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Illuminating optical device 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • F21V-007/04
출원번호 US-0340444 (1989-04-19)
우선권정보 JP-0101925 (1988-04-25); JP-0200922 (1988-08-11)
발명자 / 주소
  • Kudo Yuji (Yokohama JPX) Matsumoto Koichi (Tokyo JPX)
출원인 / 주소
  • Nikon Corporation (Tokyo JPX 03)
인용정보 피인용 횟수 : 97  인용 특허 : 7

초록

An illuminating optical device having an optical integrator capable of receiving a light flux from a light source and substantially forming a plane light source comprising a plurality of light source images and uniformly illuminating an object includes a square-pillar-like internal reflection type i

대표청구항

An illuminating optical device having an optical integrator capable of receiving a light flux from a light source and substantially forming a plane light source comprising a plurality of light source images and uniformly illuminating an object, including: a square-pillar-like internal reflection typ

이 특허에 인용된 특허 (7)

  1. Hayamizu Toshisada (Hachiouji JPX), Annular illumination device.
  2. Ohta Masakatsu (Tokyo JPX), Illumination apparatus.
  3. Ichihara Yutaka (Yokohama JPX), Illumination device using a laser.
  4. Shibuya Masato (Ohmiya JPX) Uehara Makoto (Tokyo JPX), Illumination optical arrangement.
  5. Matsumoto Koichi (Tokyo JPX) Uehara Makoto (Tokyo JPX) Kikuchi Tetsuo (Tokyo JPX), Illumination optical system.
  6. Sugino Paul S. (Santa Maria CA) Gardner Leland V. (Buellton CA), Intermediate range intensity modification of gaussian beam using optical integration means.
  7. Sugino Paul S. (Santa Maria CA), Optical integrator means for intensity modification of Gaussian beam.

이 특허를 인용한 특허 (97)

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  5. Bryan, William J.; Schultz, John C.; Meis, Michael A.; Destain, Patrick R., Backlight asymmetric light input wedge.
  6. Destain, Patrick R., Backlight wedge with adjacent reflective surfaces.
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  11. Sumiyoshi, Yuhei; Tokimitsu, Takumi; Yuuki, Hiroyuki, Detection apparatus.
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  17. Bhattacharya Ram, Headlamp with enhanced light gathering condenser.
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  24. Stanton Stuart (Bridgewater NJ) Gallatin Gregg (Newtown CT) Oskotsky Mark (Marmaroneck NY) Zernike Frits (Norwalk CT), Hybrid illumination system for use in photolithography.
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  35. Tanitsu Osamu,JPX, Illumination optical apparatus and exposure apparatus.
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  39. Suda, Hiromi, Illumination optical device, exposure apparatus, and method of manufacturing article.
  40. Komatsuda Hideki,JPX, Illumination optical system and projection exposure apparatus using same.
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  42. Tsuji Toshihiko,JPX, Illumination system and exposure apparatus having the same.
  43. Coston,Scott D.; Guerra,Richard J., Illumination system and method allowing for varying of both field height and pupil.
  44. Stanton Stuart T. (Coplay PA), Illumination system and method employing a deformable mirror and diffractive optical elements.
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  46. Toshihiko Tsuji JP, Illumination system and projection exposure apparatus.
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  50. Koyama Osamu,JPX, Image projecting apparatus.
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  52. Seward,George H., Isotropic illumination.
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  54. Kaneda, Kazumasa; Asoma, Yoshito, Light condensing lens and three-dimensional distance measuring apparatus.
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  59. Fork David K. (Palo Alto CA), Narrow-pitch beam homogenizer.
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  67. Chungte W. Chen, Optical system with extended boresight source.
  68. Wald, Christian; Schaff, Stefan; Deguenther, Markus; Runde, Daniel, Optical waveguide for guiding illumination light.
  69. Wald, Christian; Schaff, Stefan; Deguenther, Markus; Runde, Daniel, Optical waveguide for guiding illumination light.
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  71. Mulkens Johannes C. H.,NLX ; Van Den Brink Marinus A.,NLX ; Jasper Johannes C. M.,NLX, Photolithographic apparatus.
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  75. Shiraishi, Naomasa; Kudo, Yuji, Projection exposure apparatus.
  76. Shiraishi, Naomasa; Kudo, Yuji; Kamiya, Saburo, Projection exposure apparatus.
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  80. Shiraishi, Naomasa, Projection exposure apparatus and method.
  81. Shiraishi, Naomasa, Projection exposure apparatus and method.
  82. Shiraishi, Naomasa, Projection exposure apparatus with luminous flux distribution.
  83. Matsuyama Tomoyuki, Projection exposure method and apparatus.
  84. Matsuyama Tomoyuki, Projection exposure method and apparatus.
  85. Shiraishi, Naomasa, Projection exposure method and apparatus that produces an intensity distribution on a plane substantially conjugate to a projection optical system pupil plane.
  86. Shiraishi, Naomasa, Projection exposure methods using difracted light with increased intensity portions spaced from the optical axis.
  87. Eckhardt, Stephen K., Projection illumination system with tunnel integrator and field lens.
  88. Eckhardt,Stephen K., Projection illumination system with tunnel integrator and field lens.
  89. Suenaga Yutaka,JPX ; Yamaguchi Kotaro,JPX, Projection optical system and method of using such system for manufacturing devices.
  90. Kudo Yuji,JPX ; Tanitsu Osamu,JPX, Projection optical system, illumination apparatus, and exposure apparatus.
  91. Endo Kazumasa,JPX, Projection-optical system for use in a projection-exposure apparatus.
  92. Concannon David (Farmington Hills MI) Vala John (Plymouth MI) Catchpole Clive (Birmingham MI), Randomizing optical converter for illumination beam and method utilizing same.
  93. Cassarly, William J.; Davenport, Thomas L. R.; McGuire, Jr., James P., Rippled mixers for uniformity and color mixing.
  94. Kamijima, Shunji, Rod integrator, illuminator, projector, and optical device.
  95. Jennings, Dean C.; Yam, Mark; Mayur, Abhilash J.; Behrens, Vernon; O'Brien, Paul A.; Tertitski, Leonid M.; Goldin, Alexander, Scanned laser light source.
  96. Shiozawa Takahisa (Utsunomiya JPX), Scanning exposure apparatus.
  97. Huang Alan, Switching using optical tunnels.
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