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Bulk gas sorption and apparatus, gas containment/treatment system comprising same, and sorbent composition therefor 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B01J-020/18
  • B01J-020/02
출원번호 US-0495790 (1990-03-16)
발명자 / 주소
  • Tom Glenn M. (New Milford CT)
출원인 / 주소
  • Novapure Corporation (Danbury CT 02)
인용정보 피인용 횟수 : 74  인용 특허 : 0

초록

A sorbent composition comprising a first sorbent bed of hygroscopic aluminosilicate sorbent and a second sorbent bed comprising an aluminosilicate sorbent impregnated with an aqueous base solution, whereby the hygroscopic aluminosilicate sorbent provides an initial contact zone to protect upstream g

대표청구항

A sorbent composition comprising an arrangement of first and second sorbent beds, wherein the first sorbent bed comprises a hygroscopic aluminosilicate sorbent, and the second sorbent bed comprises an aluminosilicate sorbent impregnated with an aqueous base solution, wherein the first and second sor

이 특허를 인용한 특허 (74)

  1. Holst, Mark; Faller, Rebecca; Tom, Glenn; Arno, Jose; Dubois, Ray, Abatement of effluent from chemical vapor deposition processes using ligand exchange resistant metal-organic precursor solutions.
  2. Mark Holst ; Rebecca Faller ; Glenn Tom ; Jose Arno ; Ray Dubois, Abatement of effluent from chemical vapor deposition processes using ligand exchange resistant metal-organic precursor solutions.
  3. Holst, Mark; Dubois, Ray; Arno, Jose; Faller, Rebecca; Tom, Glenn, Abatement of effluents from chemical vapor deposition processes using organometallic source reagents.
  4. Holst, Mark; Dubois, Ray; Arno, Jose; Faller, Rebecca; Tom, Glenn, Abatement of effluents from chemical vapor deposition processes using organometallic source reagents.
  5. Arena, Chantal; Werkhoven, Christiaan, Abatement of reaction gases from gallium nitride deposition.
  6. Arena, Chantal; Werkhoven, Christiaan, Abatement of reaction gases from gallium nitride deposition.
  7. Banucci Eugene G. ; Hultquist Steven J., Adsorbent-based storage and dispensing system.
  8. Herman Timothy L. ; Ellis Jack ; Tsang Floris Y. ; Clark Daniel O. ; Flippo Belynda ; Inori David ; Kaarup Keith ; Morgenlaender Mark ; Mao Aaron, Advanced apparatus for abatement of gaseous pollutants.
  9. Moore Robert R. ; Getty James D. ; Safiullin Ravil, Apparatus and method for controlled decomposition oxidation of gaseous pollutants.
  10. Moore, Robert R.; Getty, James D.; Safiullin, Ravil, Apparatus and method for controlled decomposition oxidation of gaseous pollutants.
  11. Robert R. Moore ; James D. Getty ; Ravil Safiullin, Apparatus and method for controlled decomposition oxidation of gaseous pollutants.
  12. Tom Glenn M. ; Kirlin Peter S. ; McManus James V., Apparatus and process for manufacturing semiconductor devices, products and precursor structures utilizing sorbent-based fluid storage and dispensing system for reagent delivery.
  13. Wilson, Shaun M.; Sturm, Edward A.; Wodjenski, Michael J.; Carruthers, J. Donald; Sweeney, Joshua B., Carbon adsorbent for hydrogen sulfide removal from gases containing same, and regeneration of adsorbent.
  14. Schwarz James A. ; Putyera Karol ; Bandosz Teresa J. ; Jagiello Jacek ; Amankwah Kwabena A. G., Composite microporous carbons for fuel gas storage.
  15. Kim, Sang-Shin; Rivera, Manuel Scott; Hong, Suk-Dong, Computer readable medium for high pressure gas annealing.
  16. Arena, Chantal; Werkhoven, Christiaan, Equipment for high volume manufacture of group III-V semiconductor materials.
  17. Tom Glenn M. ; Brown Duncan W., Fluid storage and dispensing vessel with modified high surface area solid as fluid storage medium.
