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Method and apparatus for inspecting surface conditions 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01N-021/88
출원번호 US-0669998 (1991-03-15)
우선권정보 JP-0067839 (1990-03-16)
발명자 / 주소
  • Okada Saburo (Kure JPX) Sumimoto Tetsuhiro (Kure JPX) Imade Masaaki (Kure JPX) Miyauchi Hidekazu (Kure JPX)
출원인 / 주소
  • Agency of Industrial Science & Technology (Tokyo JPX 07)
인용정보 피인용 횟수 : 58  인용 특허 : 0

초록

This invention concerns inspection of surface conditions to detect locations, sizes and nature of flaws, defects or stains not only on a flat surface but also on an undulating or stepped surface, and includes the steps of: scanning an inspecting surface of a specimen with a spot-like laser beam proj

대표청구항

A method for inspection of surface conditions by scanning a surface area of a specimen with a spot-like light beam projected obliquely from a light source and detecting various defects on the surface of said specimen on the basis of optical data of diffracted light from said specimen surface, charac

이 특허를 인용한 특허 (58)

  1. Xu,James J.; Lee,Ken K., Defect review system with 2D scanning and a ring detector.
  2. Meeks, Steven W., Detecting and classifying surface features or defects by controlling the angle of the illumination plane of incidence with respect to the feature or defect.
  3. Almogy Gilad,ILX, Dual resolution combined laser spot scanning and area imaging inspection.
  4. Watanabe,Masahiro; Hiroi,Takashi; Tanaka,Maki; Shinada,Hiroyuki; Usami,Yasutsugu, Electron beam apparatus and method with surface height calculator and a dual projection optical unit.
  5. Watanabe, Masahiro; Hiroi, Takashi; Tanaka, Maki; Shinada, Hiroyuki; Usami, Yasutsugu, Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus.
  6. Watanabe, Masahiro; Hiroi, Takashi; Tanaka, Maki; Shinada, Hiroyuki; Usami, Yasutsugu, Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus.
  7. Watanabe, Masahiro; Hiroi, Takashi; Tanaka, Maki; Shinada, Hiroyuki; Usami, Yasutsugu, Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus.
  8. Vaez Iravani,Mehdi; Zhao,Guoheng; Stokowski,Stanley E., Illumination apparatus and methods.
  9. Meeks, Steven W., Material independent profiler.
  10. Stevick, Glen R.; Rondinone, David M.; Singer, Jerome R.; Rocklin, Matthew D., Method and apparatus for dynamic space-time imaging system.
  11. Zelt ; III Albert R. ; Klawonn Robert M. ; Laskey Paul S., Method and apparatus for monitoring and inspecting strip edge.
  12. Drent, William Van; Vajda, Ferenc, Method and system for perpendicular magnetic media metrology.
  13. John C. Stover ; Yuri A. Eremin RU, Method for discriminating between holes in and particles on a film covering a substrate.
  14. Imaino Wayne Isami ; Juliana ; Jr. Anthony ; Latta Milton Russell ; Lee Charles H. ; Leung Wai Cheung ; Rosen Hal J. ; Brannon James Hammond, Method of producing a calibration disk.
  15. Frederick G. Hewitt ; Steven J. Orfield, Methods for assessing visual tasks to establish desirable lighting and viewing conditions for performance of tasks, apparatus; and, applications.
  16. Hewitt Frederick G. (Eagan MN) Orfield Steven J. (Minneapolis MN), Methods for assessing visual tasks to establish desirable lighting and viewing conditions for performance of tasks; appa.
  17. Grow Robert J. ; Grow Richard W. ; Benner Robert E., Non-contact shape meter for flatness measurements.
  18. Leslie, Brian C.; Nikoonahad, Mehrdad; Wells, Keith B., Optical scanning system for surface inspection.
  19. Leslie,Brian C.; Nikoonahad,Mehrdad; Wells,Keith B., Optical scanning system for surface inspection.
  20. Leslie,Brian C.; Nikoonahad,Mehrdad; Wells,Keith B., Optical scanning system for surface inspection.
  21. Marxer,Norbert; Gross,Kenneth P.; Altendorfer,Hubert; Kren,George, Process and assembly for non-destructive surface inspections.
  22. Marxer,Norbert; Gross,Kenneth P.; Altendorfer,Hubert; Kren,George, Process and assembly for non-destructive surface inspections.
  23. Mehdi Vaez-Iravani ; Stanley Stokowski ; Guoheng Zhao, Sample inspection system.
