이 특허를 인용한 특허 (84)

1. Coulter, Bruce Lee, Actinic radiation reactor.

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2. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of multiple workpieces.

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3. Yong, Zhee Min Jimmy; Stibitz, David; Coulter, Bruce Lee; Hoosier, Michael Scott, Baffle plates for an ultraviolet reactor.

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4. Butterbaugh Jeffery W. ; Gray David C., Cleaning method.

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5. Butterbaugh Jeffery W. ; Gray David C. ; Fayfield Robert T., Cleaning method.

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6. DeSimone Joseph M. ; Romack Timothy ; Betts Douglas E. ; McClain James B., Cleaning process using carbon dioxide as a solvent and employing molecularly engineered surfactants.

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7. DeSimone Joseph M. ; Romack Timothy ; Betts Douglas E. ; McClain James B., Cleaning process using carbon dioxide as a solvent and employing molecularly engineered surfactants.

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8. DeSimone Joseph M. ; Romack Timothy J. ; Betts Douglas E. ; McClain James B., Cleaning process using carbon dioxide as a solvent and employing molecularly engineered surfactants.

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9. Clark, Shan C.; Ramachandrarao, Vijayakumar S.; Turkot, Jr., Robert B., Cleaning residues from semiconductor structures.

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10. Jones,William Dale, Control of fluid flow in the processing of an object with a fluid.

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11. Arena Foster,Chantal J.; Awtrey,Allan Wendell; Ryza,Nicholas Alan; Schilling,Paul, Developing photoresist with supercritical fluid and developer.

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12. Arena-Foster, Chantal J.; Awtrey, Allan Wendell; Ryza, Nicholas Alan; Schilling, Paul, Developing photoresist with supercritical fluid and developer.

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13. Colburn, Matthew E.; Shneyder, Dmitriy; Siddiqui, Shahab, Development or removal of block copolymer or PMMA-b-S-based resist using polar supercritical solvent.

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14. Colburn,Matthew E.; Shneyder,Dmitriy; Siddiqui,Shahab, Development or removal of block copolymer or PMMA-b-S-based resist using polar supercritical solvent.

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15. Arena-Foster, Chantal J.; Awtrey, Allan Wendell; Ryza, Nicholas Alan; Schilling, Paul, Drying resist with a solvent bath and supercritical CO2.

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16. Martin,Roy, Enhanced air and water purification using continuous breakpoint halogenation with free oxygen radicals.

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17. Martin,Roy, Enhanced air and water purification using continuous breakpoint halogenation with free oxygen radicals.

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18. Martin, Roy, Free radical generator and method.

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19. Martin,Roy, Free radical generator and method.

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20. Biberger, Maximilian A.; Layman, Frederick Paul; Sutton, Thomas Robert, High pressure processing chamber for semiconductor substrate.

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21. Biberger,Maximilian A.; Layman,Frederick Paul; Sutton,Thomas Robert, High pressure processing chamber for semiconductor substrate.

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22. Sheydayi,Alexei, Method and apparatus for clamping a substrate in a high pressure processing system.

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23. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method and apparatus for supercritical processing of multiple workpieces.

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24. Dietze, Uwe; Dress, Peter; Singh, Sherjang, Method and apparatus for treating substrates.

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25. Hill David J. (Lincoln Park MI) Hoitash Frederick J. (Ypsilanti MI), Method and apparatus for using ozone in a pressure vessel to treat stream of pollutants.

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26. Sichel, Cosima, Method and arrangement for a water treatment.

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27. Parent,Wayne M.; Goshi,Gentaro, Method and system for cooling a pump.

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28. Parent,Wayne M., Method and system for determining flow conditions in a high pressure processing system.

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29. Parent, Wayne M.; Geshell, Dan R., Method and system for passivating a processing chamber.

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30. Coulter, Bruce Lee, Method and system for providing ultrapure water.

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31. Coulter, Bruce Lee, Method and system for providing ultrapure water.

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32. Stucker John F., Method and system for rejuvenating pressurized fluid solvents used in cleaning substrates.

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33. Hansen,Brandon; Lowe,Marie, Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid.

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34. Hendrix Walter A. ; Montero Gerardo A. ; Smith C. Brent ; Butcher Donald L., Method for introducing dyes and other chemicals into a textile treatment system.

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35. Hendrix, Walter A.; Montero, Gerardo A.; Smith, C. Brent; Butcher, Donald L., Method for introducing dyes and other chemicals into a textile treatment system.

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36. Coulter, Bruce Lee, Method for measuring a concentration of a compound in a liquid stream.

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37. DeSimone Joseph M. ; Romack Timothy J., Method for olefin oxidation.

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38. Stucker John F., Method for rejuvenating pressurized fluid solvent used in cleaning a fabric article.

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39. McDermott,Wayne Thomas; Parris,Gene Everad; Roth,Dean Van John; Subawalla,Hoshang, Method for removal of flux and other residue in dense fluid systems.

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40. Kawamura,Kohei; Asano,Akira; Miyatani,Koutarou; Hillman,Joseph T.; Palmer,Bentley, Method for supercritical carbon dioxide processing of fluoro-carbon films.

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41. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method for supercritical processing of multiple workpieces.

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42. Biberger, Maximilian A.; Schilling, Paul E., Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module.

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43. Biberger,Maximilian A.; Schilling,Paul E., Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module.

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44. Smith Carl Brent ; Montero Gerardo A. ; Hendrix Walter A., Method of dyeing hydrophobic textile fibers with colorant materials in supercritical fluid carbon dioxide.

