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Particle detection on patterned wafers and the like 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01B-011/00
출원번호 US-0248309 (1988-09-19)
발명자 / 주소
  • Vaught John L. (Palo Alto CA) Neukermans Armand P. (Palo Alto CA) Keldermann Herman F. (Berkeley CA) Koenig Franklin R. (Palo Alto CA)
출원인 / 주소
  • Tencor Instruments (Mountain View CA 02)
인용정보 피인용 횟수 : 154  인용 특허 : 5

초록

A particle detection on a periodic patterned surface is achieved in a method and apparatus using a single light beam scanning at a shallow angle over the surface. The surface contains a plurality of identical die with streets between die. The beam scans parallel to a street direction, while a light

대표청구항

A method of particle detection on a patterned surface comprising, (a) scanning a substantially flat surface with a single laser beam, said beam scanning said surface in a sequence of paths, (b) collecting approximately constant solid angles of acceptance of light scattered from a plurality of points

이 특허에 인용된 특허 (5)

  1. Koizumi Mitsuyoshi (Yokohama JPX) Oshima Yoshimasa (Yokohama JPX) Akiyama Nobuyuki (Yokohama JPX) Yachi Toshiaki (Kodaira JPX), Automatic contaminants detection apparatus.
  2. McVay Lance (Belmont MA) Lilienfeld Pedro (Lexington MA), Automatic detector for microscopic dust on large-area, optically unpolished surfaces.
  3. Shiba Masataka (Yokohama JPX) Uto Sachio (Yokohama JPX) Koizumi Mitsuyoshi (Yokohama JPX), Foreign particle detecting method and apparatus.
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  5. Levy Kenneth (Saratoga CA) Buchholz Steve (San Jose CA) Broadbent William H. (Sunnyvale CA) Wihl Mark J. (San Jose CA), Photomask inspection apparatus and method with improved defect detection.

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