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Stereolithography method and apparatus 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B29C-035/08
  • B29C-041/02
출원번호 US-0365444 (1989-06-12)
발명자 / 주소
  • Leyden Richard N. (Topanga CA) Almouist Thomas A. (San Gabriel CA) Lewis Mark A. (Valencia CA) Nguyen Hop D. (Little Rock CA)
출원인 / 주소
  • 3D Systems, Inc. (Valencia CA 02)
인용정보 피인용 횟수 : 120  인용 특허 : 0

초록

An improved stereolithographic apparatus and method is described. In one embodiment, the improvement includes immersing at least a portion of a part in a volume of a liquid solvent in a vapor degreaser while subjecting the portion to ultrasonic agitation to substantially remove excess resin. Several

대표청구항

An improved stereolithographic apparatus for producing a part by forming successive cross-sectional patterns of said part at a selected surface of a material capable of selective physical transformation upon exposure to prescribed synergistic stimulation including means for forming coatings of said

이 특허를 인용한 특허 (120)

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