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45. DeSimone Joseph M. ; Romack Timothy ; Betts Douglas E. ; McClain James B., Method of entraining solid particulates in carbon dioxide fluids.

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46. Hillman,Joseph, Method of inhibiting copper corrosion during supercritical COcleaning.

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47. Coulter, Bruce Lee, Method of irradiating a liquid.

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48. Toma,Dorel Ioan; Schilling,Paul, Method of passivating of low dielectric materials in wafer processing.

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49. Berry, Ivan; Rounds, Stuart; Hallock, John; Owens, Michael; Dahimene, Mahmoud, Method of photoresist ash residue removal.

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50. Biberger,Maximilian Albert; Layman,Frederick Paul; Sutton,Thomas Robert, Method of supercritical processing of a workpiece.

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51. Schilling,Paul, Method of treating a composite spin-on glass/anti-reflective material prior to cleaning.

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52. Schilling,Paul, Method of treatment of porous dielectric films to reduce damage during cleaning.

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53. McCullough,Kenneth J; Moreau,Wayne M; Pope,Keith R; Purtell,Robert J; Simons,John P; Syverson,William A; Taft,Charles J, Method to build a microfilter.

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54. Masashi Okada JP, Methods and apparatus for removing particulate foreign matter from the surface of a sample.

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55. Sheydayi,Alexei, Non-contact shuttle valve for flow diversion in high pressure systems.

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56. Sauer Richard A. ; Hubert Jean-Luc ; Connors Robert W., Pressure-swing absorption based cleaning methods and systems.

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57. Chao Sidney C. ; Beach Robert W. ; Sorbo Nelson W. ; Purer Edna M., Process for cleaning, disinfecting, and sterilizing materials using the combination of dense phase gas and ultraviolet radiation.

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58. Smith, Carl Brent; Hendrix, Walter A.; Butcher, Donald L., Process for treating textile substrates.

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59. McDermott,Wayne Thomas; Subawalla,Hoshang; Johnson,Andrew David; Schwarz,Alexander, Processing of semiconductor components with dense processing fluids and ultrasonic energy.

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60. Subawalla,Hoshang; Parris,Gene Everad; Rao,Madhukar Bhaskara; Kretz,Christine Peck, Processing of substrates with dense fluids comprising acetylenic diols and/or alcohols.

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61. Gracias, David H.; Kloster, Grant, Protecting metal conductors with sacrificial organic monolayers.

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62. Mullee,William H.; de Leeuwe,Marc; Roberson, Jr.,Glenn A.; Palmer,Bentley J., Removal of CMP and post-CMP residue from semiconductors using supercritical carbon dioxide process.

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63. Mullee, William H.; de Leeuwe, Marc; Roberson, Jr., Glenn A., Removal of CMP residue from semiconductor substrate using supercritical carbon dioxide process.

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64. Mullee William H. ; de Leeuwe Marc ; Roberson ; Jr. Glenn A., Removal of CMP residue from semiconductors using supercritical carbon dioxide process.

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65. Bertram, Ronald Thomas; Scott, Douglas Michael, Removal of contaminants from a fluid.

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66. McCullough Kenneth John ; Purtell Robert Joseph ; Rothman Laura Beth ; Wu Jin-Jwang, Removal of fluorine or chlorine residue by liquid CO.sub.2.

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67. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.

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68. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.

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69. William H. Mullee ; Maximilian A. Biberger ; Paul E. Schilling, Removal of photoresist and residue from substrate using supercritical carbon dioxide process.

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70. Koch Robert, Removal of polishing residue from substrate using supercritical fluid process.

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71. Mullee William H., Removal of resist or residue from semiconductors using supercritical carbon dioxide.

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72. McCullough Kenneth John ; Purtell Robert Joseph ; Rothman Laura Beth ; Wu Jin-Jwang, Residue removal by supercritical fluids.

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73. Gilton, Terry L.; Li, Li, Semiconductor fabrication apparatus.

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74. Malchesky, Paul S., Sub-critical fluid cleaning and antimicrobial decontamination system and process.

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75. Ching, Gil; Perrut, Vincent; Ruch, Vincent; Fresquet, Gilles, Substrate processing apparatus for processing substrates using dense phase gas and sonic waves.

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76. Joyce, Patrick C.; Tipton, Adrianne; Shrinivasan, Krishnan; Hess, Dennis W.; Myneni, Satyanarayana; Levitin, Galit, Supercritical solutions for cleaning photoresist and post-etch residue from low-k materials.

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77. Meder Martin G., System and method for flash photolysis cleaning of a semiconductor processing chamber.

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78. Coulter, Bruce Lee, System and method for measuring and treating a liquid stream.

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79. Gale,Glenn; Hillman,Joseph T.; Jacobson,Gunilla; Palmer,Bentley, System and method for processing a substrate using supercritical carbon dioxide processing.

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80. Coulter, Bruce Lee, System for controlling introduction of a reducing agent to a liquid stream.

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81. Stucker John F., System for rejuvenating pressurized fluid solvents used in cleaning substrates.

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82. Jacobson,Gunilla; Yellowaga,Deborah, Treatment of a dielectric layer using supercritical CO.

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83. Kevwitch, Robert, Treatment of substrate using functionalizing agent in supercritical carbon dioxide.

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84. Sitkiewitz, Steve Donald; Carmignani, Gary Michael; Fredrick, Lee William, Ultraviolet light activated oxidation process for the reduction of organic carbon in semiconductor process water.

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