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Spacers for field emission display fabricated via self-aligned high energy ablation 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B44C-001/22
  • B29C-037/00
출원번호 US-0869348 (1992-04-14)
발명자 / 주소
  • Cathey David A. (Boise IA) Yu Chris C. (Boise IA) Doan Trung T. (Boise IA) Lowrey Tyler A. (Boise IA) Rolfson J. Brett (Boise IA)
출원인 / 주소
  • Micron Technology, Inc. (Boise IA 02)
인용정보 피인용 횟수 : 150  인용 특허 : 0

초록

Fabrication of spacer supports for use in flat panel displays through a process which involves 1) depositing an insulating material on an electrode plate, 2) optionally, patterning a reflective material superjacent the insulating material, 3) irradiating the electrode plate, and thereby removing the

대표청구항

A process for the formation of interelectrode support structures, said process comprising the following steps: depositing a first material on a substrate, said substrate being disposed on a first electrode plate; selectively exposing said first material to radiant energy to define the support struct

이 특허를 인용한 특허 (150)

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