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[미국특허] Substrate handling and processing system 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B65G-047/00
출원번호 US-0763183 (1991-09-20)
발명자 / 주소
  • Hughes John L. (Rodeo CA) Lawson Eric C. (Sunnyvale CA)
출원인 / 주소
  • Intevac, Inc. (Santa Clara CA 02)
인용정보 피인용 횟수 : 55  인용 특허 : 0

초록

A system for handling and processing thin substrates, such as substrates for magnetic disks. The system includes a main chamber, entrance and output load locks, a buffer chamber, substrate load/unload mechanism, and a plurality of substrate processing stations positioned contiguous with the main vac

대표청구항

A system for handling and serially processing a plurality of substrates, said system comprising: means defining a main vacuum chamber; at least one processing station contiguous with said main vacuum chamber; an entrance load lock having an entrance opening and a first movable door for sealing said

이 특허를 인용한 특허 (55) 인용/피인용 타임라인 분석

  1. Fishkin, Boris; Sherrard, Michael, Apparatus for cleaning and drying substrates.
  2. McLeod Paul Stephen ; Bruno John, Apparatus for etching discs and pallets prior to sputter deposition.
  3. Davis,Jeffry A.; Nelson,Gordon Ray; Bexten,Daniel P., Automated processing system.
  4. Davis Jeffry A., Automated semiconductor processing system.
  5. Davis Jeffry A. ; Meyer Kevin P. ; Dolechek Kert L., Automated semiconductor processing system.
  6. Davis, Jeffrey A.; Curtis, Gary L., Automated semiconductor processing system.
  7. Nelson, Gordon Ray; Bexten, Daniel P.; Davis, Jeffry A., Automated semiconductor processing system.
  8. Nelson, Gordon Ray; Bexten, Daniel P.; Davis, Jeffry A., Automated semiconductor processing system.
  9. Davis, Jeffrey A.; Curtis, Gary L., Automated semiconductor processing systems.
  10. Davis,Jeffrey A.; Curtis,Gary L., Automated semiconductor processing systems.
  11. Beer, Emanuel; White, John M., Automated substrate processing system.
  12. Gagliardi Giovanni,ITX ; Corvino Luigi,ITX, Device for feeding substrates to vacuum systems for deposit of surface coating on the substrates.
  13. Nguyen Hoang ; Harper Bruce M., Disc-handling apparatus.
  14. Fairbairn, Kevin P.; Bluck, Terry; Marion, Craig; Weiss, Robert E., Disk coating system.
  15. Hughes John L. ; DeKoven Benjamin M. ; Lavine Richard E., Hard disk vapor lube.
  16. McLeod, Paul Stephen, In-line, pass-by method for vapor lubrication.
  17. McLeod, Paul Stephen, In-line, pass-by system and method for disc vapor lubrication.
  18. Kurita Shinichi ; White John M., In-situ substrate transfer shuttle.
  19. Ismail, Rosulan Bin; Poobalan, Prakash; Tierney, Robert M.; Husin, Safri, Media flip and cassette exchange apparatus and method.
  20. Morad, Ratson, Method and apparatus for inline deposition of materials on a non-planar surface.
  21. Johnson, Paul Markoff; Pond, Norman H.; Ruck, Robert; Fo, Nathan, Method and apparatus for multi-target sputtering.
  22. Xu, Ren; Petersen, III, Carl T.; Liu, Charles, Method and apparatus for precision surface modification in nano-imprint lithography.
  23. Ostwald, Timothy C.; Plutt, Daniel James, Method and system for sharing robotic mechanisms between automated storage libraries.
  24. Timothy C. Ostwald ; Daniel James Plutt, Method and system for sharing robotic mechanisms between automated storage libraries.
  25. Jacobsson,Nils; Carlsson,Gunnar, Method for handling boards in a component mounting machine and a component mounting machine for performing the method.
  26. Morad, Ratson, Method of and apparatus for inline deposition of materials on a non-planar surface.