  18. Larsson, Bengt I.; Edvardsson, Eva-Lie, Fuel dispenser system with sealed partition part.
  19. Arena, Chantal; Werkhoven, Christiaan, Gallium trichloride injection scheme.
  20. Arena, Chantal; Werkhoven, Christiaan, Gallium trichloride injection scheme.
  21. Arena, Chantal; Werkhoven, Christiaan, Gallium trichloride injection scheme.
  22. Grözinger, Stefan; Simonovic, Denis; Beigl, Martin, Gas cabinet.
  23. W. Karl Olander, Gas cabinet assembly comprising back migration scrubber unit.
  24. Glenn M. Tom ; James V. McManus, Gas cabinet assembly comprising sorbent-based gas storage and delivery system.
  25. Tom, Glenn M.; McManus, James V., Gas cabinet assembly comprising sorbent-based gas storage and delivery system.
  26. Arena, Chantal; Bertram, Jr., Ronald Thomas; Lindow, Ed; Werkhoven, Christiaan, Gas injectors including a funnel- or wedge-shaped channel for chemical vapor deposition (CVD) systems and CVD systems with the same.
  27. Carruthers, J. Donald, Gas storage and dispensing system with monolithic carbon adsorbent.
  28. Carruthers, J. Donald, Gas storage and dispensing system with monolithic carbon adsorbent.
  29. Carruthers, J. Donald, Gas storage and dispensing system with monolithic carbon adsorbent.
  30. Carruthers, J. Donald, Gas storage and dispensing system with monolithic carbon adsorbent.
  31. Carruthers,J. Donald, Gas storage and dispensing system with monolithic carbon adsorbent.
  32. Carruthers,J. Donald, Gas storage and dispensing system with monolithic carbon adsorbent.
  33. Tom Glenn M., High capacity gas storage and dispensing system.
  34. Biederstadt Clifford ; Costello Gerald B. ; Heiser ; Jr. Arthur J., High precision fluid pump with separating diaphragm and gaseous purging means on both sides of the diaphragm.
  35. Brandes George R. ; Tom Glenn M. ; McManus James V., Laser system utilizing sorbent-based gas storage and delivery system.
  36. Tabler Terry A. ; Lurcott Steven M., Leak detection device, and fluid vessel assembly comprising same.
  37. Tom Glenn M., Low concentration gas delivery system utilizing sorbent-based gas storage and delivery system.
  38. Olander W. Karl, Low pressure gas source and dispensing apparatus with enhanced diffusive/extractive means.
  39. Doyle Michael J. ; Urdaneta Nelson ; Vu Kim N., Mass flow controller with vertical purifier.
  40. Fischer H. Eric, Metallo-oxomeric scrubber compositions.
  41. Akae, Yukoh; Kote, Kazuo, Method and apparatus for removing organic hazardous substances using selected solvents.
  42. Aitchison Kenneth Allen, Method and apparatus for treating exhaust gases from CVD, PECVD or plasma etch reactors.
  43. Herman, Timothy L.; Ellis, Jack; Tsang, Floris Y.; Clark, Daniel O.; Flippo, Belynda G.; Inori, David; Kaarup, Keith; Morgenlaender, Mark; Mao, Aaron, Method for abatement of gaseous pollutants.
  44. Moore,Robert R.; Getty,James D.; Safiullin,Ravil, Method for decomposition oxidation of gaseous pollutants.
  45. Kim, Sang-Shin; Rivera, Manuel Scott; Hong, Suk-Dong, Method for high pressure gas annealing.
  46. Jursich, Gregory M., Methods and apparatus for delivering high purity liquids with low vapor pressure.
  47. Arena, Chantal; Werkhoven, Christiaan, Methods for high volume manufacture of group III-V semiconductor materials.
  48. Wilson, Shaun M.; Sturm, Edward A., PVDF pyrolyzate adsorbent and gas storage and dispensing system utilizing same.
  49. Wilson, Shaun M.; Sturm, Edward A., PVDF pyrolyzate adsorbent and gas storage and dispensing system utilizing same.
