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Apparatus and method for correcting for drift in production of objects by stereolithography 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01J-001/00
출원번호 US-0268907 (1988-11-08)
발명자 / 주소
  • Spence Stuart T. (South Pasadena CA) Tarnoff Harry L. (Van Nuys CA)
출원인 / 주소
  • 3D Systems, Inc. (Sylmar CA 02)
인용정보 피인용 횟수 : 57  인용 특허 : 0

초록

An apparatus and a method for correcting for drift in production of objects by stereolithography is disclosed. A beam sensor comprising a pinhole in a plate and a photodector behind the pinhole is used to obtain the apparent position of the beam at calibration time and subsequently. A comparison bet

대표청구항

An apparatus for compensating for drift in position in a production of a three-dimensional object by stereolithography from a medium capable of solidification when exposed to a reaction means operating in a prescribed manner upon a working surface of the medium to provide successive adjacent solid l

이 특허를 인용한 특허 (57)

  1. Partanen Jouni P. ; Smalley Dennis R., Apparatus and method for controlling exposure of a solidifiable medium using a pulsed radiation source in building a three-dimensional object using stereolithography.
  2. Hickerson,Kevin P.; Bedal,Bryan; Diephuis,Richard J., Apparatus for three dimensional printing using image layers.
  3. Guertin, Michelle D.; Manners, Chris R., Automatic determination and selection of build parameters for solid freeform fabrication techniques based on automatic part feature recognition.
  4. Cooper, Guthrie, Automatic geometric calibration using laser scanning reflectometry.
  5. Tang, Nansheng; Partanen, Jouni P., Calibrating a focused beam of energy in a solid freeform fabrication apparatus by measuring the propagation characteristics of the beam.
  6. Jouni P. Partanen ; Nansheng Tang ; Xingkun Wu, Electronic spot light control.
  7. Farnworth, Warren M., Layer thickness control for stereolithography utilizing variable liquid elevation and laser focal length.
  8. Farnworth, Warren M., Layer thickness control for stereolithography utilizing variable liquid elevation and laser focal length.
  9. Farnworth, Warren M., Layer thickness control for stereolithography utilizing variable liquid elevation and laser focal length.
  10. Farnworth,Warren M., Layer thickness control for stereolithography utilizing variable liquid elevation and laser focal length.
  11. Bredt, James F.; Anderson, Timothy; Russell, David B.; Clark, Sarah L.; DiCologero, Matthew J., Material systems and methods of three-dimensional printing.
  12. Maguire, Michael Christopher, Method and apparatus for calibrating a projected image manufacturing device.
  13. Gielis, Johan, Method and apparatus for creating timewise display of widely variable naturalistic scenery on an amusement device.
  14. Yee,Kingman; Clapham,Terrance N., Method and apparatus for determining characteristics of a laser beam spot.
  15. Earl, Jocelyn M.; Manners, Chris R., Method and apparatus for forming three-dimensional objects using line width compensation with small features retention.
  16. Frasier, Donald J.; Kush, Matthew; Schlienger, Max Eric; Baldwin, Michael, Method and apparatus for production of a cast component.
  17. Frasier, Donald J.; Schlienger, M. Eric; Brady, Guy Allen; Kush, Matthew T.; Vessely, Patrick A., Method and apparatus for production of a cast component.
  18. Frasier, Donald J.; Schlienger, M. Eric; Brady, Guy Allen; Kush, Matthew T.; Vessely, Patrick A., Method and apparatus for production of a cast component.
  19. Frasier, Donald J.; Schlienger, M. Eric; Kush, Matthew T., Method and apparatus for production of a cast component.
  20. Frasier, Donald J.; Schlienger, M. Eric; Vessely, Patrick A., Method and apparatus for production of a cast component.
  21. Michelle D. Guertin ; Charles W. Hull ; Hop D. Nguyen, Method and apparatus for stereolithographically forming three dimensional objects with reduced distortion.
  22. Gielis, Johan Leo Alfons, Method and apparatus for synthesizing and analyzing patterns.
  23. Gielis, Johan Leo Alfons, Method and apparatus for synthesizing and analyzing patterns utilizing novel "super-formula" operator.
  24. Iverson Norma Jean, Method for manufacturing physical objects using precision stereolithography.
  25. Nguyen Hop D. ; Smalley Dennis R., Method of and apparatus for deriving data intermediate to cross-sectional data descriptive of a three-dimensional object.
  26. Bredt, James F.; Clark, Sarah L.; Uy, Evert F.; DiCologero, Matthew J.; Anderson, Timothy; Tarkanian, Michael; Williams, Derek X., Methods and compositions for three-dimensional printing of solid objects.
  27. Somani, Seema; Yee, Kingman; Shimmick, John S., Methods and systems for laser calibration and eye tracker camera alignment.
