이 특허를 인용한 특허 (42)

1. Jackson Melvin Robert (Niskayuna NY) Eggleston Michael Robert (Scotia NY), Anode assembly for use in x-ray tubes, and related articles of manufacture.

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2. Naito,Kazumi; Omori,Kazuhiro, Capacitor.

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3. Fonte, Matthew V., Composite crucibles and methods of making and using the same.

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4. Koenitzer,John W.; Qiu,Yongjian, Controlled oxygen addition for metal material.

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5. Nobuyuki Nagato JP; Kazumi Naito JP, Electrode material for capacitors and capacitor using the same.

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6. Aimone, Paul R., Fine grain niobium sheet via ingot metallurgy.

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7. Aimone, Paul R.; Moser, Kurt D.; Dorvel, Robert A.; Balter, Ryan, Fine grain niobium sheet via ingot metallurgy.

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8. Alhert Richard H. (San Jose CA) Howard James K. (Morgan Hill CA) Parker Michael A. (Fremont CA), Getter layer lead structure for eliminating resistance increase phonomena and embrittlement and method for making the sa.

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9. Spaniol, Bernd, High temperature-resistant niobium wire.

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10. Kramer, Pamela A.; Morris, Jr., John William, Manufacture of fine-grained material for use in medical devices.

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11. Kramer-Brown, Pamela A.; Morris, Jr., John William, Manufacture of fine-grained material for use in medical devices.

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12. Kramer-Brown, Pamela A.; Morris, Jr., John William, Manufacture of fine-grained material for use in medical devices.

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13. Kramer-Brown, Pamela A.; Morris, Jr., John William, Manufacture of fine-grained material for use in medical devices.

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14. Fife, James A., Method of making a capacitor anode of a pellet of niobium oxide.

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15. Fife,James A., Method to partially reduce calcined niobium metal oxide and oxygen reduced niobium oxides.

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16. Segal, Vladimir; Willett, William B.; Ferrasse, Stephane, Methods of fabricating articles and sputtering targets.

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17. Reed, David M.; Venigalla, Sridhar; Kitchell, Ricky W.; Krause, Stephen J.; Enman, Heather L.; Schultz, Dorran L.; Kerchner, Jeffrey A., Methods of making a niobium metal oxide and oxygen reduced niobium oxides.

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18. Reed, David M.; Venigalla, Sridhar; Kitchell, Ricky W.; Krause, Stephen J.; Enman, Heather L.; Schultz, Dorran L.; Kerchner, Jeffrey A., Methods of making a niobium metal oxide and oxygen reduced niobium oxides.

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19. Fife, James A., Methods to make capacitors containing a partially reduced niobium metal oxide.

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20. James A. Fife, Methods to partially reduce a niobium metal oxide and oxygen reduced niobium oxides.

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21. Jonathon L. Kimmel ; Ricky W. Kitchell ; James A. Fife, Methods to partially reduce a niobium metal oxide and oxygen reduced niobium oxides.

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22. Jonathon L. Kimmel ; Ricky W. Kitchell. ; James A. Fife, Methods to partially reduce a niobium metal oxide and oxygen reduced niobium oxides.

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23. Kimmel, Jonathon L.; Kitchell, Ricky W.; Fife, James A., Methods to partially reduce a niobium metal oxide and oxygen reduced niobium oxides.

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24. Kimmel, Jonathon L.; Redd, Randall V., Modified oxygen reduced valve metal oxides.

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25. Kimmel,Jonathon L.; Redd,Randall V., Modified oxygen reduced valve metal oxides.

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26. Sato, Nobuyuki, Niobium powder and anode for solid electrolyte capacitors made therefrom.

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27. Kimmel, Jonathon L.; Kitchell, Ricky W., Oxygen reduced niobium oxides.

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28. Reed, David M.; Venigalla, Sridhar; Kerchner, Jeffrey A., Phase formation of oxygen reduced valve metal oxides and granulation methods.

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29. Balliett Robert W. ; Luong Trung, Production of tantalum-tungsten alloys production by powder metallurgy.

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30. Prabhat Kumar ; Howard V. Goldberg ; Thomas Ryan, Refractory metals with improved adhesion strength.

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31. Matera, John P.; Ford, Robert B.; Wickersham, Jr., Charles E., Sputter targets and methods of forming same by rotary axial forging.

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32. Matera, John P.; Ford, Robert B.; Wickersham, Jr., Charles E., Sputter targets and methods of forming same by rotary axial forging.

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33. Segal, Vladimir; Willett, William B.; Ferrasse, Stephane, Sputtering targets formed from cast materials.

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34. Turner, Stephen P., Tantalum PVD component producing methods.

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35. Rosenberg, Harry; Ozturk, Bahri; Wang, Guangxin; LaRue, Wesley, Tantalum sputtering target and method of manufacture.

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36. Rosenberg, Harry; Ozturk, Bahri; Wang, Guangxin; LaRue, Wesley, Tantalum sputtering target and method of manufacture.

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37. Rosenberg, Harry; Ozturk, Bahri; Wang, Guangxin; LaRue, Wesley, Tantalum sputtering target and method of manufacture.

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38. Turner,Stephen P., Tantalum sputtering target with fine grains and uniform texture and method of manufacture.

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39. Huber, Jr., Louis E.; Michaluk, Christopher A., Tantalum-silicon alloys and products containing the same and processes of making the same.

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40. Huber, Jr., Louis E.; Michaluk, Christopher A., Tantalum-silicon alloys and products containing the same and processes of making the same.

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41. Turner, Stephen P.; Green, Joseph E.; Scagline, Rodney L.; Xu, Yun, Titanium-based and zirconium-based mixed materials and sputtering targets.

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42. Spaniol, Bernd, Wire and frame, in particular niobium-based, for single-side socket lamps and a method for the production and use thereof.

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