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NTIS 바로가기국가/구분 | United States(US) Patent 등록 |
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국제특허분류(IPC7판) |
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출원번호 | US-0230948 (1988-08-11) |
우선권정보 | JP-0212292 (1987-08-26) |
발명자 / 주소 |
|
출원인 / 주소 |
|
인용정보 | 피인용 횟수 : 2 인용 특허 : 4 |
A photosensitive material to which an image has been exposed is successively dipped into treatment liquid such as developer wherein development or other treatment is conducted. The photosensitive material drawn out from each treatment liquid is held by holding rollers and the treatment liquid is wip
A photosensitive material treatment device for developing an exposed photosensitive material comprising: (a) treatment chambers each filled with a treatment liquid for treating a photosensitive material; (b) means for holding and conveying said photosensitive material in said treatment chambers; (c)
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