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Distributed ECR remote plasma processing and apparatus 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B05D-003/06
출원번호 US-0255208 (1988-10-07)
발명자 / 주소
  • Moslehi Mehrdad M. (Dallas TX) Huang Steve S. (Dallas TX)
출원인 / 주소
  • Texas Instruments Incorporated (Dallas TX 02)
인용정보 피인용 횟수 : 153  인용 특허 : 0

초록 ▼

A distributed electron cyclotron resonance remote plasma processing apparatus and method which includes generating electron cyclotron resonance activated species in plasma formation regions distributed peripherally around, remote from the wafer processing chamber and in fluid communication with the

대표청구항 ▼

A distributed electron cyclotron resonance remote plasma processing apparatus, comprising: (a) a processing chamber; (b) a main transfer chamber in fluid communication with the processing chamber; (c) a plurality of peripheral magnet bars substantially surrounding the main transfer chamber; (d) a pl

이 특허를 인용한 특허 (153)

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