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[미국특허] Formation of microstructures by multiple level deep X-ray lithography with sacrificial metal layers 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C25D-005/02
출원번호 US-0874116 (1992-04-24)
발명자 / 주소
  • Guckel Henry (Madison WI)
출원인 / 주소
  • Wisconsin Alumni Research Foundation (Madison WI 02)
인용정보 피인용 횟수 : 171  인용 특허 : 0

초록

Complex metal structures are formed in microminiature dimensions utilizing multiple mask exposures which are capable of producing substantially arbitrary three-dimensional shapes. A first layer of a primary metal is electroplated onto an exposed plating base to fill a void in a photoresist, the phot

대표청구항

A method of forming micromechanical structures comprising the steps of: (a) providing a plating base on a surface of a substrate; (b) applying a photoresist in a layer onto the plating base; (c) exposing the photoresist in a pattern to radiation to render the photoresist dissolvable in a pattern; (d

이 특허를 인용한 특허 (171) 인용/피인용 타임라인 분석

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