  50. Wilson, Shaun M.; Sturm, Edward A., PVDF pyrolyzate adsorbent and gas storage and dispensing system utilizing same.
  51. Tom Glenn M. ; Miller Cynthia A., Piezoelectric end point sensor for detection of breakthrough of fluid, and fluid processing apparatus comprising same.
  52. Tom Glenn M. ; Miller Cynthia A., Piezoelectric enviromental fluid monitoring assembly and method.
  53. Tom Glenn M., Piezoelectric quartz crystal hydrogen sensor, and hydrogen sensing method utilizing same.
  54. Wang Luping ; McManus James V., Process for fabricating a sorbent-based gas storage and dispensing system, utilizing sorbent material pretreatment.
  55. Hardwick, Steven; McManus, James V., Process for sorption of hazardous waste products from exhaust gas streams.
  56. Tom Glenn M. ; King Mackenzie E., Quartz crystal microbalance sensors and semiconductor manufacturing process systems comprising same.
  57. Tom Glenn M., Quartz crystal microbalance system for detecting concentration of a selected gas component in a multicomponent gas stream.
  58. McManus James V. (Danbury CT), Reclaiming system for gas recovery from decommissioned gas storage and dispensing vessels and recycle of recovered gas.
  59. Brestovansky,Dennis; Wodjenski,Michael J.; Arno,Jose I.; Carruthers,J. Donald; Moroco, legal representative,Judith A.; Moroco,Philip A., Rectangular parallelepiped fluid storage and dispending vessel.
  60. Brestovansky, Dennis; Wodjenski, Michael J.; Arno, Jose I.; Carruthers, J. Donald; Moroco, Philip A., Rectangular parallelepiped fluid storage and dispensing vessel.
  61. Brestovansky, Dennis; Wodjenski, Michael J.; Arno, Jose I.; Carruthers, J. Donald; Moroco, Philip A., Rectangular parallelepiped fluid storage and dispensing vessel.
  62. Brestovansky, Dennis; Wodjenski, Michael J.; Arno, Jose I.; Carruthers, J. Donald; Moroco, Phillip A., Rectangular parallelepiped fluid storage and dispensing vessel.
  63. Brestovansky, Dennis; Wodjenski, Michael J.; Arno, Jose I.; Carruthers, J. Donald; Moroco, Phillip A.; Moroco, legal representative, Judith A., Rectangular parallelepiped fluid storage and dispensing vessel.
  64. Brestovansky,Dennis; Moroco,Philip A., Rectangular parallelepiped fluid storage and dispensing vessel.
  65. Brestovansky,Dennis; Wodjenski,Michael J.; Arno,Jose I.; Carruthers,J. Donald, Rectangular parallelepiped fluid storage and dispensing vessel.
  66. Olander, W. Karl; Sweeney, Joseph D.; Wang, Luping, Semiconductor manufacturing facility utilizing exhaust recirculation.
  67. Tom Glenn M. ; McManus James V., Sorbent-based fluid storage and dispensing system with high efficiency sorbent medium.
  68. Tischler Michael A. ; Kirlin Peter S., Sorbent-based fluid storage and dispensing vessel with replaceable sorbent cartridge members.
  69. Tom, Glenn M.; McManus, James V.; Wang, Luping; Olander, W. Karl, Sorbent-based gas storage and delivery system.
  70. Hultquist Steven J. ; Tom Glenn M. ; Kirlin Peter S. ; McManus James V., Sorbent-based gas storage and delivery system for dispensing of high-purity gas, and apparatus and process for manufacturing semiconductor devices, products and precursor structures utilizing same.
  71. Tom Glenn M. ; McManus James V., Storage and delivery system for gaseous compounds.
  72. Arena, Chantal; Werkhoven, Christiaan, Temperature-controlled purge gate valve for chemical vapor deposition chamber.
  73. Arena, Chantal; Werkhoven, Christiaan, Temperature-controlled purge gate valve for chemical vapor deposition chamber.
  74. Dietz James ; McManus James V., Throughflow gas storage and dispensing system.
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