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특허 상세정보

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내보내기 페이스북 공유 카카오톡 공유

Processing liquid supply unit

특허상세정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판) B01F-003/04   
미국특허분류(USC) 118/693; 261/121.1; 261/023.1; 118/715
출원번호 US-0579251 (1990-09-05)
우선권정보 JP-0137927 (1988-06-03)
발명자 / 주소
출원인 / 주소
대리인 / 주소
    Oblon, Spivak, McClelland, Maier & Neustadt
인용정보 피인용 횟수 : 31  인용 특허 : 16
초록

A processing liquid supply unit comprises a storage tank for storing a processing liquid, a sensor for sensing the amount of processing liquid stored in the storage tank, a refilling mechanism for automatically refilling the processing liquid into the storage tank when the sensor senses that the amount of processing liquid in the storage tank drops below the specified value and a processing liquid delivery mechanism for delivering the processing liquid from the storage tank to an object being processed.

대표
청구항
▼

1. A processing liquid supply unit for supplying a processing liquid to an object to be processed in a clean room, said unit comprising: a reserve tank, for reserving a processing liquid, located outside of said clean room; a storing tank for storing said processing liquid supplied from said reserve tank; detecting means for detecting the amount of the processing liquid stored in said storing tank; refilling means for automatically refilling the processing liquid into said storing tank on the basis of detection signals from said detecting means; p...

이 특허에 인용된 특허 (16)

  1. Conger Darrell R. (Portland OR) Posa John G. (Lake Oswego OR) Wickenden Dennis K. (Lake Oswego OR). Apparatus for depositing material on a substrate. USP1988084761269.
  2. Page ; Jr. Theron V. (Lake Oswego OR) Boydston Thomas F. (Tualatine OR) Posa John G. (Tigard OR). Apparatus to provide a vaporized reactant for chemical-vapor deposition. USP1989074844006.
  3. Yates Dow (Loop 336 ; Villa Torres ; Apt. #75D Conroe TX 77301). Chlorine generator and method. USP1981024250126.
  4. Hashimoto Takayoshi (Kanagawa JPX). Clean room system. USP1987094693175.
  5. Rose John W. (Scottsdale AZ). Deposition and diffusion source control means and method. USP1985054517220.
  6. Purr Horst (Tennenbronn DEX) Kistler Manfred (Eisenbach DEX) Mller Rolf (St. Georgen DEX). Electrically operated device, especially duplicating device, with a receptacle to accommodate fluid for the chemical tre. USP1981104295913.
  7. Takimoto Hiroaki (Yokohama JPX) Miyajiri Tetsuo (Yokohama JPX) Yoshida Kiminobu (Yokohama JPX) Turita Tamio (Yokohama JPX). Gas supplying apparatus. USP1986014563312.
  8. Lees Robert (Chester VA) Jones Marvin C. (Chesterfield VA). Low shear gravity controlled yarn finish supply system. USP1982014311114.
  9. Dastoli Frank R. (Arlington TX) Senkowski Bernard Z. (Fort Worth TX) Wagener Dieter W. (Fort Worth TX) Bogdanffy George H. (Fort Worth TX) Vin Gaurang R. (Arlington TX). Means and method for aseptic particle-free production of articles. USP1989114880581.
  10. Fukuda Yuji (Yokohama JPX). Method and apparatus for developing resist film including a movable nozzle arm. USP1986014564280.
  11. Lynch Brian (Norcross GA) Narasimham Pundi L. (Norcross GA) Partus Fred P. (Marietta GA). Methods of and apparatus for vapor delivery control in optical preform manufacture. USP1986044582480.
  12. Miyajiri, Tetsuo; Habasaki, Toshimi; Yokota, Hiroshi; Tsurita, Tamio; Nakahara, Motohiro. Raw material supply device. USP1985104545801.
  13. Savard Guy (Westmount CAX) Lee Robert G. H. (Montreal CAX) Hornsey Derek (Roxboro CAX). Two zone apparatus for biological treatment of waste water. USP1981114301007.
  14. Partus Fred P. (Cobbs County GA). Vapor delivery control system and method. USP1981064276243.
  15. Partus Fred P. (Atlanta GA). Vapor delivery system and method. USP1980094220460.
  16. Partus Fred P. (Cobb County GA). Vapor delivery system and method of maintaining a constant level of liquid therein. USP1980114235829.

