[특허]Plasma processing method and plasma generating device

[미국특허] Plasma processing method and plasma generating device 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	H05H-001/24
출원번호	US-0777708 (1991-10-21)
우선권정보	JP-0286883 (1990-10-23)
발명자 / 주소	Koinuma Hideomi (Tokyo) Yamazaki Shunpei (Tokyo) Hayashi Shigenori (Kanagawa) Miyanaga Akiharu (Kanagawa) Shiraishi Tadashi (Kanagawa JPX)
출원인 / 주소	Semiconductor Energy Laboratory Co., Ltd. (Kanagawa JPX 03)
인용정보	피인용 횟수 : 34 인용 특허 : 0

초록 ▼

A plasma generating device includes a central conductor, a peripheral cylindrical conductor surrounding the central conductor, an insulating cylinder interposed between the central conductor and the peripheral conductor in order to prevent direct arc discharge from occurring between the central conductor and the peripheral conductor. The central and peripheral conductors and the insulating cylinder are coaxially arranged in order to define a cylindrical discharging space therein. By applying a high frequency energy to the central conductor, glow discharge is caused between the central and peripheral conductors. A reactive gas is introduced from one end of the discharging space, excited by the glow discharge and goes out from the other end as an excited plasma to a working place where a work piece is processed by the plasma.

대표청구항 ▼

A plasma generating device comprising: a central electrode; a peripheral electrode surrounding said central electrode; an insulating cylinder interposed between said central electrode and said peripheral electrode and extending beyond lower ends of both said central electrode and said peripheral electrode in order to prevent direct arc discharge from occurring between said central electrode and said peripheral electrode; a supporting structure for supporting said central electrode, said peripheral electrode and said insulating cylinder in order to define a discharging space between said central electrode and said insulating cylinder; an alternating current source operatively connected with said central electrode and said peripheral electrode in order to induce an alternating electric field therebetween; and a gas supply system for supplying a reactive gas into said discharging space.

이 특허를 인용한 특허 (34) 인용/피인용 타임라인 분석

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Sieber, Kurt D.; Cok, Ronald Steven; Kneezel, Gary Alan, Non-planar radial-flow plasma treatment system.
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Denes, Ferencz S.; Manolache, Sorin O.; Hershkowitz, Noah, Plasma generator.
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Yasushi Sawada JP; Keiichi Yamazaki JP; Yoshitami Inoue JP; Sachiko Okazaki JP; Masuhiro Kogoma JP, Plasma processing apparatus and method.
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Hicks, Robert F.; Babayan, Steve, Plasma surface treatment of composites for bonding.
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Yamazaki,Shunpei; Arai,Yasuyuki; Watanabe,Yasuko, Plasma treatment apparatus and method for plasma treatment.
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Yamazaki,Shunpei; Arai,Yasuyuki; Watanabe,Yasuko, Plasma treatment apparatus and method for plasma treatment.
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Koinuma Hideomi,JPX ; Kusano Yukihiro,JPX ; Yoshikawa Masato,JPX ; Kato Nobuko,JPX ; Naito Kazuo,JPX, Process for surface treatment of vulcanized rubber and process for production of rubber-based composite material.
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Itoh,Kenji; Hayashi,Shigenori, Process for treating a substrate with a plasma.
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Enloe,Carl L.; McLaughlin,Thomas E.; Jumper,Eric J.; Corke,Thomas C., Single dielectric barrier aerodynamic plasma actuation.
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Hebert Edmund A. ; Lutz Mitchell E. ; Mydlack Thomas, Treatment for facilitating bonding between golf ball layers and resultant golf balls.
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Hebert, Edmund A.; Lutz, Mitchell E.; Mydlack, Thomas, Treatment for facilitating bonding between golf ball layers and resultant golf balls.
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Hicks, Robert F., Wound treatment apparatus and method.
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Hicks, Robert F., Wound treatment apparatus and method.
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IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

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[미국특허] Plasma processing method and plasma generating device 원문보기