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Wafer reactor vessel window with pressure-thermal compensation 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-016/48
  • C23C-016/56
출원번호 US-0579741 (1990-09-07)
발명자 / 주소
  • Adams David V. (San Jose CA) Anderson Roger N. (San Jose CA)
출원인 / 주소
  • Applied Materials, Inc. (Santa Clara CA 02)
인용정보 피인용 횟수 : 47  인용 특허 : 0

초록

A quartz window for a wafer reactor vessel has a flat bow for withstanding the pressure differential between the ambient outside pressure and the reduced pressure in the wafer chamber. The bow is enhanced at elevated operating temperatures to compensate for the flattening effect of higher pressure d

대표청구항

A reactor for processing semiconductor wafers at an elevated temperature in a processing gas at a reduced pressure, comprising: reactor vessel having a wafer chamber for containing at least one semiconductor wafer during processing, and having a heating port through the reactor vessel to the chamber

이 특허를 인용한 특허 (47)

  1. Gat Arnon ; Champetier Robert J. ; Fabian Ram Z.,ILX, Apparatus and method for filtering light in a thermal processing chamber.
  2. Sanchez, Errol Antonio C.; Srinivasan, Swaminathan T., Apparatus for impurity layered epitaxy.
  3. Fayfield Robert T. ; Schwab Brent, Apparatus for processing both sides of a microelectronic device precursor.
  4. Sahoda, Tsutomu; Masu, Yoshiaki; Maruyama, Takashi, Chamber apparatus and heating method.
  5. Halpin Michael W., Compact process chamber for improved process uniformity.
  6. Halpin, Michael W., Compact process chamber for improved process uniformity.
  7. Michael W. Halpin, Compact process chamber for improved process uniformity.
  8. Beinglass Israel ; Venkatesan Mahalingam, Deposition of silicon nitride thin films.
  9. Anderson Roger N., Domed wafer reactor vessel window with reduced stress at atmospheric and above atmospheric pressures.
  10. Roger N. Anderson, Domed wafer reactor vessel window with reduced stress at atmospheric and above atmospheric pressures.
  11. White, John M.; Verplancken, Donald; Kurita, Shinichi, Electronic device manufacturing chamber method.
  12. Tateishi, Shizuka; Kurozumi, Yusuke; Rikihisa, Yasuhiro, Epitaxial apparatus.
  13. Chen, Ling; Ku, Vincent; Wu, Dien-Yeh; Chung, Hua; Ouye, Alan; Nakashima, Norman, Gas delivery apparatus and method for atomic layer deposition.
  14. Chen, Ling; Ku, Vincent; Wu, Dien-Yeh; Chung, Hua; Ouye, Alan; Nakashima, Norman, Gas delivery apparatus and method for atomic layer deposition.
  15. Chen, Ling; Ku, Vincent; Wu, Dien-Yeh; Chung, Hua; Ouye, Alan; Nakashima, Norman, Gas delivery apparatus for atomic layer deposition.
  16. Shouqian Shao JP; Yicheng Li JP; Takashi Shigeoka JP; Takeshi Sakuma JP, Heat treatment apparatus having a thin light-transmitting window.
  17. Hathaway Kevin, Heating device containing a multi-lamp cone for heating semiconductor wafers.
  18. Gat, Arnon; Bogart, Bob, Heating device for heating semiconductor wafers in thermal processing chambers.
  19. Gat, Arnon; Bogart, Bob, Heating device for heating semiconductor wafers in thermal processing chambers.
  20. Gat, Arnon; Bogart, Bob, Heating device for heating semiconductor wafers in thermal processing chambers.
  21. Gat, Arnon; Bogart, Bob; O'Carroll, Conor Patrick; Timans, Paul Janis; Choy, Shuen Chun; Koren, Zion; Bragg, Chris Francis, Heating device for heating semiconductor wafers in thermal processing chambers.
  22. Gat,Arnon; Bogart,Bob, Heating device for heating semiconductor wafers in thermal processing chambers.
  23. Gat Arnon, Heating device for semiconductor wafers.
  24. Vosen Steven R., Heating device for semiconductor wafers.
  25. Roger N. Anderson, Infra-red transparent thermal reactor cover member.
  26. Brors Daniel L. ; Cook Robert C., Method and apparatus for cold wall chemical vapor deposition.
  27. Anderson Roger N. ; Carlson David K., Method and apparatus for controlling the radial temperature gradient of a wafer while ramping the wafer temperature.
  28. Habuka Hitoshi,JPX ; Mayuzumi Masanori,JPX ; Tate Naoto ; Katayama Masatake,JPX, Method of chemical vapor deposition.
  29. John F. Wengert ; Loren R. Jacobs ; Michael W. Halpin ; Derrick W. Foster ; Cornelius A. van der Jeugd ; Robert M. Vyne ; Mark R. Hawkins, Process chamber with downstream getter plate.
  30. Wengert John F. ; Jacobs Loren R. ; Halpin Michael W. ; Foster Derrick W. ; van der Jeugd Cornelius A. ; Vyne Robert M. ; Hawkins Mark R., Process chamber with inner support.
  31. Halpin, Michael W.; Foster, Derrick W., Process chamber with rectangular temperature compensation ring.
  32. Das John H. ; Thakur Randhir P. S., Process for forming thin dielectric layers in semiconductor devices.
  33. Ivo Raaijmakers, Quartz wafer processing chamber.
  34. Raaijmakers, Ivo, Quartz wafer processing chamber.
  35. Moore, Gary M.; Nishikawa, Katsuhito; Beese, Steven C., Rapid thermal process reactor utilizing a low profile dome.
  36. Moore Gary M. (Monte Sereno CA) Nishikawa Katsuhito (San Jose CA), Rapid thermal processing apparatus for processing semiconductor wafers.
  37. Moore Gary M. ; Nishikawa Katsuhito, Rapid thermal processing apparatus for processing semiconductor wafers.
  38. Moore Gary M. ; Nishikawa Katsuhito, Rapid thermal processing apparatus for processing semiconductor wafers.
  39. Moore Gary M. ; Nishikawa Katsuhito, Rapid thermal processing apparatus for processing semiconductor wafers.
  40. Wood,Eric R., Reactor chamber.
  41. Anderson Roger N. ; Hey H. Peter W. ; Beinglass Israel ; Venkatesan Mahalingam, Semiconductor wafer process chamber with susceptor back coating.
  42. Morisaki, Hitoshi; Kamiya, Yasushi; Nomura, Shuji; Totuka, Masahiro; Oku, Tomoki; Hattori, Ryo, Silicon nitride film forming method.
  43. Kurita, Shinichi; Beer, Emanuel; Nguyen, Hung T.; Blonigan, Wendell T., Transfer chamber for vacuum processing system.
  44. Kurita,Shinichi; Beer,Emanuel; Nguyen,Hung T.; Blonigan,Wendell T., Transfer chamber for vacuum processing system.
  45. Jostlein,Hans, Ultra-high speed vacuum pump system with first stage turbofan and second stage turbomolecular pump.
  46. Powell, Earl G., Vacuum processing system for producing components.
  47. Powell, Earl G., Vacuum processing system for producing components.
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