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[미국특허] Apparatus and method for delivering supercritical fluid 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • F17C-007/102
  • B01J-014/00
출원번호 US-0613784 (1990-10-12)
국제출원번호 PCT/CA90/00053 (1990-02-16)
§371/§102 date 19901012 (19901012)
국제공개번호 WO-9009233 (1990-08-23)
발명자 / 주소
  • Pawliszyn Janusz B. (383 Dunvegan Dr. Waterloo CAX N2K 1W7)
인용정보 피인용 횟수 : 61  인용 특허 : 0

초록 ▼

A method and apparatus for delivering supercritical fluids uses one or two high pressure vessels. Each vessel is cooled below the critical temperature of the fluid while the vessel is being filled. The inlet is then closed and the vessel is heated to attain a predetermined pressure. The outlet of th

대표청구항 ▼

A process for delivering supercritical fluid for various uses has a first high pressure vessel with means to cool and means to heat said vessel, said vessel having an inlet and outlet with control means to control the flow of fluid through said inlet and through said outlet, said inlet being connect

이 특허를 인용한 특허 (61) 인용/피인용 타임라인 분석

  1. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of a workpiece.
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  2. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of multiple workpieces.
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  3. Ties Karstens DE, Apparatus, process and pressure reactor for the treatment of solids with pressurized liquid gases.
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  4. Houck Raymond K. ; Koebler Douglas J. ; Williams Glen P. ; Kato Kenneth J. ; Parks Robert D. ; Bauer ; Jr. Paul A., Automated supercritical fluid extraction method and apparatus.
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  5. Jones,William Dale, Control of fluid flow in the processing of an object with a fluid.
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  6. Baust, John M.; Baust, John G.; Cheeks, Roy E.; Dobson, Melissa K.; Robilotto, Anthony T.; Snyder, Kristi K.; Van Buskirk, Robert G., Cryogenic medical system.
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  7. Baust, John M; Baust, John G.; Cheeks, Roy E.; Dobson, Melissa K; Robilotto, Anthony T.; Snyder, Kristi K.; Van Buskirk, Robert G., Cryogenic medical system.
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  8. Gier, Harold L.; Jetley, Richard L., Cryogenic mixed gas single phase storage and delivery.
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  9. Robilotto, Anthony; Snyder, Kristi K.; Baust, John G; Buast, John M.; Cheeks, Roy E., Cryogenic system and method of use.
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  10. Littrup, Peter J.; Babkin, Alexei V.; Duncan, Robert V.; Kerkar, Pramod; Boldarev, Sergey T., Cryotherapy probe.
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  11. Littrup, Peter J.; Babkin, Alexei V.; Duncan, Robert V.; Kerkar, Pramod; Boldarev, Sergey T., Cryotherapy probe.
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  12. Arena Foster,Chantal J.; Awtrey,Allan Wendell; Ryza,Nicholas Alan; Schilling,Paul, Developing photoresist with supercritical fluid and developer.
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  13. Arena-Foster, Chantal J.; Awtrey, Allan Wendell; Ryza, Nicholas Alan; Schilling, Paul, Developing photoresist with supercritical fluid and developer.
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  14. Arena-Foster, Chantal J.; Awtrey, Allan Wendell; Ryza, Nicholas Alan; Schilling, Paul, Drying resist with a solvent bath and supercritical CO2.
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  15. Sheydayi,Alexei; Sutton,Thomas, Gate valve for plus-atmospheric pressure semiconductor process vessels.
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  16. Sutton, Thomas R.; Biberger, Maximilan A., High pressure compatible vacuum chuck for semiconductor wafer including lift mechanism.
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  17. Jones, William D., High pressure fourier transform infrared cell.
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  18. Biberger, Maximilian A.; Layman, Frederick Paul; Sutton, Thomas Robert, High pressure processing chamber for semiconductor substrate.
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  19. Biberger,Maximilian A.; Layman,Frederick Paul; Sutton,Thomas Robert, High pressure processing chamber for semiconductor substrate.
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  20. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
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  21. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
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  22. Baust, John M.; Baust, John G.; Cheeks, Roy; Robilotto, Anthony; Snyder, Kristi, Medical device for the transport of subcooled cryogenic fluid through a linear heat exchanger.
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  23. Sheydayi,Alexei, Method and apparatus for clamping a substrate in a high pressure processing system.
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  24. Goshi,Gentaro, Method and apparatus for cooling motor bearings of a high pressure pump.
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  25. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method and apparatus for supercritical processing of multiple workpieces.
