최소 단어 이상 선택하여야 합니다.
최대 10 단어까지만 선택 가능합니다.
다음과 같은 기능을 한번의 로그인으로 사용 할 수 있습니다.
NTIS 바로가기다음과 같은 기능을 한번의 로그인으로 사용 할 수 있습니다.
DataON 바로가기다음과 같은 기능을 한번의 로그인으로 사용 할 수 있습니다.
Edison 바로가기다음과 같은 기능을 한번의 로그인으로 사용 할 수 있습니다.
Kafe 바로가기국가/구분 | United States(US) Patent 등록 |
---|---|
국제특허분류(IPC7판) |
|
출원번호 | US-0371700 (1989-06-23) |
발명자 / 주소 |
|
출원인 / 주소 |
|
인용정보 | 피인용 횟수 : 784 인용 특허 : 5 |
An integrated modular multiple chamber vacuum processing system is disclosed. The system includes a load lock, may include an external cassette elevator, and an internal load lock wafer elevator, and also includes stations about the periphery of the load lock for connecting one, two or several vacuu
An integrated modular multiple chamber vacuum processing system is disclosed. The system includes a load lock, may include an external cassette elevator, and an internal load lock wafer elevator, and also includes stations about the periphery of the load lock for connecting one, two or several vacuum process chambers to the load lock chamber. A robot is mounted within the load lock and utilizes a concentric shaft drive system connected to an end effector via a dual four-bar link mechanism for imparting selected R-q
An integrated vacuum processing system for workpieces such as semiconductor wafers, comprising: a vacuum load lock chamber, having a closable entrance; at least one vacuum processing chamber mounted to said load lock chamber and communicating therewith via openings in the adjacent chambers; each of
An integrated vacuum processing system for workpieces such as semiconductor wafers, comprising: a vacuum load lock chamber, having a closable entrance; at least one vacuum processing chamber mounted to said load lock chamber and communicating therewith via openings in the adjacent chambers; each of said processing chambers including a wafer support means and being adapted for performing a process selected from at least one of gas chemistry etching, gas chemistry deposition, physical sputtering and rapid annealing on at least one wafer positioned on the support and, further including means for reversibly moving a wafer along an axis from a selected internal position adjacent the wafer support means to and onto the wafer support means; and a wafer handling robot mounted within the load lock chamber, comprising: a wafer support blade; a foldable dual four-bar link mechanism mounting the blade at a first, output end thereof and having a second, opposite actuator end comprising an input link rotatably mounted at a selected location with the chamber for moving the four-bar link mechanism between a folded configuration with the output end on one side of the selected mounting position and selected extended orientations with the output end on the opposite side of the selected mounting position, including an extended configuration with the wafer support blade at said selected internal position; means for rotating the input link to extend and retract the foldable dual four-bar link mechanism and support blade; and means for rotating the dual four-bar link mechanism and wafer support blade.
Copyright KISTI. All Rights Reserved.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.