  24. Vaez Iravani,Mehdi; Stokowski,Stanley; Zhao,Guoheng, Sample inspection system.
  25. Vaez Iravani,Mehdi; Stokowski,Stanley; Zhao,Guoheng, Sample inspection system.
  26. Vaez Iravani,Mehdi; Stokowski,Stanley; Zhao,Guoheng, Sample inspection system.
  27. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  28. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  29. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  30. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  31. Nikoonahad, Mehrdad; Stokowski, Stanley E., Scanning system for inspecting anamolies on surfaces.
  32. Nikoonahad,Mehrdad; Stokowski,Stanley E., Scanning system for inspecting anomalies on surfaces.
  33. Ngo, Klet; Reeve, Michael; Martinez, Erica Christina, Sensor device with a radiation directing surface.
  34. Zaman,Kamran; Pietrantoni,Dante; Gottschalk,Ken; Pietrzykowski,Stanley, Specular surface flaw detection.
  35. Meeks, Steven W.; Sappey, Romain; Carr, Tom, Surface characteristic analysis.
  36. Oak, Dave S.; Do, Tri; Soetarman, Ronny; Meeks, Steven W.; Velidandla, Vamsi, Surface finish roughness measurement.
  37. Xu,James J.; Lee,Ken K., Surface inspection system.
  38. Clementi Lee D. ; Fossey Michael E., Surface inspection system and method of inspecting surface of workpiece.
  39. Imaino Wayne Isami ; Juliana ; Jr. Anthony ; Latta Milton Russell ; Lee Charles H. ; Leung Wai Cheung ; Rosen Hal J., Surface inspection tool.
  40. Imaino Wayne Isami ; Juliana ; Jr. Anthony ; Latta Milton Russell ; Lee Charles H. ; Leung Wai Cheung ; Rosen Hal J., Surface inspection tool.
  41. Imaino Wayne Isami ; Juliana ; Jr. Anthony ; Latta Milton Russell ; Lee Charles H. ; Leung Wai Cheung ; Rosen Hal J., Surface inspection tool.
  42. Imaino Wayne Isami ; Juliana ; Jr. Anthony ; Latta Milton Russell ; Lee Charles H. ; Leung Wai Cheung ; Rosen Hal J., Surface inspection tool.
  43. Imaino, Wayne Isami; Juliana, Anthony; Latta, Milton Russell; Lee, Charles H.; Leung, Wai Cheung; Rosen, Hal J.; Meeks, Steven; Sonningfeld, Richard, Surface inspection tool.
  44. Imaino, Wayne Isami; Juliana, Jr., Anthony; Latta, Milton Russell; Lee, Charles H.; Leung, Wai Cheung; Rosen, Hal J.; Meeks, Steven; Sonningfeld, Richard, Surface inspection tool.
  45. Imaino Wayne Isami ; Latta Milton Russell, Surface inspection tool using reflected and scattered light.
  46. Mehanian,Courosh; Meeks,Steven W.; Rosengaus,Eliezer, Surface scanning.
  47. Wurz, Albert; Romaine, John E.; Martin, David L., System for dimensioning objects using at least one light beam offset relative to a perpendicular from an object supporting surface.
  48. Biellak,Steve; Stokowski,Stanley E.; Vaez Iravani,Mehdi, Systems and methods for a wafer inspection system using multiple angles and multiple wavelength illumination.
  49. Almogy, Gilad; Mazaki, Hadar; Phillip, Zvi Howard; Reinhorn, Silviu; Goldberg, Boris; Some, Daniel I., Variable angle illumination wafer inspection system.
  50. Meeks, Steven W.; Kudinar, Rusmin, Wafer edge inspection.
  51. Meeks, Steven W.; Kudinar, Rusmin; Wheeler, William R.; Nguyen, Hung Phi; Velidandla, Vamsi; Somanchi, Anoop; Soetarman, Ronny, Wafer edge inspection.
  52. Meeks,Steven W.; Kudinar,Rusmin; Wheeler,William R.; Nguyen,Hung Phi, Wafer edge inspection.
  53. Velidandla,Vamsi; Somanchi,Anoop; Soetarman,Ronny; Meeks,Steven W., Wafer edge inspection.
  54. Fossey Michael E. ; Stover John C., Wafer inspection system for distinguishing pits and particles.
  55. Fossey Michael E. ; Stover John C. ; Clementi Lee D., Wafer inspection system for distinguishing pits and particles.
  56. Fossey, Michael E.; Stover, John C.; Clementi, Lee D., Wafer inspection system for distinguishing pits and particles.
  57. Stanke, Fred E.; Carlisle, Clinton B.; Pham, Hung Van; Tong, Edric; Ruth, Douglas E.; Cahill, Jr., James M.; Weber-Grabau, Michael; Burke, Elliot; Norton, Adam E., Wafer metrology apparatus and method.
  58. Stanke, Fred E.; Carlisle, Clinton B.; Pham, Hung; Tong, Edric; Ruth, Douglas E.; Cahill, James M.; Weber, Michael; Burke, Elliot, Wafer metrology apparatus and method.
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