초록 ▼

An oxidation chamber for use in the treatment of organically contaminated water and waste liquids includes a lamp seal assembly that accommodates the thermal expansion of an ultraviolet lamp while at the same time protecting the lamp from direct contact with the liquid being treated. The lamp seal a

An oxidation chamber for use in the treatment of organically contaminated water and waste liquids includes a lamp seal assembly that accommodates the thermal expansion of an ultraviolet lamp while at the same time protecting the lamp from direct contact with the liquid being treated. The lamp seal assembly facilitates replacement of burned out lamps and cleaning of the protective tube that surrounds the lamp. In another aspect of the invention, a specially designed family of baffles and distributors are provided so that the chamber can accommodate a wide range of flow rates simply by replacing one set of distributors by a different set of distributors.

대표청구항 ▼

A liquid treatment chamber comprising: a top wall; a bottom wall; a front wall; a rear wall; a first end wall; a second end wall opposite said first end wall; at least one pair of baffles, each baffle oriented parallel to said first end wall and each baffle extending from said front wall to said rea

A liquid treatment chamber comprising: a top wall; a bottom wall; a front wall; a rear wall; a first end wall; a second end wall opposite said first end wall; at least one pair of baffles, each baffle oriented parallel to said first end wall and each baffle extending from said front wall to said rear wall, consecutive baffles being designated by the integers 1 through 2N with baffle 1 facing said first end wall, where N is the number of pairs of baffles; the odd numbered baffles extending upward from said bottom wall and having upper edges spaced from said top wall, the even numbered baffles extending downward from said top wall and having lower edges spaced from said bottom wall, whereby the baffles define a serpentine flow path of 2N+1 adjacent segments and having a total length equal approximately to 2N+1 times the height of the chamber; the odd numbered baffles having holes located near their lower edges, the holes in registration and located lower than the lower edges of the even numbered baffles, the even numbered baffles having holes located near their upper edges, the holes in registration and located above the upper edges of the odd numbered baffles.