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  26. Parent,Wayne M.; Goshi,Gentaro, Method and system for cooling a pump.
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  27. Parent,Wayne M., Method and system for determining flow conditions in a high pressure processing system.
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  28. Parent, Wayne M.; Geshell, Dan R., Method and system for passivating a processing chamber.
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  29. Hansen,Brandon; Lowe,Marie, Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid.
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  30. Kawamura,Kohei; Asano,Akira; Miyatani,Koutarou; Hillman,Joseph T.; Palmer,Bentley, Method for supercritical carbon dioxide processing of fluoro-carbon films.
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  31. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method for supercritical processing of multiple workpieces.
    상세보기
  32. Biberger, Maximilian A.; Schilling, Paul E., Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module.
    상세보기
  33. Biberger,Maximilian A.; Schilling,Paul E., Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module.
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  34. Hillman,Joseph, Method of inhibiting copper corrosion during supercritical COcleaning.
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  35. Toma,Dorel Ioan; Schilling,Paul, Method of passivating of low dielectric materials in wafer processing.
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  36. Biberger,Maximilian Albert; Layman,Frederick Paul; Sutton,Thomas Robert, Method of supercritical processing of a workpiece.
    상세보기
  37. Schilling,Paul, Method of treating a composite spin-on glass/anti-reflective material prior to cleaning.
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  38. Schilling,Paul, Method of treatment of porous dielectric films to reduce damage during cleaning.
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  39. Littrup, Peter J.; Babkin, Alexei V.; Duncan, Robert; Boldarev, Sergey, Methods and systems for cryogenic cooling.
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  40. Baust, John M.; Baust, John G.; Cheeks, Roy; Robilotto, Anthony; Snyder, Kristi, Modular pulsed pressure device for the transport of liquid cryogen to a cryoprobe.
    상세보기
  41. Baust, John M.; Baust, John G.; Cheeks, Roy; Robilotto, Anthony; Snyder, Kristi, Modular pulsed pressure device for the transport of liquid cryogen to a cryoprobe.
    상세보기
  42. Sheydayi,Alexei, Non-contact shuttle valve for flow diversion in high pressure systems.
    상세보기
  43. Sheydayi,Alexei, Pressure energized pressure vessel opening and closing device and method of providing therefor.
    상세보기
  44. Wuester,Christopher D., Process flow thermocouple.
    상세보기
  45. Mullee,William H.; de Leeuwe,Marc; Roberson, Jr.,Glenn A.; Palmer,Bentley J., Removal of CMP and post-CMP residue from semiconductors using supercritical carbon dioxide process.
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  46. Mullee, William H.; de Leeuwe, Marc; Roberson, Jr., Glenn A., Removal of CMP residue from semiconductor substrate using supercritical carbon dioxide process.
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  47. Mullee William H. ; de Leeuwe Marc ; Roberson ; Jr. Glenn A., Removal of CMP residue from semiconductors using supercritical carbon dioxide process.
    상세보기
  48. Bertram, Ronald Thomas; Scott, Douglas Michael, Removal of contaminants from a fluid.
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  49. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.
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  50. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.
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  51. William H. Mullee ; Maximilian A. Biberger ; Paul E. Schilling, Removal of photoresist and residue from substrate using supercritical carbon dioxide process.
    상세보기
  52. Koch Robert, Removal of polishing residue from substrate using supercritical fluid process.
    상세보기
  53. Mullee William H., Removal of resist or residue from semiconductors using supercritical carbon dioxide.
    상세보기
  54. Gier Harold L., Self contained, cryogenic mixed gas single phase storage and delivery.
    상세보기
  55. Jurcik Benjamin ; Udischas Richard ; Wang Hwa-Chi, System and method for controlled delivery of liquified gases.
    상세보기
  56. Gale,Glenn; Hillman,Joseph T.; Jacobson,Gunilla; Palmer,Bentley, System and method for processing a substrate using supercritical carbon dioxide processing.
    상세보기
  57. Gershtein,Vladimir Yliy; Mattiola,Paul Anthony, System for supply and delivery of carbon dioxide with different purity requirements.
    상세보기
  58. Gershtein,Vladimir Yliy; Mattiola,Paul Anthony; Cirucci,John Frederick; Ivankovits,John Christopher, System for supply and delivery of high purity and ultrahigh purity carbon dioxide.
    상세보기
  59. Jacobson,Gunilla; Yellowaga,Deborah, Treatment of a dielectric layer using supercritical CO.
    상세보기
  60. Kevwitch, Robert, Treatment of substrate using functionalizing agent in supercritical carbon dioxide.
    상세보기
  61. Sheydayi,Alexei, Vacuum chuck utilizing sintered material and method of providing thereof.
    상세보기

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