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Electrodeposited eutectic tin-bismuth alloy on a conductive substrate 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C25D-003/56
  • C25D-003/60
  • C25D-007/00
출원번호 US-0508993 (1990-04-12)
발명자 / 주소
  • Wilson Harold P. (Huron OH)
출원인 / 주소
  • Atochem North America, Inc. (Philadelphia PA 02)
인용정보 피인용 횟수 : 47  인용 특허 : 4

초록

An electroplating bath, cell and method for the electrodeposition of a wide range of tin-bismuth alloys onto a conductive substrate comprises tin and bismuth ion in aqueous solution, and an alkyl sulfonic or polysulfonic acid or salt as the electrolyte. The sulfonic component is present in amounts s

대표청구항

An article of manufacture comprising at least one PWB with at least one conductive surface, having a tin-bismuth alloy deposited on at least a portion of the surface, the alloy being deposited from an electroplating bath comprising bismuth and tin ion in aqueous solution, wherein the bismuth and the

이 특허에 인용된 특허 (4)

  1. Nobel Fred I. (Sands Point NY) Ostrow Barnet (Roslyn NY) Schram David N. (Freeport NY), Bath and process for plating lead and lead/tin alloys.
  2. Wilson Harold P. (Huron OH), Bismuth composition, method of electroplating a tin-bismuth alloy and electroplating bath therefor.
  3. Grenda David W. (Houston PA), Method of electroplating tin and alkaline electroplating bath therefor.
  4. Nobel Fred I. (Sands Point NY) Ostrow Barnet D. (Roslyn NY) Schram David N. (Freeport NY), Tin lead electroplating solutions.

이 특허를 인용한 특허 (47)

