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[미국특허] Reflective optical imaging system for extreme ultraviolet wavelengths 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G02B-005/10
출원번호 US-0682780 (1991-04-09)
발명자 / 주소
  • Viswanathan Vriddhachalam K. (Los Alamos NM) Newnam Brian E. (Los Alamos NM)
출원인 / 주소
  • The United States of America as represented by the United States Department of Energy (Washington DC 06)
인용정보 피인용 횟수 : 83  인용 특허 : 0

초록

A projection reflection optical system has two mirrors in a coaxial, four reflection configuration to reproduce the image of an object. The mirrors have spherical reflection surfaces to provide a very high resolution of object feature wavelengths less than 200 mmm

대표청구항

A reflecting optical system including illumination means for projecting an image of an object, said optical system further defining an image plane for receiving a reduced image representation of said object, the improvement comprising: first and second coaxial aspherical mirrors in partially obscure

이 특허를 인용한 특허 (83) 인용/피인용 타임라인 분석

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  9. Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf; Mann, Hans-Juergen; Epple, Alexander, Catadioptric projection objective.
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  33. Hudyma Russell, High numerical aperture ring field projection system for extreme ultraviolet lithography.
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