX ; Buth Joer, Sensor and method for manufacturing a sensor.
  19. Konzelmann, Uwe; Schulz, Torsten, Sensor chip having potential surfaces for avoiding contaminant.
  20. Hecht, Hans; Konzelmann, Uwe; Schulz, Torsten, Sensor chip with additional heating element, method for preventing a sensor chip from being soiled, and use of an additional heating element on a sensor chip.
  21. Warsop, Clyde; Press, Andrew Julian; Hucker, Martyn John, Sensor device.
  22. Suzuki Hiroaki,JPX ; Sugama Akio,JPX ; Kojima Naomi,JPX, Small glass electrode.
  23. Genova Perry A. ; Tsuei Timothy W., Solid state microanemometer.
  24. Keiichi Nakada JP, Thermal air flow sensor.
  25. Watanabe, Izumi; Yamada, Masamichi; Nakada, Keiichi, Thermal airflow sensor.
  26. Ishitsuka, Norio; Minamitani, Rintaro; Hanzawa, Keiji, Thermal airlflow sensor.
  27. Asano, Satoshi; Matsumoto, Masahiro; Nakano, Hiroshi; Hanzawa, Keiji, Thermal flow sensor.
  28. DuBois, Paul L.; Emmert, Dan H.; Gee, Gregory P., Thermally balanced mass air flow sensor.
  29. Wado, Hiroyuki; Iwaki, Takao, Thin film sensor, method of manufacturing thin film sensor, and flow sensor.

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