이 특허를 인용한 특허 피인용횟수: 31

  1. Scholz,Christoph. Apparatus and process for refilling a bubbler. USP2007107278438.
  2. Englhardt, Eric A.; Rice, Michael R.; Hudgens, Jeffrey C.; Hongkham, Steve; Pinson, Jay D.; Salek, Mohsen; Carlson, Charles; Weaver, William T; Armer, Helen R.. Cartesian cluster tool configuration for lithography type processes. USP2010107819079.
  3. Rice, Mike; Hudgens, Jeffrey; Carlson, Charles; Weaver, William Tyler; Lowrance, Robert; Englhardt, Eric; Hruzek, Dean C.; Silvetti, Dave; Kuchar, Michael; Katwyk, Kirk Van; Hoskins, Van; Shah, Vinay. Cartesian robot cluster tool architecture. USP2010017651306.
  4. Ishikawa, Tetsuya; Roberts, Rick J.; Armer, Helen R.; Volfovski, Leon; Pinson, Jay D.; Rice, Michael; Quach, David H.; Salek, Mohsen S.; Lowrance, Robert; Backer, John A.; Weaver, William Tyler; Carlson, Charles; Wang, Chongyang; Hudgens, Jeffrey; Herchen, Harald; Lue, Brian. Cluster tool architecture for processing a substrate. USP2010067743728.
  5. Ishikawa, Tetsuya; Roberts, Rick J.; Armer, Helen R.; Volfovski, Leon; Pinson, Jay D.; Rice, Michael; Quach, David H.; Salek, Mohsen S.; Lowrance, Robert; Backer, John A.; Weaver, William Tyler; Carlson, Charles; Wang, Chongyang; Hudgens, Jeffrey; Herchen, Harald; Lue, Brian. Cluster tool architecture for processing a substrate. USP2010047694647.
  6. Ishikawa, Tetsuya; Roberts, Rick J.; Armer, Helen R.; Volfovski, Leon; Pinson, Jay D.; Rice, Michael; Quach, David H.; Salek, Mohsen S.; Lowrance, Robert; Backer, John A.; Weaver, William Tyler; Carlson, Charles; Wang, Chongyang; Hudgens, Jeffrey; Herchen, Harald; Lue, Brian. Cluster tool architecture for processing a substrate. USP2013108550031.
  7. Ishikawa,Tetsuya; Roberts,Rick J.; Armer,Helen R.; Volfovski,Leon; Pinson,Jay D.; Rice,Michael; Quach,David H.; Salek,Mohsen S.; Lowrance,Robert; Backer,John A.; Weaver,William Tyler; Carlson,Charles; Wang,Chongyang; Hudgens,Jeffrey; Herchen,Harald; Lue,Brian. Cluster tool architecture for processing a substrate. USP2008047357842.
  8. Volfovski, Leon; Ishikawa, Tetsuya. Cluster tool substrate throughput optimization. USP2010047699021.
  9. Takekuma,Takashi; Kometani,Yasuyuki; Fukuda,Yoshiteru; Minamida,Junya. Coating process method and coating process apparatus. USP2009027485188.
  10. Birtcher, Charles Michael; Steidl, Thomas Andrew; Baker, John Eric. Cross purge valve and container assembly. USP2011088002247.
  11. Takeshita, Kazuhiro; Nagashima, Shinji; Mizutani, Yoji; Katayama, Kyoshige. Gas treatment apparatus. USP2003126660096.
  12. Mitsui, Hiroyuki; Nakai, Osamu; Asatori, Moritarou. Liquid storage apparatus and method of controlling the pressure in the same. USP2015099139890.
  13. Curran,William J.. Liquid vapor delivery system and method of maintaining a constant level of fluid therein. USP2006037011299.
  14. Nishizato, Hiroshi; Miyamoto, Hideaki. Method and an apparatus for mixing and gasifying a reactant gas-liquid mixture. USP2004066752387.
  15. Nguyen Son T. ; Hendrickson Scott. Method and apparatus for generating controlled mixture of organic vapor and inert gas. USP2001116311959.
  16. Walter Forjahn DE. Method and device for monitoring fluid consumption. USP2002046374160.
  17. Curran,William J.. Method for maintaining a constant level of fluid in a liquid vapor delivery system. USP2006047025337.
  18. Takekuma, Takashi; Furusho, Toshinobu; Ohto, Takeshi; Miyamoto, Hiroyuki; Yoshihara, Kousuke; Hori, Shinya; Hara, Hiroyuki. Process liquid supply mechanism and process liquid supply method. USP2005026848625.
  19. Kang, Gu-Young. Raw material providing device for chemical vapor deposition process. USP2005126978984.
  20. Ohtani Masami,JPX ; Sasaki Tadashi,JPX. Substrate processing apparatus. USP1999126007629.
  21. Takamizawa, Hisashi. Substrate processing apparatus. USP2016059329071.
  22. Satake, Keigo. Substrate processing apparatus, substrate processing method and storage medium. USP2013048409359.
  23. Rice, Mike; Hudgens, Jeffrey; Carlson, Charles; Weaver, William Tyler; Lowrance, Robert; Englhardt, Eric; Hruzek, Dean C.; Silvetti, Dave; Kuchar, Michael; Van Katwyk, Kirk; Hoskins, Van; Shah, Vinay. Substrate processing sequence in a Cartesian robot cluster tool. USP2011118066466.
  24. Rice, Mike; Hudgens, Jeffrey; Carlson, Charles; Weaver, William Tyler; Lowrance, Robert; Englhardt, Eric; Hruzek, Dean C.; Silvetti, Dave; Kuchar, Michael; Katwyk, Kirk Van; Hoskins, Van; Shah, Vinay. Substrate processing sequence in a cartesian robot cluster tool. USP2014128911193.
  25. Rice, Mike; Hudgens, Jeffrey; Carlson, Charles; Weaver, William Tyler; Lowrance, Robert; Englhardt, Eric; Hruzek, Dean C.; Silvetti, Dave; Kuchar, Michael; Van Katwyk, Kirk; Hoskins, Van; Shah, Vinay. Substrate processing sequence in a cartesian robot cluster tool. USP2010097798764.
  26. Flaherty, B. Michael. Systems moving air through a conduit within a solar heat collector having overtemperature protection. USP2012088235034.
  27. Sivaramakrishnan Visweswaren ; White John M.. Vaporizing reactant liquids for chemical vapor deposition film processing. USP1999115976262.
  28. Sivaramakrishnan Visweswaren ; White John M.. Vaporizing reactant liquids for chemical vapor deposition film processing. USP2001056224681.
  29. Sivaramakrishnan, Visweswaren; White, John M.. Vaporizing reactant liquids for chemical vapor deposition film processing. USP2004086783118.
  30. Sivaramakrishnan,Visweswaren; White,John M.. Vaporizing reactant liquids for chemical vapor deposition film processing. USP2006067055809.
  31. Sivaramakrishnan,Visweswaren; White,John; Ishikawa,Koichi; Miyamoto,Hideaki; Kawano,Takeshi. Vaporizing reactant liquids for chemical vapor deposition film processing. USP2006067055808.

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