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[미국특허] Apparatus for semiconductor lithography 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G21K-005/00
  • G02B-005/10
출원번호 US-0528532 (1990-05-30)
발명자 / 주소
  • Jewell Tanya E. (Bridgewater NJ) Rodgers J. Michael (Pasadena CA)
출원인 / 주소
  • AT&T Bell Laboratories (Murray Hill NJ 02)
인용정보 피인용 횟수 : 110  인용 특허 : 0

초록 ▼

Disclosed is apparatus, exemplarily semiconductor X-ray lithography apparatus, that comprises a novel projection system. In preferred embodiments the projection system is adapted for use with radiation of wavelength below about 30 nm. The system comprises four or more mirrors that form a finite conj

대표청구항 ▼

Apparatus adapted for semiconductor lithography comprising (a) means for holding an essentially flat mask member, the mask member to be exposed to process radiation during at least part of the time the apparatus is used, (b) means for holding a semiconductor member in predetermined relationship with

이 특허를 인용한 특허 (110) 인용/피인용 타임라인 분석

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