초록 ▼

A method is provided for monitoring and controlling the deposition of an optical thin film having a refractive index gradient. The optical material to be deposited is evaporated at a controllable rate. In a coevaporation process, evaporation of material having a lower index of refraction is generall

A method is provided for monitoring and controlling the deposition of an optical thin film having a refractive index gradient. The optical material to be deposited is evaporated at a controllable rate. In a coevaporation process, evaporation of material having a lower index of refraction is generally held at a predetermined rate while evaporation of material having a higher index of refraction is controllable. During deposition, the film and substrate are illuminated by a broadband light source. The incident light reflected by the film and substrate produces an interference pattern comprising a reflectance spectrum that is detected to compute an optical thickness estimate of the film. The detected reflectance is compared to a reflectance specified for that optical thickness by a predetermined refractive index profile of the desired film. The controllable rate of evaporation is then adjusted so that the refractive index of the material being deposited conforms to the predetermined profile.

대표청구항 ▼

A method of fabricating a gradient index optical film having a specified refractive index profile, comprising the steps of: providing a first optical material having a fist refractive index; providing a second optical material having a second refractive index; evaporating said first material at a pr

A method of fabricating a gradient index optical film having a specified refractive index profile, comprising the steps of: providing a first optical material having a fist refractive index; providing a second optical material having a second refractive index; evaporating said first material at a predetermined rate and said second material at a controllable rate; depositing said first and second evaporated materials on a substrate to form a layer having a refractive index determined by a relationship between said controllable and predetermined rates of evaporation; illuminating said layer and substrate with a broadband light source; detecting a reflectance spectrum comprising an interference pattern produced by reflection of said broadband light from said layer and substrate; estimating an optical thickness of said layer by fitting said detected reflectance spectrum to a single layer model of reflectance; comparing said reflectance spectrum to a reflectance specified for the film by the refractive index profile at said estimated optical thickness; and adjusting said controllable rate of evaporation of said second material to cause the refractive index of said layer to conform to the predetermined refractive index profile of the film.