[특허]Projection-type optical apparatus

[미국특허] Projection-type optical apparatus 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	G03B-027/34
출원번호	US-0633314 (1990-12-24)
우선권정보	JP-0339084 (1989-12-27)
발명자 / 주소	Taniguchi Tetsuo (Kawasaki JPX) Suzuki Kazuaki (Kawasaki JPX) Tsuji Toshihiko (Kawasaki JPX) Hatasawa Masato (Yokohama JPX)
출원인 / 주소	Nikon Corporation (Tokyo JPX 03)
인용정보	피인용 횟수 : 35 인용 특허 : 0

초록 ▼

In a projection-type optical apparatus in which a projection optical system projects an image of an object upon a substrate, a position detecting sensor mechanically connected to the projection optical system detects the position of the projection optical system relative to the substrate along the optical axis of the projection optical system. A displacement measuring device measures relative displacement between the position detecting sensor and the projection optical system along the optical axis. The substrate is brought into coincidence with an optimum image forming plane of the projection optical system on the basis of the position detected by the position detecting sensor and the displacement measured by the displacement measuring device.

대표청구항 ▼

A projection-type optical apparatus, comprising: a projection optical system adapted to project an image of an object provided on an first plane on a substrate on a second plane; position detecting means mechanically connected to said projection optical system and adapted to detect the position of said projection optical system relative to said substrate along the optical axis of the projection optical system; displacement measuring means for measuring a relative displacement between said position detecting means and said projection optical system along said optical axis; offsetting means for correcting the position detected by said position detecting means in accordance with the displacement measured by said displacement measuring means; and position adjusting means for bringing the surface of said substrate into coincidence with an optimum image forming plane of said projection optical system on the basis of the position detected by said position detecting means which has been corrected by said offsetting means.

이 특허를 인용한 특허 (35) 인용/피인용 타임라인 분석

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Kamiya,Saburo, Exposure apparatus and production method of device using the same.
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Kenji Nishi JP; Yasuaki Tanaka JP; Seiro Murakami JP, Exposure method and apparatus.
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Tanaka, Yasuaki; Murakami, Seiro; Nishi, Kenji, Exposure method and apparatus.
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Shiozawa, Takahisa, Exposure method and apparatus for detecting an exposure amount and for calculating a correction value based on the detected exposure amount.
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Yamada Yuichi,JPX ; Kawahara Atsushi,JPX, Exposure method and apparatus, and semiconductor device manufactured using the method.
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Nishi, Kenji, Exposure method and device.
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Streefkerk, Bob; Derksen, Antonius Theodorus Anna Maria; Lof, Joeri; Simon, Klaus; Straaijer, Alexander, Lithographic apparatus and device manufacturing method.
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Streefkerk, Bob; Derksen, Antonius Theodorus Anna Maria; Lof, Joeri; Simon, Klaus; Straaijer, Alexander, Lithographic apparatus and device manufacturing method.
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Streefkerk, Bob; Derksen, Antonius Theodorus Anna Maria; Lof, Joeri; Simon, Klaus; Straaijer, Alexander, Lithographic apparatus and device manufacturing method.
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Streefkerk, Bob; Derksen, Antonius Theodorus Anna Maria; Lof, Joeri; Simon, Klaus; Straaijer, Alexander, Lithographic apparatus and device manufacturing method.
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Streefkerk, Bob; Derksen, Antonius Theodorus Anna Maria; Lof, Joeri; Simon, Klaus; Straaijer, Alexander, Lithographic apparatus and device manufacturing method.
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Cadee, Theodorus Petrus Maria; Jacobs, Johannes Henricus Wilhelmus; Ten Kate, Nicolaas; Loopstra, Erik Roelof; Van Meer, Aschwin Lodewijk Hendricus Johannes; Mertens, Jeroen Johannes Sophia Maria; De Mol, Christianus Gerardus Maria; Muitjens, Marcel Johannus Elisabeth Hubertus; Van Der Net, Antonius Johannus; Ottens, Joost Jeroen; Quaedackers, Johannes Anna; Reuhman-Huisken, Maria Elisabeth; Stavenga, Marco Koert; Tinnemans, Patricius Aloysius Jacobus; Verhagen, Martinus Cornelis Maria; Verspay, Jacobus Johannus Leonardus Hendricus; De Jong, Frederik Eduard; Goorman, Koen; Menchtchikov, Boris; Boom, Herman; Nihtianov, Stoyan; Moerman, Richard; Smeets, Martin Frans Pierre; Schoondermark, Bart Leonard Peter; Janssen, Franciscus Johannes Joseph; Riepen, Michel, Lithographic apparatus and device manufacturing method involving a heater.
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Cadee, Theodorus Petrus Maria; Jacobs, Johannes Henricus Wilhelmus; Ten Kate, Nicolaas; Loopstra, Erik Roelof; Vermeer, Aschwin Lodewijk Hendricus Johannes; Mertens, Jeroen Johannes Sophia Maria; De Mol, Christianus Gerardus Maria; Muitjens, Marcel Johannus Elisabeth Hubertus; Van Der Net, Antonius Johannus; Ottens, Joost Jeroen; Quaedackers, Johannes Anna; Reuhman-Huisken, Maria Elisabeth; Stavenga, Marco Koert; Tinnemans, Patricius Aloysius Jacobus; Verhagen, Martinus Cornelis Maria; Verspay, Jacobus Johannus Leonardus Hendricus; De Jong, Frederik Eduard; Goorman, Koen; Menchtchikov, Boris; Boom, Herman; Nihtianov, Stoyan; Moerman, Richard; Smeets, Martin Frans Pierre; Schoondermark, Bart Leonard Peter; Janssen, Franciscus Johannes Joseph; Riepen, Michel, Lithographic apparatus and device manufacturing method involving a heater.
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Box, Wilhelmus Josephus; Luttikhuis, Bernardus Antonius Johannes; Verhagen, Thomas Henricus Jacobus, Lithographic apparatus, thermal conditioning system, and method for manufacturing a device.
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Sjoerd N. L. Donders NL; Tjarko A. R. van Empel NL, Mask clamping apparatus, e.g. for a lithographic apparatus.
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Donders, Sjoerd N .L.; van Empel, Tjarko A. R., Mask for clamping apparatus, e.g. for a lithographic apparatus.
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Bakeman ; Jr. Paul Evans ; Bergendahl Albert Stephan, Method and system for controlling the relative size of images formed in light-sensitive media.
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Miyatake Tsutomu,JPX, Position detecting method and apparatus using optical system with oblique optical axes.
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Miyajima Hideyuki,JPX ; Makinouchi Susumu,JPX ; Ota Kazuya,JPX, Projection exposure apparatus and method in which mask stage is moved to provide alignment with a moving wafer stage.
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Unno Yasuyuki,JPX ; Orii Seiji,JPX ; Yonekawa Masami,JPX, Projection optical system, exposure apparatus and semiconductor-device manufacturing method using the system.
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Bloch, Stephanie; Schwab, Fred J., System and method for focal length stabilization using active temperature control.
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A	생활필수품
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A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

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[미국특허] Projection-type optical apparatus 원문보기

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