  28. Somani,Seema; Yee,Kingman; Shimmick,John K., Methods and systems for laser calibration and eye tracker camera alignment.
  29. Farnworth,Warren M.; Wood,Alan G., Methods for forming protective layers on semiconductor device substrates.
  30. Wood,Alan G.; Farnworth,Warren M.; Watkins,Charles M.; Benson,Peter A., Methods for packaging a plurality of semiconductor dice using a flowable dielectric material.
  31. Cooper, Guthrie; Knaack, Christopher, Methods of automatic geometric calibration using laser scanning reflectometry.
  32. Wood, Alan G.; Farnworth, Warren M.; Watkins, Charles M.; Benson, Peter A., Methods of fabricating a microlens including selectively curing flowable, uncured optically trasmissive material.
  33. Wood,Alan G.; Farnworth,Warren M.; Watkins,Charles M.; Benson,Peter A., Methods of forming conductive elements using organometallic layers and flowable, curable conductive materials.
  34. Wood,Alan G.; Farnworth,Warren M.; Watkins,Charles M.; Benson,Peter A., Microlenses including a plurality of mutually adhered layers of optically transmissive material and systems including the same.
  35. Caratelli, Diego; Gielis, Johan Leo Alfons; Paraforou, Vasiliki; Mescia, Luciano; Bia, Pietro, Patch antenna, method of manufacturing and using such an antenna, and antenna system.
  36. Bishop Raymond J. ; Everett Michael A. ; Chari Arvind ; Ferris Timothy A., Rapid prototyping apparatus with enhanced thermal and/or vibrational stability for production of three dimensional objects.
  37. Kulkarni Rajeev B. ; Manners Chris R., Rapid prototyping method and apparatus with simplified build preparation for production of three dimensional objects.
  38. Toyama,Souichi; Otsuki,Haruaki; Sakamoto,Atsushi; Seki,Kenta; Okubo,Yaichi, Scanner system.
  39. Farnworth,Warren M.; Wood,Alan G., Semiconductor devices including protective layers on active surfaces thereof.
  40. Chris R. Manners ; Michelle D. Guertin ; Hop D. Nguyen ; Jouni P. Partanen ; Nansheng Tang ; Michael A. Everett, Stereolithographic method and apparatus for production of three dimensional objects using multiple beams of different diameters.
  41. Nguyen Hop D. ; Manners Chris R., Stereolithographic method and apparatus for production of three dimensional objects using recoating parameters for groups of layers.
  42. Beers Ross D. ; Partanen Jouni P. ; Tang Nansheng, Stereolithographic method and apparatus with enhanced control of prescribed stimulation and application.
  43. Beers Ross D. ; Chari Arvind ; Partanen Jouni P. ; Tang Nansheng, Stereolithographic method and apparatus with enhanced control of prescribed stimulation production and application.
  44. Beers Ross D. ; Guertin Michelle D., Stereolithographic method and apparatus with enhanced control of prescribed stimulation production and application.
  45. Everett Michael A. ; Beers Ross D., Stereolithographic method and apparatus with enhanced control of prescribed stimulation production and application.
  46. Kerekes Thomas A. ; Beers Ross D., Stereolithographic method and apparatus with enhanced control of prescribed stimulation production and application.
  47. Farnworth, Warren M., Stereolithographic method for applying materials to electronic component substrates and resulting structures.
  48. Farnworth, Warren M.; Wood, Alan G., Stereolithographic methods for forming a protective layer on a semiconductor device substrate and substrates including protective layers so formed.
  49. Bredt, James F.; Clark, Sarah L.; Williams, Derek X.; DiCologero, Matthew J., Thermoplastic powder material system for appearance models from 3D printing systems.
  50. Bredt,James F.; Anderson,Timothy C.; Russell,David B., Three dimensional printing material system and method.
  51. Williams, Derek X., Three dimensional printing material system and method using peroxide cure.
  52. Giller, Eugene; Williams, Derek X., Three dimensional printing material system and method using plasticizer-assisted sintering.
  53. Giller, Eugene; Williams, Derek X., Three dimensional printing material system and method using plasticizer-assisted sintering.
  54. Adamovics,John A., Three-dimensional dosimeter for penetrating radiation and method of use.
  55. Alam, Amir; Bredt, James F.; Clark, Nanette; Flynn, Mary; Sprauer, Jean; Williams, Derek X., Three-dimensional printing material system with improved color, article performance, and ease of use.
  56. Daily Carl S. ; Lees Daniel A. ; McKitterick Dennis Donald, Truss structure design.
  57. Hembree, David R.; Farnworth, Warren M., Underfill and encapsulation of semiconductor assemblies with materials having differing properties.
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