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[미국특허] Continuous semiconductor substrate processing system 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B65H-085/00
출원번호 US-0403355 (1989-09-06)
우선권정보 JP-0230578 (1988-09-14); JP-0168333 (1989-06-30)
발명자 / 주소
  • Kiriseko Tadashi (Kanagawa JPX) Tani Hiromichi (Kawasaki JPX) Soma Noriko (Yokohama JPX) Shigemi Nobuhisa (Kawasaki JPX) Toyoda Takayuki (Yokkaichi JPX)
출원인 / 주소
  • Fujitsu Limited (Kawasaki JPX 03)
인용정보 피인용 횟수 : 73  인용 특허 : 4

초록

A continuous semiconductor substrate processing system is operated by a system control structure in accordance with a predetermined processing program. A wafer conveying mechanism conveys wafers to and from each of plural process stations, each of which performs a corresponding process step on semic

대표청구항

A continuous semiconductor wafer processing system for continuously performing a plurality of process steps, in accordance with one or more predetermined sequences of such process steps, on one or more lots of semiconductor wafers, comprising: a wafer conveying mechanism; plural carriers and means f

이 특허에 인용된 특허 (4) 인용/피인용 타임라인 분석

  1. Neri Armando (Bologna ITX), Automated system for feeding production and/or packing material from a store onto manufacturing lines.
  2. Jacoby Hans-Dieter (Werdorf DEX) Schmidt Peter (Huettenberg DEX), Device for automatically transporting disk shaped objects.
  3. Kawata Yasunori (Tokyo JPX) Kanno Fujio (Tokyo JPX), Manufacturing line control system.
  4. Williams Ronald C. (Concord NC) Kendall Barry L. (Concord NC) Deaton Franklin (Kannapolis NC) Sedlak Milton (Charlotte NC), Material handling for automated assembly facility.

