|국가/구분||United States(US) Patent 등록|
|미국특허분류(USC)||55/485 ; 55/482 ; 55/523 ; 210/5101|
|발명자 / 주소|
|출원인 / 주소|
|인용정보||피인용 횟수 : 46 인용 특허 : 0|
An ultra-high efficiency particulate air filter for use in the microelectronics manufacturing industry is formed as a fully homogeneous sintered metal filter that exhibits an efficiency substantially in excess of a 6 log reduction and preferably equal to or exceeding a 9 log reduction (an efficiency of 99.9999999%). The filter can be used as a process gas in-line filter in state of the art gas supply systems. The porous metal filter exhibits long term stability relative to mechanical or thermal stress and operates within the desired ultra-high efficiency...
An ultra-high efficiency particulate air filter for use in filtering process gases for the semiconductor and microelectronics manufacturing industries comprising a filter element made from porous sintered metal, said element having a filtration efficiency relative to its most penetrating particle size of at least 6 log reduction and a specific surface per unit area of at least 0.055 m2/cm2 when standardized to a thickness of 0.068 inch, said filtration efficiency being measured at a flow rate of 30 SLPM for an 11.3 in.2 filter area.