  1. Li, Xueping; Li, Yunjun; Laxton, Peter B.; Roundhill, David Max; Arimura, Hidetoshi, Additives and modifiers for solvent- and water-based metallic conductive inks.
  2. Yaniv, Zvi; Jiang, Nan; Novak, James P.; Fink, Richard L., Applying optical energy to nanoparticles to produce a specified nanostructure.
  3. Bokisa George S. (North Olmsted OH) Willis William J. (North Royalton OH), Aqueous electroless plating solutions.
  4. Singh, Nikhilendra; Matsui, Masaki, Bismuth-tin binary anodes for rechargeable magnesium-ion batteries.
  5. Yaniv, Zvi; Yang, Mohshi; Laxton, Peter B., Buffer layer for sintering.
  6. Yaniv, Zvi; Yang, Mohshi; Laxton, Peter B., Buffer layer to enhance photo and/or laser sintering.
  7. Abys, Joseph A.; Li, Jingye; Kudrak, Jr., Edward J.; Xu, Chen, Composite coatings for whisker reduction.
  8. Abys, Joseph A.; Li, Jingye; Kudrak, Jr., Edward J.; Xu, Chen, Composite coatings for whisker reduction.
  9. Kito Satoru,JPX ; Ito Masahito,JPX ; Matuda Fuminori,JPX ; Takeshima Eiki,JPX ; Tanaka Yasuji,JPX ; Fujii Takahiro,JPX ; Izutani Kenjiro,JPX, Composite material having anti-wear property and process for producing the same.
  10. Kito Satoru,JPX ; Ito Masahito,JPX ; Matuda Fuminori,JPX ; Takeshima Eiki,JPX ; Tanaka Yasuji,JPX ; Fujii Takahiro,JPX ; Izutani Kenjiro,JPX, Composite material having anti-wear property and process for producing the same.
  11. Jonathan R. Goldstein IL; Inna Gektin IL, Corrosion-resistant zinc alloy powder and method of manufacturing.
  12. Guarnaccia, David; Keigler, Arthur; Papapanayiotou, Demetrius; Chiu, Johannes, Electro chemical deposition and replenishment apparatus.
  13. Papapanayiotou, Demetrius; Keigler, Arthur; Guarnaccia, David; Hander, Jonathan; Chiu, Johannes, Electro chemical deposition and replenishment apparatus.
  14. Keigler, Arthur; Guarnaccia, David; Papapanayiotou, Demetrius; Hander, Jonathan, Electrochemical deposition apparatus with remote catholyte fluid management.
  15. Cavallotti Pietro Luigi,ITX ; Sirtori Vittorio,ITX ; Zangari Giovanni, Electrodeposition bath.
  16. Rash, Robert; Abraham, Richard; Porter, David W.; Mayer, Steven T., Electrolyte loop with pressure regulation for separated anode chamber of electroplating system.
  17. Mayer, Steven T.; Porter, David W., Electroplating apparatus and process for wafer level packaging.
  18. Mayer, Steven T.; Porter, David W., Electroplating apparatus and process for wafer level packaging.
  19. Kinoshita, Mitsuru; Hirano, Tsugihiko; Takahashi, Katsunori, Electroplating method for a semiconductor device.
  20. Kinoshita,Mitsuru; Hirano,Tsugihiko; Takahashi,Katsunori, Electroplating method for a semiconductor device.
  21. Martyak, Nicholas M.; Stringer, Gary E.; Smith, Gary S., High speed tin plating process.
  22. Singh, Nikhilendra; Matsui, Masaki, Indium-tin binary anodes for rechargeable magnesium-ion batteries.
  23. Li, Yunjun; Roundhill, David Max; Li, Xueping; Laxton, Peter B.; Arimura, Hidetoshi; Yaniv, Zvi, Metallic ink.
  24. Li, Yunjun; Roundhill, David Max; Yang, Mohshi; Pavlovsky, Igor; Fink, Richard Lee; Yaniv, Zvi, Metallic ink.
  25. Cheung, Edwin Wai Ming; Karim, Zaheed Sadrudin, Method of forming lead-free bump interconnections.
  26. Shimokawa,Hanae; Soga,Tasao; Okudaira,Hiroaki; Ishida,Toshiharu; Nakatsuka,Tetsuya; Inaba,Yoshiharu; Nishimura,Asao, Method of producing an electronic device having a PB free solder connection.
  27. Bishop Craig V. ; Bokisa George S. ; Durante Robert J. ; Kochilla John R., Method of producing copper surfaces for improved bonding, compositions used therein and articles made therefrom.
  28. Bishop, Craig V.; Bokisa, George S.; Durante, Robert J.; Kochilla, John R., Method of producing copper surfaces for improved bonding, compositions used therein and articles made therefrom.
  29. Bishop, Craig V.; Bokisa, George S.; Durante, Robert J.; Kochilla, John R., Method of producing copper surfaces for improved bonding, compositions used therein and articles made therefrom.
  30. Bokisa George S., Multilayer circuit boards and processes of making the same.
  31. Shimokawa, Hanae; Soga, Tasao; Okudaira, Hiroaki; Ishida, Toshiharu; Nakatsuka, Tetsuya; Inaba, Yoshiharu; Nishimura, Asao, Pb-free solder-connected structure.
  32. Shimokawa, Hanae; Soga, Tasao; Okudaira, Hiroaki; Ishida, Toshiharu; Nakatsuka, Tetsuya; Inaba, Yoshiharu; Nishimura, Asao, Pb-free solder-connected structure and electronic device.
  33. Shimokawa, Hanae; Soga, Tasao; Okudaira, Hiroaki; Ishida, Toshiharu; Nakatsuka, Tetsuya; Inaba, Yoshiharu; Nishimura, Asao, Pb-free solder-connected structure and electronic device.
  34. Shimokawa, Hanae; Soga, Tasao; Okudaira, Hiroaki; Ishida, Toshiharu; Nakatsuka, Tetsuya; Inaba, Yoshiharu; Nishimura, Asao, Pb-free solder-connected structure and electronic device.
  35. Li, Yunjun; Roundhill, David Max; Yang, Mohshi; Pavlovsky, Igor; Fink, Richard Lee; Yaniv, Zvi, Photo-curing process for metallic inks.
  36. Abed, Ovadia; Ginsberg, Valerie Kaye; Novak, James P., Photosintering of micron-sized copper particles.
  37. Bokisa George S. (Fairview Park OH), Plating bath and method for electroplating tin and/or lead.
  38. George S. Bokisa ; Craig V. Bishop ; John R. Kochilla, Process for whisker-free aqueous electroless tin plating.
  39. Fujimoto,Akira, Production method for making film carrier tape for mounting electronic devices thereon.
  40. Chua, Lee Peng; Mayer, Steven T.; Porter, David W.; Ponnuswamy, Thomas A., Protecting anodes from passivation in alloy plating systems.
  41. Chua, Lee Peng; Mayer, Steven T.; Porter, David W.; Ponnuswamy, Thomas A., Protecting anodes from passivation in alloy plating systems.
  42. Junichi Saitoh JP; Tatsuo Kunishi JP; Yukio Hamaji JP, Sn-Bi alloy plating bath and method of plating using the same.
  43. Sakurai Hitoshi,JPX ; Saito Ayumi,JPX ; Date Mayumi,JPX ; Mita Osamu,JPX, Sn-Bi alloy-plating bath and method for forming plated Sn-Bi alloy film.
  44. Werner, Christian N.; Friedemann, Ronald E. H.; Maurer, Jessica, Stannous methanesulfonate solution with adjusted pH.
  45. Nagasaku, Shigeo; Goto, Kunio; Onishi, Shigeo; Ikegami, Hiroaki, Threaded joint for steel pipes.
  46. Bokisa, Sr.,George S.; Eckles,William E.; Frischauf,Robert E., Tin alloy electroplating system.
  47. Bokisa, George S.; Bishop, Craig V.; Kochilla, John R., Tin whisker-free printed circuit board.
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