이 특허를 인용한 특허 (73) 인용/피인용 타임라인 분석

  1. Nering Eric A., Apparatus and method for automated cassette handling.
  2. Nishida, Shoso, Apparatus including a fixed temporary stage for manufacturing molded product.
  3. Takeshi Kubota JP; Norikazu Komatsu JP, Apparatus used for fabricating liquid crystal device and method of fabricating the same.
  4. Conboy Michael R. ; Shedd Danny C. ; Coss ; Jr. Elfido, Automated material handling system for a manufacturing facility divided into separate fabrication areas.
  5. Conboy,Michael R.; Shedd,Danny C.; Coss, Jr.,Elfido, Automated material handling system for a manufacturing facility divided into separate fabrication areas.
  6. Conboy Michael R. ; Goff Gerald L.,DEX ; Coss ; Jr. Elfido, Automated wafer transfer system.
  7. Watanabe Hiroshi,JPX ; Hasegawa Hiroaki,JPX, Automatic lot organization method.
  8. Aruga Yoshiki,JPX ; Kamikura Yo,JPX, Compact in-line film deposition system.
  9. Kirkpatrick Thomas I. ; Otwell Robert L., Cost effective modular-linear wafer processing.
  10. Kirkpatrick Thomas I. ; Otwell Robert L., Cost effective modular-linear wafer processing.
  11. Fujita, Hiroyasu, Exposure apparatus, substrate processing unit and lithographic system, and device manufacturing method.
  12. Kailasam, Sridhar Karthik; Friedman, Robin; Pradhan, Anshu A.; Rozbicki, Robert T., Fabrication of low defectivity electrochromic devices.
  13. Kailasam, Sridhar; Friedman, Robin; Pradhan, Anshu; Rozbicki, Robert T., Fabrication of low defectivity electrochromic devices.
  14. Kozlowski, Mark; Kurman, Eric; Wang, Zhongchun; Scobey, Mike; Dixon, Jeremy; Pradhan, Anshu; Rozbicki, Robert, Fabrication of low defectivity electrochromic devices.
  15. Kozlowski, Mark; Kurman, Eric; Wang, Zhongchun; Scobey, Mike; Dixon, Jeremy; Pradhan, Anshu; Rozbicki, Robert, Fabrication of low defectivity electrochromic devices.
  16. Yokoyama Natsuki,JPX ; Kawamoto Yoshifumi,JPX ; Murakami Eiichi,JPX ; Uchida Fumihiko,JPX ; Mizuishi Kenichi,JPX ; Kawamura Yoshio,JPX, Fabrication system and fabrication method.
  17. Yokoyama, Natsuki; Kawamoto, Yoshifumi; Murakami, Eiichi; Uchida, Fumihiko; Mizuishi, Kenichi; Kawamura, Yoshio, Fabrication system and fabrication method.
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  21. Yokoyama Natsuki,JPX ; Kawamoto Yoshifumi,JPX ; Murakami Eiichi,JPX ; Uchida Fumihiko,JPX ; Mizuishi Kenichi,JPX ; Kawamura Yoshio,JPX, Fabrication system and method having inter-apparatus transporter.
  22. Yokoyama Natsuki,JPX ; Kawamoto Yoshifumi,JPX ; Murakami Eiichi,JPX ; Uchida Fumihiko,JPX ; Mizuishi Kenichi,JPX ; Kawamura Yoshio,JPX, Fabrication system and method having inter-apparatus transporter.
  23. Natzle, Wesley C.; Ahlgren, David C.; Barbee, Steven G.; Cantell, Marc W.; Jagannathan, Basanth; Lanzerotti, Louis D.; Subbanna, Seshadri; Wuthrich, Ryan W., Low defect pre-emitter and pre-base oxide etch for bipolar transistors and related tooling.
  24. Jevtic Dusan, Method and apparatus for priority based scheduling of wafer processing within a multiple chamber semiconductor wafer pr.
  25. Nguyen Thu ; Lavi Michal, Method and apparatus for sequencing wafers in a multiple chamber, semiconductor wafer processing system.
  26. Yamagishi, Masayuki, Method and system for management to manufacturing process for products.
  27. Ogata, Ryoji; Ohtsuka, Hirofumi; Yanaru, Taichi, Method of interbay transportation.
  28. Hasper, Albert, Method of processing substrates with integrated weighing steps.
  29. Yokayama Tetsuhiro,JPX ; Fujikawa Keiji,JPX ; Fukuoka Yoouichi,JPX ; Fujiwara Yooichi,JPX ; Narita Junji,JPX ; Saitoo Terumi,JPX ; Inoue Hiroo,JPX, Method of producing parts/substrate assemblies.
  30. Aruga Yoshiki,JPX ; Maeda Koji,JPX, Method of removing accumulated films from the surface of substrate holders in film deposition apparatus, and film deposition apparatus.
  31. Lei, Lawrence Chung-Lai; Mak, Alfred; Liu, Rex; Park, Kon; Wu, Tzy-Chung Terry; Zhu, Simon; Shin, Gene; Wang, Xiaoming, Methods and systems of transferring a substrate to minimize heat loss.
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  37. Malitsky, Sofya B.; Liu, Stanley P.; Yi, Janet E.; Wong, Eileen A. H., Module classification approach for moving semiconductor wafers in a wafer processing system.
  38. Malitsky, Sofya B.; Liu, Stanley P.; Yi, Janet E.; Wong, Eileen A. H., Module classification approach for moving semiconductor wafers in a wafer processing system.
  39. Kao Te-Yin,TWX, Multi-track wafer processing method.
  40. Chen, Tsan I; Chen, Yu-Kun, Object carrier transport system and method of transporting object carriers.
  41. Jain, Jaideep; Liu, Stanley P.; Yi, Janet; Wong, Eileen A. H.; Malitsky, Sofya B.; Hentschel, Thomas, Operational lists for simultaneous wafer scheduling and system event scheduling.
  42. Park Tae-sin,KRX, Photolithographic apparatus composed of coater/developer and a plurality of steppers in parallel connected thereto.
  43. Tae-sin Park KR, Photolithographic apparatus composed of coater/developer and a plurality of steppers in parallel connected thereto.
  44. Terada Akihiro (Tokyo JPX), Probe system.
  45. Koike Atsuyoshi,JPX, Process for fabricating two different types of wafers in a semiconductor wafer production line.
  46. Akimoto Masami,JPX ; Ueda Issei,JPX, Processing system.
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  48. Furukawa Satomi (Kawasaki JPX) Suzuki Shozo (Kawasaki JPX) Seki Yuuji (Kawasaki JPX) Saitou Jun (Kawasaki JPX), Production control with centralized physical distribution control between storage and production cells.
  49. Komino Mitsuaki,JPX, Reduced pressure and normal pressure treatment apparatus.
  50. Iwasaki Junji,JPX ; Katsube Junichi,JPX ; Itami Yasushi,JPX, Semiconductor wafer cassette transportation apparatus and stocker used therein.
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  54. Chang, Yu-Yen; Lin, Kuo-Chen, Stocker apparatus affording manual access.
  55. Sato Yuusuke,JPX ; Ohmine Toshimitsu,JPX ; Honda Takaaki,JPX, Substrate processing apparatus and substrate processing method.
  56. Miyata,Akira; Higashi,Makio; Wada,Shigeki, Substrate processing apparatus and substrate transferring method.
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  59. Kuit,Jan Jaap, Transport system for a lithographic apparatus and device manufacturing method.
  60. Minoru Soraoka JP; Ken Yoshioka JP; Yoshinao Kawasaki JP, Vacuum processing apparatus and semiconductor manufacturing line using the same.
  61. Soraoka Minoru,JPX ; Yoshioka Ken,JPX ; Kawasaki Yoshinao,JPX, Vacuum processing apparatus and semiconductor manufacturing line using the same.
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