초록 ▼

A plasma CVD apparatus having a rotary vacuum reaction vessel, a starting gas introducing port, an ambient gas introducing port, an exhaust port, electrodes or an induction coil for applying a high-frequency electric field, and a cooling pipe provided in the starting gas introducing port for cooling

A plasma CVD apparatus having a rotary vacuum reaction vessel, a starting gas introducing port, an ambient gas introducing port, an exhaust port, electrodes or an induction coil for applying a high-frequency electric field, and a cooling pipe provided in the starting gas introducing port for cooling the starting gas introducing port, wherein the starting gas introducing port and the exhaust port are located in opposition to each other on a rotating axis of the reaction vessel.

대표청구항 ▼

A plasma CVD apparatus comprising: a rotatable plasma reaction vessel; a starting gas introducing pipe for introducing a starting gas thereinto; an ambient gas introducing pipe opening into said reaction vessel for introducing an ambient gas thereinto; an exhaust pipe opening out of said reaction ve

A plasma CVD apparatus comprising: a rotatable plasma reaction vessel; a starting gas introducing pipe for introducing a starting gas thereinto; an ambient gas introducing pipe opening into said reaction vessel for introducing an ambient gas thereinto; an exhaust pipe opening out of said reaction vessel; means for applying a high frequency electric field to the interior of said reaction vessel; a starting gas blowing port means on said starting gas introducing pipe within said reaction vessel; and a cooling means in direct heat exchange relation with said port means for cooling said port means wherein said starting gas introducing pipe and said exhaust pipe are located in opposition to each other on a rotating axis of said reaction vessel.