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Surface cleaning using a cryogenic aerosol 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B08B-005/00
출원번호 US-0534810 (1990-06-05)
발명자 / 주소
  • McDermott Wayne T. (Allentown PA) Ockovic Richard C. (Allentown PA) Wu Jin J. (Ossining NY) Cooper Douglas W. (Millwood NY) Schwarz Alexander (Allentown PA) Wolfe Henry L. (Pleasant Valley NY)
출원인 / 주소
  • Air Products and Chemicals, Inc. (Allentown PA 02) International Business Machines Corporation (Yorktown Heights NY 02)
인용정보 피인용 횟수 : 163  인용 특허 : 0

초록

A method is disclosed for cleaning microelectronics surfaces using an aerosol of at least substantially solid argon particles which impinge upon the surface to be cleaned and then evaporate and the resulting gas is removed by venting along with the contaminants dislodged by the cleaning method.

대표청구항 ▼

A method for removing contaminating particles and/or films from a particle and/or film-containing surface using an impinging stream of an at least substantially solid argon particle-containing aerosol, comprising: expanding a pressurized gaseous argon-containing stream, which is at a temperature abo

이 특허를 인용한 특허 (163)

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