  27. Morad, Ratson, Method of depositing materials on a non-planar surface.
  28. Bluck Terry ; Rogers James H. ; Xie Jun ; Lawson Eric C., Methods and apparatus for processing insulating substrates.
  29. Washburn Hudson A. ; Hamilton Jarrett L., Modular deposition system having batch processing and serial thin film deposition.
  30. Washburn Hudson A. ; Hamilton Jarrett L., Modular deposition system having batch processing and serial thin film deposition.
  31. Oh, Junggeun; Lee, Kwangho; Lee, Jangwoo; Kim, Jeonggyu; Shin, Jinhyouk, Plasma enhanced chemical vapor deposition apparatus and method for controlling the same.
  32. Toshima, Masato; Can, Linh, Processing apparatus and processing method.
  33. Eristoff, D. Guy; Barnes, Michael S.; Wall, Arthur C.; Bluck, Terry, Processing tool with combined sputter and evaporation deposition sources.
  34. Thompson, Raymon F.; Berner, Robert W.; Curtis, Gary L.; Culliton, Stephen P.; Wright, Blaine G.; Byle, Darryl S., Semiconductor processing system with wafer container docking and loading station.
  35. Davis, Jeffry A.; Dolechek, Kert L.; Curtis, Gary L., Semiconductor wafer processing apparatus.
  36. Davis, Jeffry A.; Dolechek, Kert L.; Curtis, Gary L., Semiconductor wafer processing apparatus having improved wafer input/output handling system.
  37. Jeffry A. Davis ; Kert L. Dolechek ; Gary L. Curtis, Semiconductor wafer processing apparatus having improved wafer input/output handling system.
  38. Stirniman, Michael Joseph; McLeod, Paul Stephen, Single disc vapor lubrication.
  39. Stirniman, Michael Joseph; McLeod, Paul Stephen, Single disc vapor lubrication.
  40. Achkire, Younes; Lerner, Alexander N; Govzman, Boris; Fishkin, Boris; Sugarman, Michael N; Mavliev, Rashid A; Fang, Haoquan; Li, Shijian; Shirazi, Guy E; Tang, Jianshe, Single wafer dryer and drying methods.
  41. Achkire, Younes; Lerner, Alexander; Govzman, Boris T.; Fishkin, Boris; Sugarman, Michael; Mavliev, Rashid; Fang, Haoquan; Li, Shijian; Shirazi, Guy; Tang, Jianshe, Single wafer dryer and drying methods.
  42. Whitesell Andrew B., Substrate handling and processing system and method.
  43. Hofmeister, Christopher; Caveney, Robert T., Substrate processing apparatus.
  44. Hofmeister, Christopher; Caveney, Robert T., Substrate processing apparatus.
  45. Hofmeister, Christopher; Caveney, Robert T., Substrate processing apparatus.
  46. Hofmeister, Christopher; Caveney, Robert T., Substrate processing apparatus.
  47. Hofmeister, Christopher; Caveney, Robert T., Substrate processing apparatus.
  48. Bluck, Terry; Hughes, John Les; Lawson, Eric C.; Tanaka, Tatsuru, Substrate processing system.
  49. White, John M.; Turner, Norman L.; Tiner, Robin L.; Keller, Ernst; Kurita, Shinichi; Blonigan, Wendell T.; Berkstresser, David E., Substrate transfer shuttle.
  50. Buller, Benyamin; Gronet, Chris; Truman, Kelly; Brezoczky, Thomas, Support system for solar energy generator panels.
  51. Scollay, Stuart; Bluck, Terry; Chen, Xiang, System and method for substrate transport.
  52. Leahey, Patrick; Lawson, Eric; Liu, Charles; Bluck, Terry; Fairbairn, Kevin P.; Ruck, Robert L.; Harkness, IV, Samuel D., System architecture for combined static and pass-by processing.
  53. Bonora, Anthony C.; Gould, Richard H.; Hine, Roger G.; Krolak, Michael; Speasl, Jerry A., Universal modular wafer transport system.
  54. Bonora, Anthony C.; Gould, Richard H.; Hine, Roger G.; Krolak, Michael; Speasl, Jerry A., Universal modular wafer transport system.
  55. Soraoka, Minoru; Yoshioka, Ken; Kawasaki, Yoshinao, Vacuum processing apparatus and semiconductor manufacturing line using the same.

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